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Sambuco Salomone et al., 2018 - Google Patents

Electron trapping in amorphous Al2O3

Sambuco Salomone et al., 2018

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Document ID
9999097500628701145
Author
Sambuco Salomone L
Campabadal F
Faigón A
Publication year
Publication venue
Journal of Applied Physics

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Snippet

The electron trapping in MOS capacitors with amorphous Al 2 O 3 as an insulating layer was studied through pulsed capacitance-voltage technique. A positive shift of the voltage value corresponding to a constant capacitance (VC) was observed. The dependences of the …
Continue reading at notablesdelaciencia.conicet.gov.ar (PDF) (other versions)

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    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer, carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/28Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in H01L21/20 - H01L21/268
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