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Shin et al., 2015 - Google Patents

Radio frequency plasma deposited boron doped high conductivity p-type nano crystalline silicon oxide thin film for solar cell window layer

Shin et al., 2015

Document ID
5004092444589242536
Author
Shin C
Iftiquar S
Park J
Ahn S
Kim S
Jung J
Bong S
Yi J
Publication year
Publication venue
Materials Chemistry and Physics

External Links

Snippet

Wide band gap p-type nano crystalline silicon oxide (p-nc-SiO: H) window layer is useful for multi junction solar cells. We prepared such a material by using high hydrogen dilution and low plasma power that shows high optical gap as well as high conductivity. By varying CO 2 …
Continue reading at www.sciencedirect.com (other versions)

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    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material

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