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Wang et al., 2011 - Google Patents

Oxidation Behaviour of Ti2 AlN Films Composed Mainly of Nanolaminated MAX Phase

Wang et al., 2011

Document ID
8692313448664475895
Author
Wang Q
Garkas W
Renteria A
Leyens C
Kim K
Publication year
Publication venue
Journal of Nanoscience and Nanotechnology

External Links

Snippet

In this paper, we reported the oxidation behaviour of Ti2AlN films on polycrystalline Al2O3 substrates. The Ti2AlN films composed mainly of nanolaminated MAX phase was obtained by first depositing Ti–Al–N films using reactive sputtering of two elemental Ti and Al targets …
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