MacLeod et al., 2010 - Google Patents
Ion Assisted Deposition of Conformal Coatings for the Manufacture of Large Area Wire Grid PolarizersMacLeod et al., 2010
- Document ID
- 8681757523808798145
- Author
- MacLeod B
- Smith D
- Xu B
- Smith S
- McCullough M
- Publication year
- Publication venue
- Optical Interference Coatings
External Links
Snippet
Ion Assisted Deposition of Conformal Coatings for the Manufacture of Large Area Wire Grid
Polarizers Page 1 Ion Assisted Deposition of Conformal Coatings for the Manufacture of
Large Area Wire Grid Polarizers B. MacLeod, DJSmith, B. Xu, SD Smith, M. McCullough …
- 238000004519 manufacturing process 0 title abstract description 12
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN101290446B (en) | TFT-LCD array substrate and method of manufacture | |
| CN105572780B (en) | Wire grid polarization device and preparation method thereof, display device | |
| EP4129890B1 (en) | Curved substrate etching method | |
| JP2023503697A (en) | optical metasurface film | |
| US11619773B2 (en) | Method of manufacturing metal wire and metal wire grid, wire grid polarizer, electronic device | |
| CN102822698A (en) | Optical element, and antireflective structure and process for production thereof | |
| TWI506806B (en) | Method for making solar cell | |
| US20160018579A1 (en) | Polarizer based on a nanowire grid | |
| CN107546102A (en) | A kind of method for preparing micro-nano-scale periodically or non-periodically structure in material surface | |
| US20090168170A1 (en) | Wire grid polarizer and method for fabricating the same | |
| MacLeod et al. | Ion Assisted Deposition of Conformal Coatings for the Manufacture of Large Area Wire Grid Polarizers | |
| Lee et al. | Fabrication of broadband anti-reflective sub-micron structures using polystyrene sphere lithography on a Si substrate | |
| Zhang et al. | Single-step maskless nano-lithography on glass by femtosecond laser processing | |
| CN108132496B (en) | Metal gate polarizer, manufacturing method thereof, liquid crystal panel and liquid crystal display | |
| US20030038033A1 (en) | Process for fabricating high aspect ratio embossing tool and microstructures | |
| CN109941959A (en) | A kind of production method of the coaxial annulus nanostructure of column | |
| TW200933223A (en) | Method for preparing photonic crystal slab waveguides | |
| CN111453692B (en) | Nano-pillar array and preparation method thereof | |
| CN115494568A (en) | Preparation method of micro lens array, micro lens array and application thereof | |
| WO2018156042A1 (en) | Nanowire grid polarizer on a curved surface and methods of making and using | |
| Lecestre et al. | Electroplated Ni mask for plasma etching of submicron-sized features in LiNbO3 | |
| CN113946006B (en) | Large-area micro-nano grating and preparation method and application thereof | |
| Kim et al. | Broadband antireflective silicon nanostructures produced by spin-coated Ag nanoparticles | |
| LU93245B1 (en) | Process for the production of an organized network of nanowires on a metallic substrate | |
| JP2011007837A (en) | Diffraction grating and method for producing the same |