Froehly et al., 1999 - Google Patents
Imaging with polarized light: the vectorial modulation transfer function of a polarizing plateFroehly et al., 1999
- Document ID
- 6141282067282474128
- Author
- Froehly L
- Verrier I
- Froehly C
- Brun G
- Veillas C
- Publication year
- Publication venue
- Optics communications
External Links
Snippet
A vectorial modulation transfer function or spatial frequency response of optical imaging systems including linearly polarizing components is defined, calculated and compared to experimental results and to the classical scalar paraxial theory. This exact linear polarizer …
- 230000000051 modifying 0 title abstract description 12
Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/21—Polarisation-affecting properties
- G01N21/23—Bi-refringence
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Exposure apparatus for microlithography
- G03F7/70483—Information management, control, testing, and wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control, in all parts of the microlithographic apparatus, e.g. pulse length control, light interruption
- G03F7/70566—Polarisation control
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
- G02B27/00—Other optical systems; Other optical apparatus
- G02B27/28—Other optical systems; Other optical apparatus for polarising
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
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