Alemu et al., 2008 - Google Patents
MgF 2/BN double layer antireflection coating for photovoltaic applicationAlemu et al., 2008
- Document ID
- 4559216564183820730
- Author
- Alemu A
- Freundlich A
- Badi N
- Boney C
- Bensaoula A
- Publication year
- Publication venue
- 2008 33rd IEEE Photovoltaic Specialists Conference
External Links
Snippet
Modeling and fabrication of double layer MgF 2/BN antireflection coatings have been undertaken. Minimal reflection losses (≪ 5%) over a wide range of the solar irradiance (1.1 to 3 eV) are realized for Si and GaAs. Dispersion (n, k) analyses of individual BN films using …
- 239000011248 coating agent 0 title description 3
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
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