Schulze et al., 2009 - Google Patents
Optimization of the electrical asymmetry effect in dual-frequency capacitively coupled radio frequency discharges: Experiment, simulation, and modelSchulze et al., 2009
View PDF- Document ID
- 12790515404058878779
- Author
- Schulze J
- Schüngel E
- Czarnetzki U
- Donkó Z
- Publication year
- Publication venue
- Journal of Applied Physics
External Links
Snippet
An electrical asymmetry in capacitive rf discharges with a symmetrical electrode configuration can be induced by driving the discharge with a fundamental frequency and its second harmonic. For equal amplitudes of the applied voltage waveforms, it has been …
- 238000004088 simulation 0 title abstract description 27
Classifications
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes, e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes, e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
- H01J37/32917—Plasma diagnostics
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes, e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/3255—Material
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING; COUNTING
- G06F—ELECTRICAL DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterized by the transducing means
- G06F3/046—Digitisers, e.g. for touch screens or touch pads, characterized by the transducing means by electromagnetic means
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
Similar Documents
Publication | Publication Date | Title |
---|---|---|
Schulze et al. | Optimization of the electrical asymmetry effect in dual-frequency capacitively coupled radio frequency discharges: Experiment, simulation, and model | |
Lafleur et al. | Separate control of the ion flux and ion energy in capacitively coupled radio-frequency discharges using voltage waveform tailoring | |
Donkó et al. | Self-excited nonlinear plasma series resonance oscillations in geometrically symmetric capacitively coupled radio frequency discharges | |
Donkó et al. | The effect of secondary electrons on the separate control of ion energy and flux in dual-frequency capacitively coupled radio frequency discharges | |
Franek et al. | Power supply and impedance matching to drive technological radio-frequency plasmas with customized voltage waveforms | |
Korolov et al. | The influence of the secondary electron induced asymmetry on the electrical asymmetry effect in capacitively coupled plasmas | |
Schulze et al. | Coupling effects in inductive discharges with radio frequency substrate biasing | |
Sharma et al. | Plasma density and ion energy control via driving frequency and applied voltage in a collisionless capacitively coupled plasma discharge | |
Schulze et al. | Making a geometrically asymmetric capacitive rf discharge electrically symmetric | |
Karkari et al. | Effect of radio-frequency power levels on electron density in a confined two-frequency capacitively-coupled plasma processing tool | |
Schüngel et al. | Prevention of ion flux lateral inhomogeneities in large area capacitive radio frequency plasmas via the electrical asymmetry effect | |
Mussenbrock et al. | A nonlinear global model of a dual frequency capacitive discharge | |
Lafleur et al. | Frequency dependence of the electrical asymmetry effect in dual-frequency capacitively coupled discharges | |
Liu et al. | Experimental observation of standing wave effect in low-pressure very-high-frequency capacitive discharges | |
Li et al. | Modulating effects of the low-frequency source on ion energy distributions in a dual frequency capacitively coupled plasma | |
Bera et al. | Control of plasma uniformity in a capacitive discharge using two very high frequency power sources | |
Bera et al. | Effects of interelectrode gap on high frequency and very high frequency capacitively coupled plasmas | |
Guan et al. | Simulations of dual rf-biased sheaths and ion energy distributions arriving at a dual rf-biased electrode | |
Saikia et al. | The electrical asymmetry effect in a multi frequency geometrically asymmetric capacitively coupled plasma: A study by a nonlinear global model | |
Zhang et al. | Comparison of electrostatic and electromagnetic simulations for very high frequency plasmas | |
Liu et al. | Non-linear effects and electron heating dynamics in radio-frequency capacitively coupled plasmas with a non-uniform transverse magnetic field | |
Liu et al. | Simulations of electromagnetic effects in large-area high-frequency capacitively coupled plasmas with symmetric electrodes: Different axial plasma density profiles | |
Zhao et al. | Experimental investigations of the plasma radial uniformity in single and dual frequency capacitively coupled argon discharges | |
Kim et al. | On the E to H mode transition in a dual frequency (2 and 13.56 MHz) inductively coupled plasma | |
Masheyeva et al. | Self-bias voltage formation and charged particle dynamics in multi-frequency capacitively coupled plasmas |