[go: up one dir, main page]
More Web Proxy on the site http://driver.im/

Lin et al., 2021 - Google Patents

Flow analysis and relative humidity (RH) measurement in the horizontal plane of a front opening unified pod (FOUP)

Lin et al., 2021

Document ID
12630391242039965662
Author
Lin T
Zargar O
Chen H
Huang Y
Hu S
Leggett G
Publication year
Publication venue
IEEE Transactions on Semiconductor Manufacturing

External Links

Snippet

Moisture removal techniques such as purge have been developed for the front opening unified pod (FOUP) in the semiconductor industry. The FOUP purge can significantly increase the quality of integrated circuit (IC) products. An experimental model of a simulated …
Continue reading at ieeexplore.ieee.org (other versions)

Classifications

    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67028Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/67034Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67155Apparatus for manufacturing or treating in a plurality of work-stations
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer, carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H01L2021/60Attaching or detaching leads or other conductive members, to be used for carrying current to or from the device in operation
    • H01L2021/60007Attaching or detaching leads or other conductive members, to be used for carrying current to or from the device in operation involving a soldering or an alloying process
    • H01L2021/60022Attaching or detaching leads or other conductive members, to be used for carrying current to or from the device in operation involving a soldering or an alloying process using bump connectors, e.g. for flip chip mounting
    • H01L2021/60097Applying energy, e.g. for the soldering or alloying process
    • H01L2021/60172Applying energy, e.g. for the soldering or alloying process using static pressure
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041Cleaning

Similar Documents

Publication Publication Date Title
Lin et al. Flow analysis and relative humidity (RH) measurement in the horizontal plane of a front opening unified pod (FOUP)
US5846338A (en) Method for dry cleaning clean room containers
CN100477103C (en) Atmospheric transfer chamber and after-processing transfer method of processed object
TWI777463B (en) Substrate processing method and substrate processing apparatus
US8992687B2 (en) Substrate processing apparatus, method for processing substrate, and storage medium
US20140158172A1 (en) System and method of cleaning foup
TWI741380B (en) Substrate processing apparatus and substrate processing method
US9607871B2 (en) EFEM system and lid opening/closing method
TWI702634B (en) Determination method and substrate processing equipment
KR101208800B1 (en) Inspecting apparatus and method
US20040221871A1 (en) Semiconductor wafer processing apparatus and method therefor
KR101641390B1 (en) Station and method for measuring the contamination of an enclosure used for transporting semiconductor substrates
US20200135525A1 (en) Side storage pods, equipment front end modules, and methods for operating efems
CN106409731B (en) A kind of nitrogen cooling system of boiler tube and the cooling means of wafer and cassette
Lin et al. Flow characteristics and velocity fields of a front opening unified pod at open door condition
KR101310513B1 (en) Substrate cleaning method
KR102257733B1 (en) Inspection apparatus and cleaning method of inspection apparatus
KR100878163B1 (en) Transport passage interface structure for transport of a wafer and method for creating a reduced particle environment in a vicinity of a mechanically active transport passage interface
TWI746907B (en) Fume determination method, substrate processing method, and substrate processing equipment
US20050198857A1 (en) Apparatus and method for removing organic contamination adsorbed onto substrate, and apparatus and method for measuring thickness of thin film formed on substrate
Lin et al. The effect of purge flow rate and wafer arrangement on humidity invasion into a loaded front opening unified pod (FOUP)
Lin et al. A comparative study on velocity fields, humidity and oxygen concentration in a front opening unified pod (FOUP) during purge
US20210013059A1 (en) Substrate processing apparatus and substrate processing method
Benalcazar et al. A Numerical Study on the Effects of Purge and Air Curtain Flow Rates on Humidity Invasion Into a Front Opening Unified Pod (FOUP)
JP3237741B2 (en) Inspection equipment with high cleanliness