Baturin et al., 2017 - Google Patents
Electron emission projection imagerBaturin et al., 2017
View PDF- Document ID
- 11190484225594863602
- Author
- Baturin S
- Baryshev S
- Publication year
- Publication venue
- Review of Scientific Instruments
External Links
Snippet
A new projection type imaging system is presented. The system can directly image the field emission site distribution on a cathode surface by making use of anode screens in the standard parallel plate configuration. The lateral spatial resolution of the imager is on the …
- 238000003384 imaging method 0 abstract description 21
Classifications
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/244—Detectors; Associated components or circuits therefor
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/06—Sources
- H01J2237/08—Ion sources
- H01J2237/0802—Field ionization sources
- H01J2237/0807—Gas field ion sources [GFIS]
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/317—Processing objects on a micro-scale
- H01J2237/3174—Etching microareas
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes, e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/2602—Details
- H01J2237/2605—Details operating at elevated pressures, e.g. atmosphere
- H01J2237/2608—Details operating at elevated pressures, e.g. atmosphere with environmental specimen chamber
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
- H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J31/00—Cathode ray tubes; Electron beam tubes
- H01J31/08—Cathode ray tubes; Electron beam tubes having a screen on or from which an image or pattern is formed, picked up, converted, or stored
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometer or separator tubes
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| Baturin et al. | Electron emission projection imager | |
| Munroe | The application of focused ion beam microscopy in the material sciences | |
| Miller et al. | The local electrode atom probe | |
| Schwarzer et al. | Present state of electron backscatter diffraction and prospective developments | |
| Odom et al. | Quantitative image acquisition system for ion microscopy based on the resistive anode encoder | |
| Cowley et al. | System for reflection electron microscopy and electron diffraction at intermediate energies | |
| Hembree et al. | Biassed secondary electron imaging in a UHV-STEM | |
| US10714294B2 (en) | Metal protective layer for electron emitters with a diffusion barrier | |
| Serbun et al. | Advanced field emission measurement techniques for research on modern cold cathode materials and their applications for transmission-type x-ray sources | |
| Mayer et al. | Mapping of ELNES on a nanometre scale by electron spectroscopic imaging | |
| US8093567B2 (en) | Method and system for counting secondary particles | |
| EP3258246A1 (en) | Analysis method and analysis device provided with same | |
| Venables et al. | Surface studies in a UHV field emission gun scanning electron microscope | |
| Vecchione et al. | Effect of roughness on emittance of potassium cesium antimonide photocathodes | |
| Chang | X‐ray photoelectron and Auger analysis of thin films | |
| Neugebohrn et al. | Spatial correlation of photo-induced and thermionic electron emission from low work function diamond films | |
| Mizzi et al. | Charging ain't all bad: Complex physics in DyScO3 | |
| Triftshäuser et al. | A scanning positron microscope for defect analysis in materials science | |
| Gunawardane et al. | Auger electron spectroscopy | |
| Le Pimpec et al. | Vacuum breakdown limit and quantum efficiency obtained for various technical metals using dc and pulsed voltage sources | |
| JPH0712763A (en) | Surface analysis method and surface analysis device | |
| US5130539A (en) | Imaging beta tracer microscope | |
| Nakano et al. | Work function measurement of modified W (100) surface with transition metal by photoemission electron microscopy | |
| Robertson et al. | Charge contrast imaging of gibbsite using the variable pressure SEM | |
| Hubin et al. | X-ray photoelectron and Auger electron spectroscopy |