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Hatakeyama et al., 1999 - Google Patents

Integrated Fast Atom Beam (FAB) Processes for Fabricating Micro Diffractive Grating Structures and Micro Textured Surfaces

Hatakeyama et al., 1999

Document ID
15182767901033121638
Author
Hatakeyama M
Ichiki K
Toma Y
Satake T
Nakao M
Hatamura Y
Publication year
Publication venue
Advances In Information Storage Systems: Selected Papers from the International Conference on Micromechatronics for Information and Precision Equipment (MIPE'97) Volume 10

External Links

Snippet

We developed four new fast atom beam (FAB) processing methods (I–IV) that produce (a) micro-pattern textured surfaces,(b) diffractive grating structures, or (c) functional nanostructures on three-dimensional (3D) microstructures. The first method (I) is for …
Continue reading at www.worldscientific.com (other versions)

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANO-TECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANO-STRUCTURES; MEASUREMENT OR ANALYSIS OF NANO-STRUCTURES; MANUFACTURE OR TREATMENT OF NANO-STRUCTURES
    • B82Y40/00—Manufacture or treatment of nano-structures
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANO-TECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANO-STRUCTURES; MEASUREMENT OR ANALYSIS OF NANO-STRUCTURES; MANUFACTURE OR TREATMENT OF NANO-STRUCTURES
    • B82Y10/00—Nano-technology for information processing, storage or transmission, e.g. quantum computing or single electron logic

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