Harmsma et al., 1999 - Google Patents
Multi wavelength lasers fabricated using selective area chemical beam epitaxyHarmsma et al., 1999
- Document ID
- 7876609768065489179
- Author
- Harmsma P
- Smit M
- Oei Y
- Leys M
- Verschuren C
- Vonk H
- Publication year
- Publication venue
- Integrated Photonics Research
External Links
Snippet
Fabrication of complex Photonic Integrated Circuits (PICs) requires the integration of Semiconductor Optical Amplifiers (SOAS) and Passive Waveguide Devices (PWDs) on a single substrate. Integrated SOAS can compensate for device losses and fiber-chip coupling …
- 238000004871 chemical beam epitaxy 0 title description 5
Classifications
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01S—DEVICES USING STIMULATED EMISSION
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/062—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
- H01S5/0625—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes in multi-section lasers
- H01S5/06255—Controlling the frequency of the radiation
- H01S5/06256—Controlling the frequency of the radiation with DBR-structure
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01S—DEVICES USING STIMULATED EMISSION
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/026—Monolithically integrated components, e.g. waveguides, monitoring photo-detectors, drivers
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01S—DEVICES USING STIMULATED EMISSION
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/12—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feed-back lasers (DFB-lasers)
- H01S5/125—Distributed Bragg reflector lasers (DBR-lasers)
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01S—DEVICES USING STIMULATED EMISSION
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well, or supperlattice structures, e.g. single quantum well lasers (SQW lasers), multiple quantum well lasers (MQW lasers), graded index separate confinement hetrostructure lasers (GRINSCH lasers)
- H01S5/343—Structure or shape of the active region; Materials used for the active region comprising quantum well, or supperlattice structures, e.g. single quantum well lasers (SQW lasers), multiple quantum well lasers (MQW lasers), graded index separate confinement hetrostructure lasers (GRINSCH lasers) in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
- H01S5/34306—Structure or shape of the active region; Materials used for the active region comprising quantum well, or supperlattice structures, e.g. single quantum well lasers (SQW lasers), multiple quantum well lasers (MQW lasers), graded index separate confinement hetrostructure lasers (GRINSCH lasers) in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser emitting light at a wavelength longer than 1000nm, e.g. InP based 1300 and 1500nm lasers
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01S—DEVICES USING STIMULATED EMISSION
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/14—External cavity lasers
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01S—DEVICES USING STIMULATED EMISSION
- H01S5/00—Semiconductor lasers
- H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
- H01S5/4025—Array arrangements, e.g. constituted by discrete laser diodes or laser bar
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01S—DEVICES USING STIMULATED EMISSION
- H01S5/00—Semiconductor lasers
- H01S5/50—Amplifier structures not provided for in groups H01S5/02 - H01S5/30
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01S—DEVICES USING STIMULATED EMISSION
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semi-conductor body to guide the optical wave; Confining structures perpendicular to the optical axis, e.g. index- or gain-guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semi-conductor body to guide the optical wave; Confining structures perpendicular to the optical axis, e.g. index- or gain-guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
- G02B6/00—Light guides
- G02B6/10—Light guides of the optical waveguide type
- G02B6/12—Light guides of the optical waveguide type of the integrated circuit kind
- G02B6/122—Light guides of the optical waveguide type of the integrated circuit kind basic optical elements, e.g. light-guiding paths
- G02B6/1221—Light guides of the optical waveguide type of the integrated circuit kind basic optical elements, e.g. light-guiding paths made from organic materials
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
- G02B6/00—Light guides
- G02B6/10—Light guides of the optical waveguide type
- G02B6/12—Light guides of the optical waveguide type of the integrated circuit kind
- G02B2006/12166—Manufacturing methods
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
- G02B6/00—Light guides
- G02B6/10—Light guides of the optical waveguide type
- G02B6/12—Light guides of the optical waveguide type of the integrated circuit kind
- G02B2006/12083—Constructional arrangements
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US6381380B1 (en) | Twin waveguide based design for photonic integrated circuits | |
US7622315B2 (en) | Tunable laser source with integrated optical modulator | |
KR100842277B1 (en) | Reflective semiconductor optical amplifierR-SOA and reflective superluminescent diodeR-SLD | |
Aiki et al. | A frequency-multiplexing light source with monolithically integrated distributed-feedback diode lasers | |
Schilling et al. | Wavelength converter based on integrated all-active three-port Mach-Zehnder interferometer | |
AU775671B2 (en) | Integrated wavelength tunable single and two-stage all-optical wavelength converter | |
Segawa et al. | Full $ C $-Band Tuning Operation of Semiconductor Double-Ring Resonator-Coupled Laser With Low Tuning Current | |
US5434943A (en) | Nanosecond fast electrically tunable Fabry-Perot filter | |
Rabus et al. | Ring resonator lasers using passive waveguides and integrated semiconductor optical amplifiers | |
Harmsma et al. | Multi wavelength lasers fabricated using selective area chemical beam epitaxy | |
JPH0992933A (en) | Wavelength changeable semiconductor laser | |
Bach et al. | Wavelength stabilized single-mode lasers by coupled micro-square resonators | |
Yoshimoto et al. | Spot-size converted polarization-insensitive SOA gate with a vertical tapered submicrometer stripe structure | |
SASAKI et al. | In-plane bandgap energy controlled selective MOVPE and its applications to photonic integrated circuits | |
US7310363B1 (en) | Integrated wavelength tunable single and two-stage all-optical wavelength converter | |
Kaspar et al. | Hybrid III-V/silicon lasers | |
Kudo et al. | 1.55/spl mu/m wavelength-selectable microarray DFB-LDs with integrated MMI combiner, SOA, and EA-modulator | |
De La Rue et al. | Integration technologies for III-V semiconductor optoelectronics based on quantum-well waveguides | |
Harmsma et al. | Integration of optical amplifiers and passive waveguide devices on InP using selective area chemical beam epitaxy | |
Simatupang | Vertical Taper InGaAsP/InP Fabry-Perot Laser Diode for Injection-Locking Applications in WDM-PON Systems | |
Kim et al. | All-optical wavelength conversion in SOA-based Mach–Zehnder interferometer with monolithically integrated loss-coupled DFB laser diode | |
Sudo et al. | External cavity wavelength tunable laser with on-chip VOA using etched mirror based integration technology | |
den Besten et al. | InP-based photonic integration technology | |
Aihara et al. | Si waveguide integrated membrane buried heterostructure DFB laser using SiN multiple-phase-shift surface grating | |
Sim et al. | A Four‐Channel Laser Array with Four 10 Gbps Monolithic EAMs Each Integrated with a DBR Laser |