Bechtold et al., 1980 - Google Patents
ECR ion source for multiply-charged oxygen beamsBechtold et al., 1980
- Document ID
- 9555041538337906715
- Author
- Bechtold V
- Chan-Tung N
- Dousson S
- Geller R
- Jacquot B
- Jongen Y
- Publication year
- Publication venue
- Nuclear Instruments and Methods
External Links
Snippet
We present an ion source based upon the principle of electron cyclotron resonance and which delivers completely stripped oxygen ions. This source is a small scale Supermafios and is made up of permanent samarium cobalt magnets. It is the result of work performed in …
- 150000002500 ions 0 title abstract description 35
Classifications
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation
- H01J27/18—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation with an applied axial magnetic field
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes, e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
- H01J37/32431—Constructional details of the reactor
- H01J37/3266—Magnetic control means
- H01J37/32678—Electron cyclotron resonance
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometer or separator tubes
- H01J49/26—Mass spectrometers or separator tubes
- H01J49/28—Static spectrometers
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/08—Ion sources; Ion guns using arc discharge
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometer or separator tubes
- H01J49/02—Details
- H01J49/06—Electron- or ion-optical arrangements
- H01J49/062—Ion guides
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometer or separator tubes
- H01J49/02—Details
- H01J49/10—Ion sources; Ion guns
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/08—Ion sources; Ion guns
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometer or separator tubes
- H01J49/02—Details
- H01J49/022—Circuit arrangements, e.g. for generating deviation currents or voltages ; Components associated with high voltage supply
Similar Documents
Publication | Publication Date | Title |
---|---|---|
Geller | Electron cyclotron resonance multiply charged ion sources | |
Xie | Production of highly charged ion beams from electron cyclotron resonance ion sources | |
Donets | Review of the JINR electron beam ion sources | |
US5789744A (en) | Method for the production of atomic ion species from plasma ion sources | |
Geller et al. | Status of the multiply charged heavy‐ion source MINIMAFIOS | |
Lagniel et al. | Status and new developments of the high intensity electron cyclotron resonance source light ion continuous wave, and pulsed mode | |
EP0539566B1 (en) | System and method for increasing the efficiency of a cyclotron | |
Bechtold et al. | ECR ion source for multiply-charged oxygen beams | |
Ehlers et al. | Further study on a magnetically filtered multicusp ion source | |
Sortais | Recent progress in making highly charged ion beams | |
Kumar et al. | ECR ion source based low energy ion beam facility | |
Liehr et al. | Investigations of the new Giessen 10 GHz electron-cyclotron-resonance ion source | |
Bieth et al. | Electron cyclotron resonance ion source for high currents of mono-and multicharged ion and general purpose unlimited lifetime application on implantation devices | |
Clausnitzer et al. | An electron beam ion source for the production of multiply charged heavy ions | |
Saadatmand et al. | Performance of the Superconducting Super Collider H− rf volume ion source and Linac injector | |
Gobin et al. | Two approaches for H− ion production with 2.45 GHz ion sources | |
Dousson et al. | Electron cyclotron resonance source for heavy multiply charged ions | |
Okumura et al. | Development of a high brightness ion source for the proton linear accelerator (BTA) at JAERI | |
Saitoh et al. | Construction of mini‐ECRIS for the JAERI 400 kV ion implanter | |
Glavish | Recent Advances in Polarized Ion Sources | |
RU179352U1 (en) | TWO-STAGE SOURCE OF MULTI-CHARGED IONS WITH ELECTRON CYCLOTRON RESONANCE | |
Olivo et al. | The PSI 870 keV high intensity Cockcroft–Walton preinjector | |
Geller et al. | Status report on ECR stripped ion sources at CEN Grenoble | |
Farchi et al. | First results of a high‐current electron cyclotron resonance proton source | |
Bricault et al. | ECRIS development for an on line isotopic separator at GANIL |