[go: up one dir, main page]
More Web Proxy on the site http://driver.im/

El-Hossary et al., 1990 - Google Patents

Optical properties of amorphous carbon films formed by rf plasma deposition from methane

El-Hossary et al., 1990

Document ID
14100194253242201077
Author
El-Hossary F
Fabian D
Webb A
Publication year
Publication venue
Thin Solid Films

External Links

Snippet

Diamond-like amorphous carbon thin films were deposited from methane in continuous and pulsed rf powered glow discharges. The nature and composition of the films are examined by X-ray diffraction, X-ray photoelectron spectroscopy, IR absorption and microhardness …
Continue reading at www.sciencedirect.com (other versions)

Classifications

    • H—ELECTRICITY
    • H01—BASIC ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes, e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material

Similar Documents

Publication Publication Date Title
Booth Optical and electrical diagnostics of fluorocarbon plasmaetching processes
Savvides Deposition parameters and film properties of hydrogenated amorphous silicon prepared by high rate dc planar magnetron reactive sputtering
JP4150789B2 (en) Amorphous carbon nitride film and manufacturing method thereof
El-Hossary et al. Optical properties of amorphous carbon films formed by rf plasma deposition from methane
JP4134315B2 (en) Carbon thin film and manufacturing method thereof
Kaan Kalkan et al. Nanocrystalline Si thin films with arrayed void-column network deposited by high density plasma
Collins et al. Real-time and spectroscopic ellipsometry characterizatio of diamond and diamond-like carbon
CA1332720C (en) Production of polymer-metal compounds and the production of said compounds by discharge in the glow-discharge zones
Kruzelecky et al. Dependence of optical gap in a-Si: H on bonded hydrogen concentration
Khairallah et al. Surface fluorination of polyethylene films by different glow discharges. Effects of frequency and electrode configuration
Panwar et al. Diamond‐like carbon films grown using a saddle field source
Okuyama A simple technique to deposit molybdenum thin films
Moon et al. Growth and characterization of thin SiN films grown on Si by electron cyclotron resonance nitrogen plasma treatment
Mailhiot et al. Electrical and compositional heterogeneity of amorphous Si: H films
Saito Effect of hydrocarbon gas on the properties of magnetron sputtering of amorphous SiC: H
Parmeter et al. Treatment of inp surfaces in radio frequency H2 and H2/CH4/Ar plasmas: In situ compositional analysis, etch rates, and surface roughness
Kruzelecky et al. The preparation of hydrogenated amorphous silicon by plasma-enhanced reactive evaporation
Horikawa et al. Effective species in inductively coupled nitrogen plasma for silicon nitriding
Morimoto et al. Parameters measurement of ECR silane plasma
Akagi et al. Low-resistivity highly transparent indium-tin-oxide thin films prepared at room temperature by synchrotron radiation ablation
Kuroki et al. Real‐time observation of ultrathin silicon oxide film growth using rapid ellipsometry
Sato et al. Plasma polymerization by magnetron glow discharge. II. Effect of magnetic field on chemical characteristics of plasma polymers of tetrafluoroethylene revealed by electron spectroscopy for chemical analysis
Smith et al. DC magnetron glow discharge amorphous silicon
Sakata et al. Field evaporation of silicon surfaces
Lei et al. Effect of discharge parameters on properties of diamond-like carbon films prepared by dual-frequency capacitively coupled plasma source