Darvill et al., 2021 - Google Patents
Breaking the symmetry of nanosphere lithography with anisotropic plasma etching induced by temperature gradientsDarvill et al., 2021
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- 4275575585825014888
- Author
- Darvill D
- Iarossi M
- Ekeroth R
- Hubarevich A
- Huang J
- De Angelis F
- Publication year
- Publication venue
- Nanoscale Advances
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Snippet
We report a novel anisotropic process, termed plasma etching induced by temperature gradients (PE-TG), which we use to modify the 3D morphology of a hexagonally close- packed polystyrene sphere array. Specifically, we combined an isotropic oxygen plasma …
- 238000001020 plasma etching 0 title abstract description 15
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