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Tang et al., 2015 - Google Patents

Investigation of low-temperature hydrogen plasma-etching processes for silicon wafer solar cell surface passivation in an industrial inductively coupled plasma …

Tang et al., 2015

Document ID
10112394835971172697
Author
Tang M
Ge J
Wong J
Liu Z
Dippell T
Zhang Z
Huber M
Doerr M
Hohn O
Wohlfart P
Aberle A
Mueller T
Publication year
Publication venue
IEEE Journal of Photovoltaics

External Links

Snippet

A hydrofluoric-acid (HF)-free hydrogen plasma dry etching process prior to the deposition of intrinsic amorphous silicon onto thin n-type planar Czochralski silicon wafers is developed. The influence of substrate temperature, hydrogen flow rate, and power density on the …
Continue reading at ieeexplore.ieee.org (other versions)

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