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Petrov et al., 1984 - Google Patents

Highly oriented ZnO films obtained by dc reactive sputtering of a zinc target

Petrov et al., 1984

Document ID
7880173633682244914
Author
Petrov I
Orlinov V
Misiuk A
Publication year
Publication venue
Thin Solid Films

External Links

Snippet

Thin ZnO films were grown by dc reactive sputtering of a zinc target in conventional diode and magnetron systems in controlled Ar O 2 gas mixtures. It was found that in the magnetron system the transition from oxidized to unoxidized target is gradual and it is …
Continue reading at www.sciencedirect.com (other versions)

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    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
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    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
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    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
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    • C23C14/10—Glass or silica
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