Irvine, 1997 - Google Patents
Metal-organic vapour phase epitaxyIrvine, 1997
- Document ID
- 8377048826663519699
- Author
- Irvine S
- Publication year
- Publication venue
- Narrow-gap II-VI Compounds for Optoelectronic and Electromagnetic Applications
External Links
Snippet
Since the first demonstration of the growth of mercury telluride in the early 80s using metal- organic vapour phase epitaxy (MOVPE), the research activity has been dominated by the need for large area, uniform epitaxial layers of MCT (HgCd, Te) for thermal imagers. As a …
- 238000002488 metal-organic chemical vapour deposition 0 title abstract description 68
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL-GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/40—AIIIBV compounds wherein A is B, Al, Ga, In or Tl and B is N, P, As, Sb or Bi
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL-GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL-GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B23/00—Single-crystal growth by condensing evaporated or sublimed material
- C30B23/02—Epitaxial-layer growth
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02551—Group 12/16 materials
- H01L21/02562—Tellurides
Similar Documents
Publication | Publication Date | Title |
---|---|---|
Abernathy | Compound semiconductor growth by metallorganic molecular beam epitaxy (MOMBE) | |
Varavin et al. | Molecular beam epitaxy of high quality Hg1− xCdxTe films with control of the composition distribution | |
US4650539A (en) | Manufacture of cadmium mercury telluride | |
Tennant et al. | Key issues in HgCdTe‐based focal plane arrays: An industry perspective | |
US5668395A (en) | Composition for InSB and GaAs thin film on silicon substrate for use in photodetectors | |
EP0200766B1 (en) | Method of growing crystalline layers by vapour phase epitaxy | |
JPH0650744B2 (en) | Method for producing cadmium mercury telluride | |
Miller et al. | Metalorganic chemical vapor deposition | |
Hoke et al. | Metal‐organic vapor deposition of CdTe and HgCdTe films | |
JPH0688871B2 (en) | Chemical beam deposition method | |
Irvine | Metal-organic vapour phase epitaxy | |
RUTKOWSKI et al. | Growth and properties of MOCVD HgCdTe epilayers on GaAs substrates | |
US5462008A (en) | Semiconductor films | |
Wang et al. | The growth and characterization of CdTe epitaxial layers on CdTe and InSb by metalorganic chemical vapor deposition | |
Lee et al. | Exploration of InSbBi for uncooled long-wavelength infrared photodetectors | |
Piotrowski et al. | Metal-organic chemical vapor deposition of Hg 1− x Cd x Te fully doped heterostructures without postgrowth anneal for uncooled MWIR and LWIR detectors | |
Piotrowski et al. | High capability, quasi-closed growth system for isothermal vapour phase epitaxy of (Hg, Cd) Te | |
US4487640A (en) | Method for the preparation of epitaxial films of mercury cadmium telluride | |
Madejczyk et al. | Uncooled middle wavelength infrared photoconductors based on (111) and (100) oriented HgCdTe | |
Irvine et al. | MOVPE growth of HgCdTe | |
Capper | Narrow Bandgap II-VI Semiconductors: Growth | |
Korenstein et al. | Indium doping of HgCdTe grown by metalorganic chemical vapor deposition-direct alloy growth using triisopropylindium and diisopropyltellurium triisopropylindium adduct | |
Madejczyk et al. | MOCVD Grown HgCdTe Heterostructures | |
Liao et al. | Direct growth of high-quality InxGa1-xAs strained layers on misoriented GaAs substrates grown by metalorganic chemical vapor deposition | |
CA1278272C (en) | Method of growing crystalline layers by vapour phase epitaxy |