[go: up one dir, main page]
More Web Proxy on the site http://driver.im/

Yadav, 2009 - Google Patents

Methodology for developing a functional multiscale architecture model system towards future integrated circuits

Yadav, 2009

View PDF
Document ID
4262827884731468801
Author
Yadav Y
Publication year

External Links

Snippet

Detection of the biochemical species in the environmental pollution, industrial emission monitoring, medical diagnosis, public security, agriculture and a variety of industries has resulted in the emerging need for a generation of high density nanostructured sensor arrays …
Continue reading at pdxscholar.library.pdx.edu (PDF) (other versions)

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANO-TECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANO-STRUCTURES; MEASUREMENT OR ANALYSIS OF NANO-STRUCTURES; MANUFACTURE OR TREATMENT OF NANO-STRUCTURES
    • B82Y10/00—Nano-technology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANO-TECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANO-STRUCTURES; MEASUREMENT OR ANALYSIS OF NANO-STRUCTURES; MANUFACTURE OR TREATMENT OF NANO-STRUCTURES
    • B82Y40/00—Manufacture or treatment of nano-structures
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANO-TECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANO-STRUCTURES; MEASUREMENT OR ANALYSIS OF NANO-STRUCTURES; MANUFACTURE OR TREATMENT OF NANO-STRUCTURES
    • B82Y30/00—Nano-technology for materials or surface science, e.g. nano-composites
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping

Similar Documents

Publication Publication Date Title
Cabrini et al. Nanofabrication handbook
US6270946B1 (en) Non-lithographic process for producing nanoscale features on a substrate
Koh Strategies for controlled placement of nanoscale building blocks
Coffey et al. Patterning phase separation in polymer films with dip-pen nanolithography
Kwon et al. Importance of molds for nanoimprint lithography: hard, soft, and hybrid molds
US20060014084A1 (en) Method for providing nano-structures of uniform length
Cherniavskaya et al. Edge transfer lithography of molecular and nanoparticle materials
Zhao et al. Large-area, ultrathin metal-oxide semiconductor nanoribbon arrays fabricated by chemical lift-off lithography
Lin et al. Multilength-scale chemical patterning of self-assembled monolayers by spatially controlled plasma exposure: nanometer to centimeter range
Xie et al. Polymer nanostructures made by scanning probe lithography: recent progress in material applications
Park et al. Light stamping lithography: microcontact printing without inks
KR100992834B1 (en) Manufacturing method of nanowire multichannel field effect transistor device
McCarty Molecular lithography for wafer-scale fabrication of molecular junctions
Chen et al. Electrochemical Replication and Transfer for Low‐Cost, Sub‐100 nm Patterning of Materials on Flexible Substrates
Zhao et al. Nanopattern-embedded micropillar structures for security identification
Viero et al. Efficient prototyping of large-scale pdms and silicon nanofluidic devices using pdms-based phase-shift lithography
Myung et al. “Lens” effect in directed assembly of nanowires on gradient molecular patterns
Noh et al. 50 nm DNA nanoarrays generated from uniform oligonucleotide films
Lee et al. Spontaneous registration of Sub-10 nm features based on subzero celsius spin-casting of self-assembling building blocks directed by chemically encoded surfaces
Shu et al. Programmable nanoscale crack lithography for multiscale PMMA patterns
Yadav Methodology for developing a functional multiscale architecture model system towards future integrated circuits
Duan et al. Large‐Area Nanoscale Patterning of Functional Materials by Nanomolding in Capillaries
Lin et al. Self-aligned nanolithography in a nanogap
CN101645391B (en) Manufacturing cross-structures of nanostructures
Becerra-Mora et al. Electrochemical Erasing Using a Polymer Lithography Editor for the Fabrication of Photoactive Devices