[go: up one dir, main page]
More Web Proxy on the site http://driver.im/

Park et al., 2020 - Google Patents

Epitaxial aluminum scandium nitride super high frequency acoustic resonators

Park et al., 2020

View PDF
Document ID
15658944158195820786
Author
Park M
Hao Z
Dargis R
Clark A
Ansari A
Publication year
Publication venue
Journal of Microelectromechanical Systems

External Links

Snippet

This paper demonstrates super high frequency (SHF) Lamb and surface acoustic wave resonators based on single-crystal orientation Aluminum Scandium Nitride (AlScN) thin films grown on silicon substrates by molecular beam epitaxy (MBE). We report on the …
Continue reading at ieeexplore.ieee.org (PDF) (other versions)

Classifications

    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02518Deposited layers
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer, carrier concentration layer
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies; Multistep manufacturing processes therefor
    • H01L29/12Semiconductor bodies; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • HELECTRICITY
    • H03BASIC ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/02Details
    • H03H9/02244Details of micro-electro-mechanical resonators
    • H03H2009/02488Vibration modes
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L41/00Piezo-electric devices in general; Electrostrictive devices in general; Magnetostrictive devices in general; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L41/22Processes or apparatus specially adapted for the assembly, manufacture or treatment of piezo-electric or electrostrictive devices or of parts thereof
    • H01L41/31Applying piezo-electric or electrostrictive parts or bodies onto an electrical element or another base
    • HELECTRICITY
    • H03BASIC ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/02Details
    • H03H9/02007Details of bulk acoustic wave devices
    • H03H9/02086Means for compensation or elimination of undesirable effects
    • HELECTRICITY
    • H03BASIC ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks

Similar Documents

Publication Publication Date Title
Park et al. Epitaxial aluminum scandium nitride super high frequency acoustic resonators
Fu et al. High-frequency surface acoustic wave devices based on ZnO/SiC layered structure
Martin et al. Thickness dependence of the properties of highly c-axis textured AlN thin films
Sekaric et al. Nanomechanical resonant structures in nanocrystalline diamond
Rais-Zadeh et al. Gallium nitride as an electromechanical material
Molarius et al. Piezoelectric ZnO films by rf sputtering
Yang et al. Monocrystalline silicon carbide nanoelectromechanical systems
Shao et al. High figure-of-merit Lamb wave resonators based on Al0. 7Sc0. 3N thin film
Lin et al. Surface acoustic wave devices on AlN/3C–SiC/Si multilayer structures
Artieda et al. Effect of substrate roughness on c-oriented AlN thin films
Chen et al. ε‐Ga2O3: An Emerging Wide Bandgap Piezoelectric Semiconductor for Application in Radio Frequency Resonators
Ansari Single crystalline scandium aluminum nitride: An emerging material for 5G acoustic filters
Park et al. A 10 GHz single-crystalline scandium-doped aluminum nitride Lamb-wave resonator
Dargis et al. Single‐Crystal Multilayer Nitride, Metal, and Oxide Structures on Engineered Silicon for New‐Generation Radio Frequency Filter Applications
Shao et al. High quality co-sputtering alscn thin films for piezoelectric lamb-wave resonators
Yoshino Piezoelectric thin films and their applications for electronics
Henry et al. Reactive sputter deposition of piezoelectric Sc0. 12Al0. 88N for contour mode resonators
Beaucejour et al. Controlling residual stress and suppression of anomalous grains in aluminum scandium nitride films grown directly on silicon
Park et al. Super high-frequency scandium aluminum nitride crystalline film bulk acoustic resonators
Heidrich et al. Enhanced mechanical performance of AlN/nanodiamond micro-resonators
Park et al. Epitaxial Al 0.77 Sc 0.23 N SAW and Lamb wave resonators
Zhao et al. A 5.3 GHz Al 0.76 Sc 0.24 N Two-Dimensional Resonant Rods Resonator With ak t 2 of 23.9%
Zhao et al. X-band epi-BAW resonators
Milyutin et al. Sputtering of (001) AlN thin films: Control of polarity by a seed layer
Boota et al. Effect of fabrication conditions on phase formation and properties of epitaxial (PbMg1/3Nb2/3O3) 0.67-(PbTiO3) 0.33 thin films on (001) SrTiO3