[go: up one dir, main page]
More Web Proxy on the site http://driver.im/

Boudreau et al., 2000 - Google Patents

Application of in situ ellipsometry in the fabrication of thin-film optical coatings on semiconductors

Boudreau et al., 2000

View HTML
Document ID
15265841807180470310
Author
Boudreau M
Wallace S
Balcaitis G
Murugkar S
Haugen H
Mascher P
Publication year
Publication venue
Applied Optics

External Links

Snippet

Thin-film interference filters, suitable for use on GaAs-and InP-based lasers, have been fabricated by use of the electron–cyclotron resonance plasma-enhanced chemical vapor deposition technique. Multilayer film structures composed of silicon oxynitride material have …
Continue reading at opg.optica.org (HTML) (other versions)

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B6/00—Light guides
    • G02B6/10—Light guides of the optical waveguide type
    • G02B6/12—Light guides of the optical waveguide type of the integrated circuit kind
    • H—ELECTRICITY
    • H01—BASIC ELECTRIC ELEMENTS
    • H01S—DEVICES USING STIMULATED EMISSION
    • H01S5/00—Semiconductor lasers
    • H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region

Similar Documents

Publication Publication Date Title
Frigg et al. Low loss CMOS-compatible silicon nitride photonics utilizing reactive sputtered thin films
Rodríguez-de Marcos et al. Self-consistent optical constants of SiO2 and Ta2O5 films
Kischkat et al. <? A3B2 tlsb-0.01 w?> Mid-infrared optical properties of thin films of aluminum oxide, titanium dioxide, silicon dioxide, aluminum nitride, and silicon nitride
Pfeiffer et al. Comparative study of ALD SiO2 thin films for optical applications
Veszelei et al. Optical constants and Drude analysis of sputtered zirconium nitride films
Vernhes et al. Single-material inhomogeneous optical filters based on microstructural gradients in plasma-deposited silicon nitride
Pilvi et al. Atomic layer deposition of MgF2 thin films using TaF5 as a novel fluorine source
Sidqi et al. Comparative study of dielectric coating materials for micro-cavity applications
JP2003525834A (en) Radiation transmitting thin film on glass article
Hussein et al. Optimization of plasma-enhanced chemical vapor deposition silicon oxynitride layers for integrated optics applications
Friedman et al. Measured optical losses of Sc doped AlN waveguides
Boudreau et al. Application of in situ ellipsometry in the fabrication of thin-film optical coatings on semiconductors
Amri et al. Photonic band gap and defect mode of one-dimensional photonic crystal coated from a mixture of (HMDSO, N2) layers deposited by PECVD
Netterfield et al. Synthesis of silicon nitride and silicon oxide films by ion-assisted deposition
Pervak et al. 2/3 octave Si/SiO2 infrared dispersive mirrors open new horizons in ultrafast multilayer optics
Lambrinos et al. Effects of bombardment on optical properties during the deposition of silicon nitride by reactive ion-beam sputtering
Persano et al. Very high-quality distributed Bragg reflectors for organic lasing applications by reactive electron-beam deposition
Halford et al. Effects of vacuum deposition conditions on ellipsometric parameters, optical constants, and reflectance of ultrapure aluminum films
Bulkin et al. Protective coatings for front surface silver mirrors by atomic layer deposition
Tsai et al. Amorphous silicon and amorphous silicon nitride films prepared by a plasma-enhanced chemical vapor deposition process as optical coating materials
Katagiri et al. Ion beam sputtered (SiO2) x (Si3N4) 1− x antireflection coatings on laser facets produced using O2–N2 discharges
Kildemo Real-time monitoring and growth control of Si-gradient-index structures by multiwavelength ellipsometry
del Giudice et al. Structural and optical properties of silicon oxynitride on silicon planar waveguides
Kildemo et al. Real-time control by multiwavelength ellipsometry of plasma-deposited multilayers on glass by use of an incoherent-reflection model
Chow et al. Critical field patterns in optical Fibonacci multilayers