Nose et al., 2011 - Google Patents
Mechanical properties and oxidation resistance of CrAlN/BN nanocomposite coatings prepared by reactive dc and rf cosputteringNose et al., 2011
- Document ID
- 6126762827034268590
- Author
- Nose M
- Kawabata T
- Watanuki T
- Ueda S
- Fujii K
- Matsuda K
- Ikeno S
- Publication year
- Publication venue
- Surface and Coatings Technology
External Links
Snippet
CrAlN/BN nanocomposite coatings were deposited through reactive cosputtering, ie, pulsed dc and rf sputtering, of CrAl and h-BN targets, respectively. X-ray diffraction (XRD) and selected area electron-diffraction (SAED) analysis indicated that the CrAlN/BN coating …
- 230000003647 oxidation 0 title abstract description 17
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
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- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
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- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
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- C23C14/0021—Reactive sputtering or evaporation
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- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
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- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
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