Backhaus-Ricoult et al., 1995 - Google Patents
Identification of oxidation mechanisms in silicon nitride ceramics by transmission electron microscopy studies of oxide scalesBackhaus-Ricoult et al., 1995
- Document ID
- 5353493325759893903
- Author
- Backhaus-Ricoult M
- Gogotsi Y
- Publication year
- Publication venue
- Journal of materials research
External Links
Snippet
Additive-free HIPSN and Y 2 O 3+ Al 2 O 3-doped HPSN are oxidized in air in the temperature range from 1300 to 1500° C. TEM, SEM, EDS, and XRD are used to analyze the composition and microstructure of the oxide scales in order to determine the oxidation …
- 230000003647 oxidation 0 title abstract description 188
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