Hegazy et al., 2002 - Google Patents
Observation of step-flow growth in femtosecond pulsed laser deposition of Si on Si (100)-2× 1Hegazy et al., 2002
- Document ID
- 12743548384922862582
- Author
- Hegazy M
- Elsayed-Ali H
- Publication year
- Publication venue
- Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
External Links
Snippet
Step-flow growth mode is observed for 100 fs pulsed laser deposition (fsPLD) of Si on vicinal Si (100)-2× 1, while the Volmer–Weber mode is observed for fsPLD of Si on Si (100)-1× 1. Reflection high-energy electron diffraction (RHEED) is used to in situ monitor the dynamics …
- 238000004549 pulsed laser deposition 0 title abstract description 4
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
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