[go: up one dir, main page]
More Web Proxy on the site http://driver.im/

Houbertz, 2005 - Google Patents

Laser interaction in sol–gel based materials—3-D lithography for photonic applications

Houbertz, 2005

Document ID
10881594558447837020
Author
Houbertz R
Publication year
Publication venue
Applied Surface Science

External Links

Snippet

As an example for laser interactions with polymer materials, inorganic–organic hybrid polymers were polymerized with femtosecond laser pulses, making use of two-photon absorption (TPA) processes. The material was synthesized by catalytically controlled …
Continue reading at www.sciencedirect.com (other versions)

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B6/00—Light guides
    • G02B6/10—Light guides of the optical waveguide type
    • G02B6/12—Light guides of the optical waveguide type of the integrated circuit kind
    • G02B6/122—Light guides of the optical waveguide type of the integrated circuit kind basic optical elements, e.g. light-guiding paths
    • G02B6/1221—Light guides of the optical waveguide type of the integrated circuit kind basic optical elements, e.g. light-guiding paths made from organic materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B6/00—Light guides
    • G02B6/10—Light guides of the optical waveguide type
    • G02B6/12—Light guides of the optical waveguide type of the integrated circuit kind
    • G02B6/13—Integrated optical circuits characterised by the manufacturing method
    • G02B6/138—Integrated optical circuits characterised by the manufacturing method by using polymerisation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B6/00—Light guides
    • G02B6/10—Light guides of the optical waveguide type
    • G02B6/12—Light guides of the optical waveguide type of the integrated circuit kind
    • G02B2006/12166—Manufacturing methods
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made
    • G02B1/002—Optical elements characterised by the material of which they are made made of materials engineered to provide properties not available in nature, e.g. metamaterials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/165—Monolayers, e.g. Langmuir-Blodgett
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Similar Documents

Publication Publication Date Title
Houbertz Laser interaction in sol–gel based materials—3-D lithography for photonic applications
Wang et al. Two‐photon polymerization lithography for optics and photonics: fundamentals, materials, technologies, and applications
Harinarayana et al. Two-photon lithography for three-dimensional fabrication in micro/nanoscale regime: A comprehensive review
Zhang et al. Structural multi-colour invisible inks with submicron 4D printing of shape memory polymers
Houbertz et al. Inorganic–organic hybrid polymers for information technology: from planar technology to 3D nanostructures
Ovsianikov et al. Ultra-low shrinkage hybrid photosensitive material for two-photon polymerization microfabrication
Wu et al. Two-photon polymerisation for three-dimensional micro-fabrication
Ovsianikov et al. Two‐Photon Polymerization of Hybrid Sol‐Gel Materials for Photonics Applications
Li et al. Multiphoton polymerization
Burmeister et al. Materials and technologies for fabrication of three-dimensional microstructures with sub-100 nm feature sizes by two-photon polymerization
Urness et al. Liquid deposition photolithography for submicrometer resolution three-dimensional index structuring with large throughput
US10343332B2 (en) Production of 3D free-form waveguide structures
Geisler et al. 3D printing of optical materials by processes based on photopolymerization: materials, technologies, and recent advances
Jia et al. Two-photon polymerization for three-dimensional photonic devices in polymers and nanocomposites
Houbertz et al. Investigations on the generation of photonic crystals using two‐photon polymerization (2PP) of inorganic–organic hybrid polymers with ultra‐short laser pulses
Garliauskas et al. Laser intensity-based geometry control of periodic submicron polymer structures fabricated by laser interference lithography
Malinauskas et al. Direct laser writing of microoptical structures using a Ge-containing hybrid material
Tzadka et al. Surface plasticizing of chalcogenide glasses: a route for direct nanoimprint with multifunctional antireflective and highly hydrophobic structures
JP3811840B2 (en) Method for creating photonic crystal structure by laser interference
Ovsianikov et al. Three dimensional material processing with femtosecond lasers
Stichel et al. Compensation of spherical aberration influences for two-photon polymerization patterning of large 3D scaffolds
Nishiyama et al. Microlens arrays of high-refractive-index glass fabricated by femtosecond laser lithography
Woods et al. Epoxy silicone based matrix materials for two-photon patterning of optical waveguides
Gu et al. Fabrication of three‐dimensional photonic crystals in quantum‐dot‐based materials
Lange et al. Photoprocessable polymer opals