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Piner et al., 1995 - Google Patents

New Buffer Layers for GaN on Sapphire by Atomic Layer and Molecular Stream Epitaxy

Piner et al., 1995

Document ID
9575989519749774883
Author
Piner E
He Y
Boutros K
McIntosh F
Roberts J
Bedair S
El-Masry N
Publication year
Publication venue
MRS Online Proceedings Library (OPL)

External Links

Snippet

The current approach of depositing a low temperature then annealed AlN or GaN buffer for the growth of GaN on sapphire results in a high dislocation density. These dislocations thread through the GaN layer to the surface. Reducing their density either by growing thicker …
Continue reading at www.cambridge.org (other versions)

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    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10Inorganic compounds or compositions
    • C30B29/40AIIIBV compounds wherein A is B, Al, Ga, In or Tl and B is N, P, As, Sb or Bi
    • C30B29/403AIII-nitrides
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    • C30B25/00Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02Epitaxial-layer growth
    • C30B25/18Epitaxial-layer growth characterised by the substrate
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