Hansson et al., 2004 - Google Patents
Liquid-jet laser–plasma extreme ultraviolet sources: from droplets to filamentsHansson et al., 2004
View PDF- Document ID
- 1346089276019512476
- Author
- Hansson B
- Hertz H
- Publication year
- Publication venue
- Journal of Physics D: Applied Physics
External Links
Snippet
The laser plasma is one of the major contenders as a high-power source for future high- volume-manufacturing extreme ultraviolet lithography systems. Such laser–plasma sources require a target system that allows high-repetition-rate operation with low debris and …
- 210000002381 Plasma 0 abstract description 80
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Exposure apparatus for microlithography
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70033—Production of exposure light, i.e. light sources by plasma EUV sources
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Exposure apparatus for microlithography
- G03F7/708—Construction of apparatus, e.g. environment, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution, removing pollutants from apparatus; electromagnetic and electrostatic-charge pollution
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Exposure apparatus for microlithography
- G03F7/708—Construction of apparatus, e.g. environment, hygiene aspects or materials
- G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
- H05G2/005—X-ray radiation generated from plasma being produced from a liquid or gas containing a metal as principal radiation generating component
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Exposure apparatus for microlithography
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
- G03F7/70175—Lamphouse reflector arrangements, i.e. collecting light from solid angle upstream of the light source
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01S—DEVICES USING STIMULATED EMISSION
- H01S3/00—Lasers, i.e. devices for generation, amplification, modulation, demodulation, or frequency-changing, using stimulated emission, of infra-red, visible, or ultra-violet waves
- H01S3/14—Lasers, i.e. devices for generation, amplification, modulation, demodulation, or frequency-changing, using stimulated emission, of infra-red, visible, or ultra-violet waves characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing more than one atom
- H01S3/225—Gases the active gas being polyatomic, i.e. containing more than one atom comprising an excimer or exciplex
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
- H05G2/006—X-ray radiation generated from plasma being produced from a liquid or gas details of the ejection system, e.g. constructional details of the nozzle
Similar Documents
Publication | Publication Date | Title |
---|---|---|
Hansson et al. | Liquid-jet laser–plasma extreme ultraviolet sources: from droplets to filaments | |
EP1109427B1 (en) | Method for emitting radiation for use in lithographic projection apparatus | |
US7812329B2 (en) | System managing gas flow between chambers of an extreme ultraviolet (EUV) photolithography apparatus | |
JP4555679B2 (en) | Method for producing X-rays or extreme ultraviolet rays and method for using the same | |
US7655925B2 (en) | Gas management system for a laser-produced-plasma EUV light source | |
JP5597993B2 (en) | Laser generated plasma EUV light source | |
Hansson et al. | A liquid-xenon-jet laser-plasma X-ray and EUV source | |
US9986628B2 (en) | Method and apparatus for generating radiation | |
US8368032B2 (en) | Radiation source, lithographic apparatus, and device manufacturing method | |
US9091944B2 (en) | Source collector, lithographic apparatus and device manufacturing method | |
EP2707099A1 (en) | Droplet generator with actuator induced nozzle cleaning | |
Schnürer et al. | Influence of laser pulse width on absolute EUV-yield from Xe-clusters | |
EP2161725A2 (en) | Radiation source, lithographic apparatus and device manufacturing method | |
US20130015373A1 (en) | EUV Radiation Source and EUV Radiation Generation Method | |
Hansson et al. | Characterization of a liquid-xenon-jet laser-plasma extreme-ultraviolet source | |
Wieland et al. | EUV and fast ion emission from cryogenic liquid jet target laser-generated plasma | |
Hertz et al. | Debris-free soft x-ray generation using a liquid droplet laser-plasma target | |
KR20120130321A (en) | Radiation source, lithographic apparatus and device manufacturing method | |
Hansson et al. | Status of the liquid-xenon-jet laser-plasma source for EUV lithography | |
Komori et al. | Laser-produced-plasma light source development for extreme ultraviolet lithography | |
JP6940529B2 (en) | Debris reduction system, radiation source and lithography equipment | |
Rymell et al. | Liquid-jet target laser-plasma sources for EUV and X-ray lithography | |
Rymell et al. | X-ray and EUV laser-plasma sources based on cryogenic liquid-jet target | |
Hansson et al. | Xenon liquid-jet laser plasma source for EUV lithography | |
Hansson et al. | Liquid-xenon-jet laser-plasma source for EUV lithography |