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Cited By

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Danyi KKókai GCsontos J(2006)A novel mathematical model for the optimization of DNA–Chip design and its implementationProceedings of the 2006 international conference on Applications of Evolutionary Computing10.1007/11732242_3(23-33)Online publication date: 10-Apr-2006
https://dl.acm.org/doi/10.1007/11732242_3
Michel BBernard ABietsch ADelamarche EGeissler MJuncker DKind HRenault JRothuizen HSchmid HSchmidt-Winkel PStutz RWolf H(2001)Printing meets lithographyIBM Journal of Research and Development10.1147/rd.455.069745:5(697-719)Online publication date: 1-Sep-2001
https://dl.acm.org/doi/10.1147/rd.455.0697

Index Terms

Optical lithography: introduction
1. Hardware
  1. Emerging technologies

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cover image IBM Journal of Research and Development

IBM Journal of Research and Development Volume 41, Issue 1-2

Special issue: optical lithography I

Jan./March 1997

174 pages

ISSN:0018-8646

Editor:
G. F. Hoffnagle

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IBM Corp.

United States

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Published: 31 January 1997

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Danyi KKókai GCsontos J(2006)A novel mathematical model for the optimization of DNA–Chip design and its implementationProceedings of the 2006 international conference on Applications of Evolutionary Computing10.1007/11732242_3(23-33)Online publication date: 10-Apr-2006
https://dl.acm.org/doi/10.1007/11732242_3
Michel BBernard ABietsch ADelamarche EGeissler MJuncker DKind HRenault JRothuizen HSchmid HSchmidt-Winkel PStutz RWolf H(2001)Printing meets lithographyIBM Journal of Research and Development10.1147/rd.455.069745:5(697-719)Online publication date: 1-Sep-2001
https://dl.acm.org/doi/10.1147/rd.455.0697

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Recommendations

Mold-assisted near-field optical lithography

High resolution optical lithography or high throughput electron beam lithography

Optical and EUV projection lithography

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