[go: up one dir, main page]
More Web Proxy on the site http://driver.im/

Elbakyan et al., 2015 - Google Patents

Memristors based on lithium doped ZnO films

Elbakyan et al., 2015

Document ID
1147895406569433704
Author
Elbakyan E
Hovsepyan R
Poghosyan A
Publication year
Publication venue
Journal of Contemporary Physics (Armenian Academy of Sciences)

External Links

Snippet

The memristor memory cell ReRAM was developed and investigated. The developed structure consists of a Schottky diode (1D) based on the ZnO: Ga/ZnO: Li/ZnO heterostructure and the memristor (1R) based on the Pt/ZnO/ZnO: Li/Al heterostructure …
Continue reading at link.springer.com (other versions)

Classifications

    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L45/00Solid state devices adapted for rectifying, amplifying, oscillating or switching without a potential-jump barrier or surface barrier, e.g. dielectric triodes; Ovshinsky-effect devices; Processes or apparatus peculiar to the manufacture or treatment thereof or of parts thereof
    • H01L45/04Bistable or multistable switching devices, e.g. for resistance switching non-volatile memory
    • H01L45/12Details
    • H01L45/122Device geometry
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L45/00Solid state devices adapted for rectifying, amplifying, oscillating or switching without a potential-jump barrier or surface barrier, e.g. dielectric triodes; Ovshinsky-effect devices; Processes or apparatus peculiar to the manufacture or treatment thereof or of parts thereof
    • H01L45/04Bistable or multistable switching devices, e.g. for resistance switching non-volatile memory
    • H01L45/14Selection of switching materials
    • H01L45/145Oxides or nitrides
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L45/00Solid state devices adapted for rectifying, amplifying, oscillating or switching without a potential-jump barrier or surface barrier, e.g. dielectric triodes; Ovshinsky-effect devices; Processes or apparatus peculiar to the manufacture or treatment thereof or of parts thereof
    • H01L45/04Bistable or multistable switching devices, e.g. for resistance switching non-volatile memory
    • H01L45/16Manufacturing
    • H01L45/1608Formation of the switching material, e.g. layer deposition
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • H01L29/786Thin film transistors, i.e. transistors with a channel being at least partly a thin film
    • H01L29/7869Thin film transistors, i.e. transistors with a channel being at least partly a thin film having a semiconductor body comprising an oxide semiconductor material, e.g. zinc oxide, copper aluminium oxide, cadmium stannate
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies; Multistep manufacturing processes therefor
    • H01L29/12Semiconductor bodies; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof; Multistep manufacturing processes therefor
    • H01L29/40Electrodes; Multistep manufacturing processes therefor
    • H01L29/43Electrodes; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/49Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET
    • H01L29/51Insulating materials associated therewith
    • H01L29/516Insulating materials associated therewith with at least one ferroelectric layer
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C13/00Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00 - G11C25/00
    • G11C13/0002Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00 - G11C25/00 using resistance random access memory [RRAM] elements
    • G11C13/0021Auxiliary circuits
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L43/00Devices using galvano-magnetic or similar magnetic effects; Processes or apparatus peculiar to the manufacture or treatment thereof or of parts thereof
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof

Similar Documents

Publication Publication Date Title
Kim et al. Stable bipolar resistive switching characteristics and resistive switching mechanisms observed in aluminum nitride-based ReRAM devices
Chu et al. Charge quantity influence on resistance switching characteristic during forming process
Syu et al. Redox Reaction Switching Mechanism in RRAM Device With $\hbox {Pt/CoSiO} _ {X}\hbox {/}\hbox {TiN} $ Structure
Watanabe et al. Current-driven insulator–conductor transition and nonvolatile memory in chromium-doped SrTiO 3 single crystals
Shuai et al. Nonvolatile Multilevel Resistive Switching in $\hbox {Ar}^{+} $ Irradiated $\hbox {BiFeO} _ {3} $ Thin Films
Sun et al. Effect of carrier screening on ZnO-based resistive switching memory devices
Pan et al. Resistive switching behavior in single crystal SrTiO3 annealed by laser
US9818479B2 (en) Switchable macroscopic quantum state devices and methods for their operation
Shuai et al. Improved retention of nonvolatile bipolar BiFeO3 resistive memories validated by memristance measurements
Zhang et al. Resistive switching behaviour of highly epitaxial CeO2 thin film for memory application
Liu et al. Reversible transition of filamentary and ferroelectric resistive switching in BaTiO 3/SmNiO 3 heterostructures
Lin et al. Effects of Vanadium Doping on Resistive Switching Characteristics and Mechanisms of $\hbox {SrZrO} _ {3} $-Based Memory Films
Kossar et al. Investigation on asymmetric resistive switching (RS) characteristics in p-NiO/n-ZnO heterojunctions
Velpula et al. Low-power multilevel resistive switching in β-Ga2O3 based RRAM devices
Pergament et al. Novel hypostasis of old materials in oxide electronics: metal oxides for resistive random access memory applications
Zhang et al. Electrode effect regulated resistance switching and selector characteristics in Nb doped SrTiO3 single crystal for potential cross-point memory applications
Zhu et al. Bipolar Resistive Switching Characteristic of Epitaxial NiO Thin Film on Nb‐Doped SrTiO3 Substrate
CN105575991B (en) Memory structure and method of forming the same
Elbakyan et al. Memristors based on lithium doped ZnO films
Younas et al. Reversible tuning of ferromagnetism and resistive switching in ZnO/Cu thin films
US10141506B2 (en) Resistive switching co-sputtered Pt—(NiO—Al2O3)—Pt devices
Li et al. Temperature dependence of threshold switching in NbO x thin films
Wang et al. Deposition temperature and thickness effect on the resistive switching in BiFeO 3 films
Wong et al. Modulating magnetism in ferroelectric polymer-gated perovskite manganite films with moderate gate pulse chains
Zhang et al. Metal/ZnO/MgO/Si/Metal write-once-read-many-times memory