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Watanabe et al., 1987 - Google Patents

TARN rf stacking system

Watanabe et al., 1987

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Document ID
8681888868547774251
Author
Watanabe S
Katayama T
Yoshizawa M
Takanaka M
Fujino T
Publication year

External Links

Snippet

Repetitive rf stacking system for the TARN was developed. The developed system consists of ferrite loaded rf cavity, rf power amplifier, ferrite bias power supply and low level rf electronics. Ferrite material and rf signal source were studied to obtain a high-duty and …
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Classifications

    • H—ELECTRICITY
    • H01—BASIC ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes, e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R33/00—Arrangements or instruments for measuring magnetic variables
    • G01R33/20—Arrangements or instruments for measuring magnetic variables involving magnetic resonance
    • G01R33/28—Details of apparatus provided for in groups G01R33/44 - G01R33/64

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