Sandved et al., 1977 - Google Patents
2.9 Glow discharge polymerization of organic silicones (E-10)Sandved et al., 1977
- Document ID
- 7956166118311823818
- Author
- Sandved J
- Kristiansen K
- Publication year
- Publication venue
- Vacuum
External Links
Snippet
This paper presents some of the experiences obtained in using the Glow Discharge Polymerization process for making thin polymer silicone films. The rate of deposition is observed to be high compared to other vacuum processes used for deposition of thin …
- 238000006116 polymerization reaction 0 title abstract description 19
Classifications
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4938995A (en) | Fluoropolymer thin film coatings and method of preparation by plasma polymerization | |
| KR100505305B1 (en) | Article with capacitor | |
| Bhat et al. | Preparation and characterization of plasma‐polymerized thiophene films | |
| Zhu et al. | Epitaxial growth and planar dielectric properties of compositionally graded (Ba 1− x Sr x) TiO 3 thin films prepared by pulsed-laser deposition | |
| Devine et al. | Electrical properties of Ta2O5 films obtained by plasma enhanced chemical vapor deposition using a TaF5 source | |
| Chaudhari et al. | Corrosion protective poly (o-ethoxyaniline) coatings on copper | |
| Gurumurugan et al. | Correlations between the optical and electrical properties of CdO thin films deposited by spray pyrolysis | |
| Toureille et al. | The thermal step technique: an advanced method for studying the properties and testing the quality of polymers | |
| Cole et al. | Evaluation of Ta2O5 as a buffer layer film for integration of microwave tunable Ba1− xSrxTiO3 based thin films with silicon substrates | |
| Sandved et al. | 2.9 Glow discharge polymerization of organic silicones (E-10) | |
| Pignolet et al. | Rapid thermal processed thin films of niobium pentoxide (Nb2 O5) deposited by reactive magnetron sputtering | |
| Schwödiauer et al. | Pulsed‐laser–deposited and plasma‐polymerized polytetrafluoroethylene (PTFE)‐like thin films: A comparative study on PTFE‐specific properties | |
| US4735852A (en) | Electroconductive thin film | |
| Arai et al. | Estimating errors due to sample surface roughness in microwave complex permittivity measurements obtained using a coaxial probe | |
| Kim et al. | Electrical characteristics of thin Ta 2 O 5 films deposited by reactive pulsed direct-current magnetron sputtering | |
| Nasrin et al. | Thermal and AC electrical properties of thin films prepared from n-butyl methacrylate by a capacitively coupled plasma reactor | |
| Weber et al. | Electrical and optical properties of amorphous fluorocarbon films prepared by plasma polymerization of perfluoro-1, 3-dimethylcyclohexane | |
| Shashin et al. | Development of manufacturing technology of photo-dielectric sensitive element of ultraviolet range on the basis of thin films of zinc oxide | |
| Padmanabhan et al. | Photochemical vapor deposition of silicon nitride films | |
| Schwodiauer et al. | Dielectric and electret properties of novel Teflon PTFE and PTFE-like polymers | |
| Szmidt et al. | Dielectric strength of thin passivating diamond films for semiconductor devices | |
| Ristow | Time-dependent properties of organic thin films deposited by glow discharge | |
| Park et al. | A study of the electrical stability characteristics of a PVDF organic thin film fabricated by using the thermal vapor deposition method | |
| Phahle et al. | Dielectric properties of rf sputtered thin aluminium fluoride films | |
| Wyatt | Dielectric Anisotropy in Amorphous Ta2 O 5 Films |