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Li et al., 2011 - Google Patents

Experimental exploration of the correlation coefficient of static speckles in Fresnel configuration

Li et al., 2011

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Document ID
986693927093561522
Author
Li D
Kelly D
Sheridan J
Publication year
Publication venue
Dimensional optical metrology and inspection for practical applications

External Links

Snippet

Quasi-monochromatic light reflected from an optically rough surface produces a complicated 3D speckle field. This speckle field is often described using a correlation function from which the 3D speckle properties can be examined. The derivation of the correlation function is …
Continue reading at core.ac.uk (PDF) (other versions)

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G01N21/4795—Scattering, i.e. diffuse reflection spatially resolved investigating of object in scattering medium
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical means
    • G01B11/24—Measuring arrangements characterised by the use of optical means for measuring contours or curvatures
    • G01B11/2441—Measuring arrangements characterised by the use of optical means for measuring contours or curvatures using interferometry
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Exposure apparatus for microlithography
    • G03F7/70483—Information management, control, testing, and wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management and control, including software
    • G03F7/705—Modelling and simulation from physical phenomena up to complete wafer process or whole workflow in wafer fabrication
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Instruments as specified in the subgroups and characterised by the use of optical measuring means
    • G01B9/02—Interferometers for determining dimensional properties of, or relations between, measurement objects
    • G01B9/02015—Interferometers for determining dimensional properties of, or relations between, measurement objects characterised by a particular beam path configuration
    • G01B9/02022—Interferometers for determining dimensional properties of, or relations between, measurement objects characterised by a particular beam path configuration contacting one object by grazing incidence

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