Lee et al., 1997 - Google Patents
Electron-beam lithography resist profile simulation for highly sensitive resistLee et al., 1997
- Document ID
- 4098289082163579783
- Author
- Lee C
- Ham Y
- Kim S
- Chun K
- Publication year
- Publication venue
- Microelectronic engineering
External Links
Snippet
A very highly sensitive resist is difficult to simulate its resist profile because of its extreme difference of development rate which can be determined from absorbed energy when electron beam is exposed. We developed resist profile simulator named ELIS (Electron …
- 238000000609 electron-beam lithography 0 title abstract description 6
Classifications
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING; COUNTING
- G06F—ELECTRICAL DIGITAL DATA PROCESSING
- G06F17/00—Digital computing or data processing equipment or methods, specially adapted for specific functions
- G06F17/50—Computer-aided design
- G06F17/5009—Computer-aided design using simulation
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