Yamauchi et al., 2004 - Google Patents
Platinum thin film with a highly ordered mesostructure by contact platingYamauchi et al., 2004
- Document ID
- 14067202271044247951
- Author
- Yamauchi Y
- Yokoshima T
- Momma T
- Osaka T
- Kuroda K
- Publication year
- Publication venue
- Chemistry letters
External Links
Snippet
By a contact plating technique using a galvanic reaction between Al and Au in the presence of Pt complex, we have for the first time succeeded in the formation of a highly ordered mesostructured Pt film on a Au surface by reduction of Pt ions in the presence of lyotropic …
- 238000007747 plating 0 title abstract description 10
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1646—Characteristics of the product obtained
- C23C18/165—Multilayered product
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pre-treatment of the material to be coated
- C23C18/1803—Pre-treatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of work-pieces
- C25D5/48—After-treatment of electroplated surfaces
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
- C25D11/18—After-treatment, e.g. pore-sealing
Similar Documents
Publication | Publication Date | Title |
---|---|---|
Yamauchi et al. | Highly ordered mesostructured Ni particles prepared from lyotropic liquid crystals by electroless deposition: the effect of reducing agents on the ordering of mesostructure | |
Xu et al. | Preparation of II-VI group semiconductor nanowire arrays by dc electrochemical deposition in porous aluminum oxide templates | |
US7309412B2 (en) | Compositions and coatings including quasicrystals | |
TWI478185B (en) | Super capacitor and method for manufacturing the same | |
JP4813925B2 (en) | Manufacturing method of fine structure and fine structure | |
Chen et al. | Fabrication and characterization of highly-ordered valve-metal oxide nanotubes and their derivative nanostructures | |
Li et al. | Fabrication and characterization of bulk nanoporous copper by dealloying Al–Cu alloy slices | |
CN107313088B (en) | A method of based on the nanocrystalline functional coating of anodic oxidation porous metals primary surface electro-deposition | |
Yamauchi et al. | Platinum thin film with a highly ordered mesostructure by contact plating | |
Li et al. | Electroless deposition of open-end Cu nanotube arrays | |
JP4768478B2 (en) | Manufacturing method of fine structure and fine structure | |
Inguanta et al. | Fabrication of metal nano-structures using anodic alumina membranes grown in phosphoric acid solution: Tailoring template morphology | |
Azizi et al. | End-closed NiCoFe-B nanotube arrays by electroless method | |
Xu et al. | Effects of electroless nickel plating method for low temperature joining ZnS ceramics | |
Kang et al. | A protocol for fast electroless Ni-P on Al alloy at medium-low temperature accelerated by hierarchically structured Cu immersion layer | |
Ma et al. | Influence of dealloying solution on the microstructure of nanoporous copper through chemical dealloying of Al75Cu25 ribbons | |
Jiang et al. | Effect of direct current density on microstructure of tungsten coating electroplated from Na2WO4-WO3-NaPO3 system | |
Joo et al. | Hierarchical multi-porous copper structure prepared by dealloying electrolytic copper-manganese alloy | |
CN113668035A (en) | One-step in-situ generation Zn-MOF coating on surface of micro-arc magnesium oxide alloy and preparation method thereof | |
WO2008154926A1 (en) | A microporous coating or structure and a process for producing it | |
CN114015903B (en) | Preparation method of high-porosity black porous metal film | |
Cao et al. | Controlled synthesis of porous platinum nanostructures for catalytic applications | |
Li et al. | In-situ synthesis and characterization of CeO2–TiO2 composite coatings on titanium substrate by micro-arc oxidation | |
Cherevko et al. | Electrodeposition mechanism of palladium nanotube and nanowire arrays | |
Mehmood et al. | Electrochemical process and phase formation of Fe-based alloy nanowires into anodic alumina oxide |