This paper reports a novel method for fabricating a monolithic inkjet chip by combination of thick resist photolithography and electroforming technologies. It integrates two-step photolithography process by two kinds of thick photoresists, SU-8 and JSR, ...
Stencil masks are used in fabrication processes such as photolithography for circuit patterning and micro-electromechanical systems devices. A stencil mask has micro- and nano-scale through-hole patterns on a substrate, and the metal ...
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Monolithic polymer–metal microstructures can be fabricated on the silicon or glass substrate using two kinds of photoresists and electroforming technologies for the inkjet and microfluidic application. However, it suffers from the high shrinkage problem ...
IEEE Press
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