[go: up one dir, main page]
More Web Proxy on the site http://driver.im/

Hegazy et al., 2002 - Google Patents

Observation of step-flow growth in femtosecond pulsed laser deposition of Si on Si (100)-2× 1

Hegazy et al., 2002

Document ID
12743548384922862582
Author
Hegazy M
Elsayed-Ali H
Publication year
Publication venue
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

External Links

Snippet

Step-flow growth mode is observed for 100 fs pulsed laser deposition (fsPLD) of Si on vicinal Si (100)-2× 1, while the Volmer–Weber mode is observed for fsPLD of Si on Si (100)-1× 1. Reflection high-energy electron diffraction (RHEED) is used to in situ monitor the dynamics …
Continue reading at pubs.aip.org (other versions)

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating

Similar Documents

Publication Publication Date Title
Wulfhekel et al. Conventional and manipulated growth of Cu/Cu (111)
Xu et al. Impact of the interplay between nonstoichiometry and kinetic energy of the plume species on the growth mode of SrTiO3 thin films
Chini et al. Ripple formation on silicon by medium energy ion bombardment
Stringfellow et al. Dislocations in GaAs17− xPx
Wisniewski et al. Experimental evidence concerning the significant information depth of electron backscatter diffraction (EBSD)
Tong et al. The comparison between CdS thin films grown on Si (111) substrate and quartz substrate by femtosecond pulsed laser deposition
Hasan et al. Epitaxial growth of Al on Si by thermal evaporation in ultra-high vacuum: growth on Si (100) 2× 1 single and double domain surfaces at room temperature
Rodrigo et al. Characterization of yttria-stabilized zirconia thin films grown by pulsed laser deposition (PLD) on various substrates
Hegazy et al. Observation of step-flow growth in femtosecond pulsed laser deposition of Si on Si (100)-2× 1
Headrick et al. Real-time x-ray-scattering measurement of the nucleation kinetics of cubic gallium nitride on β-SiC (001)
Gupta et al. Effect of microstructure on diffusion of copper in TiN films
Dauscher et al. Unusual growth of pulsed laser deposited bismuth films on Si (100)
Zaytouni et al. Structural characterization of SiC films prepared by dynamic ion mixing
Carter et al. Micron thick epitaxial (100) Ag film growth on MgO
Dauscher et al. Temperature-dependant growth of PbTe pulsed laser deposited films on various substrates
Li et al. Self-assembly of epitaxial Ag nanoclusters on H-terminated Si (111) surfaces
Orr et al. The surface evolution and kinetic roughening during homoepitaxy of GaAs (001)
Bocquet et al. On the low-temperature growth of Pb on Cu (100)
Chung et al. Formation of coherent Ge shallow dome islands on Si (001) by ultra-high-vacuum ion beam sputter deposition
Robin et al. CdSe quantum dot formation: alternative paths to relaxation of a strained CdSe layer and influence of the capping conditions
Koster et al. In situ initial growth studies of SrTiO 3 on SrTiO 3 by time resolved high pressure RHEED
Shklyaev et al. Instability of 2D Ge layer near the transition to 3D islands on Si (111)
Zhang et al. EM, XPS and LEED study of deposition of Ag on hydrogenated Si substrate prepared by wet chemical treatments
Lee et al. Grain boundary diffusion effects on the sputter depth profiles of Co–Ag bilayers
Dunn et al. Texture transformations in reactive metal films deposited upon amorphous substrates