LIU et al., 2016 - Google Patents
Application and research progress of fluidized bed-chemical vapor deposition technologyLIU et al., 2016
View PDF- Document ID
- 8622783702268880912
- Author
- LIU R
- LIU M
- SHAO Y
- LIU B
- Publication year
- Publication venue
- Chemical Industry and Engineering Progress
External Links
Snippet
Fluidized bed-chemical vapor deposition (FB-CVD) is widely used in industrial production owing to the combined advantages of both fluidized bed and chemical vapor deposition. Providing good heat and mass transfer, it can obtain a pure product with uniform deposition …
- 238000005229 chemical vapour deposition 0 title abstract 3
Classifications
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B31/00—Carbon; Compounds thereof
- C01B31/02—Preparation of carbon; Purification; After-treatment
- C01B31/0206—Nanosized carbon materials
- C01B31/022—Carbon nanotubes
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B31/00—Carbon; Compounds thereof
- C01B31/02—Preparation of carbon; Purification; After-treatment
- C01B31/0206—Nanosized carbon materials
- C01B31/0293—Other structures, e.g. nano-onions, nano-scrolls, nano-horns, nano-cones or nano-walls
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
- C01B33/021—Preparation
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