Six Degrees of Freedom Displacement Measurement System for Wafer Stage Composed of Hall Sensors
<p>Schematic and structural diagram of short stroke (SS) stage with a six DOF Hall sensor displacement measurement system: (<b>a</b>) schematic diagram; (<b>b</b>) structural diagram.</p> "> Figure 2
<p>Distribution of voltage equivalent points in space plotted by Matlab R2014a.</p> "> Figure 3
<p>The coordinate distribution of voltage equivalent points at voltages of 0.71 V and −0.8 V: (<b>a</b>) at voltage of 0.71 V; (<b>b</b>) at voltage of −0.8 V<span class="html-italic">.</span></p> "> Figure 4
<p>The curves of each ellipsoid equation parameter taking Hall sensor output voltage <span class="html-italic">V<sub>Hall</sub></span> as an independent variable: (<b>a</b>) the curves of <span class="html-italic">a</span>, <span class="html-italic">b</span>, <span class="html-italic">d</span>, <span class="html-italic">e</span>; (<b>b</b>) The curve of <span class="html-italic">c.</span></p> "> Figure 5
<p>Schematic diagram of the calibration system and physical diagram of the calibration fixture consisting of laser sensors.</p> "> Figure 6
<p>Experiment setups based on compact laser sensors.</p> "> Figure 7
<p>The laser sensors output displacement (blue) and the Hall sensors output voltage (red) sampled by the host computer.</p> "> Figure 8
<p>Displacement of the Hall sensors deduced by of the displacement of laser sensors and the least squares method: (<b>a</b>) displacement obtained by two ways; (<b>b</b>) difference between the two displacements.</p> "> Figure 9
<p>Displacement of the Hall sensors deduced by of the displacement of laser sensors and multidimensional fitting: (<b>a</b>) displacement obtained by two ways; (<b>b</b>) difference between the two displacements.</p> "> Figure 10
<p>Inherent noise of the Hall sensor and the laser sensor: (<b>a</b>) inherent noise of the Hall sensor; (<b>b</b>) inherent noise of the laser sensor.</p> "> Figure 11
<p>Six DOF measurement results and errors of the wafer stage at the first test: (<b>a</b>) six DOF measurement results; (<b>b</b>) six DOF measurement errors.</p> "> Figure 11 Cont.
<p>Six DOF measurement results and errors of the wafer stage at the first test: (<b>a</b>) six DOF measurement results; (<b>b</b>) six DOF measurement errors.</p> "> Figure 12
<p>Six DOF measurement results and errors of the wafer stage at the second test: (<b>a</b>) six DOF measurement results; (<b>b</b>) six DOF measurement errors.</p> "> Figure 12 Cont.
<p>Six DOF measurement results and errors of the wafer stage at the second test: (<b>a</b>) six DOF measurement results; (<b>b</b>) six DOF measurement errors.</p> "> Figure 13
<p>Six DOF measurement results and errors of the wafer Stage at the third test: (<b>a</b>) six DOF measurement results; (<b>b</b>) six DOF measurement errors.</p> "> Figure 13 Cont.
<p>Six DOF measurement results and errors of the wafer Stage at the third test: (<b>a</b>) six DOF measurement results; (<b>b</b>) six DOF measurement errors.</p> ">
Abstract
:1. Introduction
2. Description of the Measurement System
3. Model Derivation
4. Matrixes Solution
4.1. Known Conditions
- XLaser, VHall can be obtained through calibration fixtures. Assuming that the number of calibration data points is N, the known point sequences are then {XLaser1,⋯XLaserk,⋯XLaserN} and {VHall1,⋯VHallk,⋯VHallN}.
- According to the mechanical structure of the device, the corresponding initial coordinates of Hall sensor probes are as follows (unit: mm):
4.2. Calibration Process
5. Experimental Results and Analysis
6. Conclusions
Author Contributions
Funding
Conflicts of Interest
References
- Chen, Z.; Liu, Y.; Fu, Z.; Song, S.; Tan, J. Calibration of the hall measurement system for a 6-dof precision stage using self-adaptive hybrid tlbo. Sensors 2016, 16, E872. [Google Scholar] [CrossRef] [PubMed]
- Sen, M.; Balabozov, I.; Yatchev, I.; Ivanov, R. Modelling of current sensor based on hall effect. In Proceedings of the 2017 15th International Conference on Electrical Machines, Drives and Power Systems (ELMA), Sofia, Bulgaria, 1–3 June 2017; pp. 457–460. [Google Scholar]
- Pan, S.; Commins, P.A.; Du, H. Tubular linear motor position detection by hall-effect sensors. In Proceedings of the 2015 Australasian Universities Power Engineering Conference (AUPEC), Wollongong, Australia, 27–30 September 2015; pp. 1–5. [Google Scholar]
- Sriratana, W.; Murayama, R. Application of hall effect sensor: A study on the influences of sensor placement. In Proceedings of the 2013 IEEE International Symposium on Industrial Electronics, Taipei, Taiwan, 28–31 May 2013; pp. 1–5. [Google Scholar]
- Petruk, O.; Kachniarz, M.; Szewczyk, R. Novel method of offset voltage minimization in hall-effect sensor. Acta Phys. Pol. A 2017, 131, 1177–1179. [Google Scholar] [CrossRef]
- Lozanova, S.; Ivanov, A.; Roumenin, C. A novel three-axis hall magnetic sensor. Procedia Eng. 2011, 25, 539–542. [Google Scholar] [CrossRef]
- Lozanova, S.; Noykov, S.; Roumenin, C. Two-axis silicon hall effect magnetometer. Sens. Actuators A Phys. 2017, 267, 177–181. [Google Scholar] [CrossRef]
- Wouters, C.; Vranković, V.; Chevtsov, P.; Hierold, C. Calibration scheme for a new type of 3d hall sensor. Sens. Actuators A Phys. 2017, 257, 38–46. [Google Scholar] [CrossRef]
- Nie, Q.; Sup, F.C. A soft four degree-of-freedom load cell based on the hall effect. IEEE Sens. J. 2017, 17, 7355–7363. [Google Scholar] [CrossRef]
- Zhao, B.; Wang, L.; Tan, J.-B. Design and realization of a three degrees of freedom displacement measurement system composed of hall sensors based on magnetic field fitting by an elliptic function. Sensors 2015, 15, 22530–22546. [Google Scholar] [CrossRef] [PubMed]
- Li, X.; Gao, W.; Muto, H.; Shimizu, Y.; Ito, S.; Dian, S. A six-degree-of-freedom surface encoder for precision positioning of a planar motion stage. Precis. Eng. 2013, 37, 771–781. [Google Scholar] [CrossRef]
- Lee, C.; Lee, S.-K. Multi-Degree-of-Freedom Motion Error Measurement in an Ultraprecision Machine Using Laser Encoder—Review; Springer: Berlin, Germany, 2013; Volume 27. [Google Scholar]
- Mura, A. Multi-dofs mems displacement sensors based on the stewart platform theory. Microsyst. Technol. 2012, 18, 575–579. [Google Scholar] [CrossRef]
- Kawato, Y.; Kim, W.-J. A Novel Multi-Dof Precision Positioning Methodology Using Two-Axis Hall-Effect Sensors. In Proceedings of the American Control Conference, Portland, OR, USA, 8–10 June 2005; Volume 5, pp. 3042–3047. [Google Scholar]
- Yuting, S.; Hu, C.; Zhu, Y.; Chen, L. Study on Fast and Precise Measurement of Three-Dimensional Displacement Using Hall Sensors. Adv. Mater. Res. 2013, 694–697, 1034–1038. [Google Scholar]
VHall (V) | a | b | c | d | e | MSE (×10−5) |
---|---|---|---|---|---|---|
−0.9000 | −4.8730 | 17.2287 | 133.4082 | 3.7653 | 0.4869 | 1.5882 |
−0.8300 | −4.9842 | 18.3401 | 135.3778 | 3.7967 | 0.4841 | 2.2378 |
−0.7600 | −4.5271 | 14.9682 | 139.7482 | 3.8022 | 0.4760 | 1.9036 |
−0.6900 | −4.4135 | 14.3637 | 137.7598 | 3.8248 | 0.4749 | 2.4322 |
−0.6200 | −3.7553 | 10.2714 | 139.4580 | 3.8035 | 0.4903 | 1.5774 |
−0.5500 | −3.5330 | 9.2171 | 145.8678 | 3.8191 | 0.4897 | 2.4767 |
−0.4800 | −3.1521 | 7.3729 | 147.0197 | 3.8213 | 0.5007 | 2.8644 |
−0.4100 | −2.7517 | 5.7210 | 151.4560 | 3.8091 | 0.5302 | 1.9099 |
−0.3400 | −2.1845 | 3.6350 | 151.6554 | 3.7735 | 0.5727 | 1.5192 |
−0.2700 | −1.7248 | 2.2788 | 151.2365 | 3.7611 | 0.5942 | 1.0114 |
−0.2000 | −1.2779 | 1.2677 | 150.9600 | 3.7432 | 0.6263 | 0.6854 |
−0.1300 | −0.7836 | 0.4641 | 151.4696 | 3.7438 | 0.5976 | 0.7116 |
−0.0600 | −0.3627 | 0.1004 | 153.1795 | 3.7372 | 0.6069 | 0.5898 |
0.0700 | 0.5670 | 0.2498 | 169.8377 | 3.8551 | 0.5516 | 2.6307 |
0.1400 | 0.9881 | 0.7461 | 156.1893 | 3.8146 | 0.5524 | 2.3675 |
0.2100 | 1.3435 | 1.3703 | 150.0127 | 3.7724 | 0.5773 | 1.5292 |
0.2800 | 1.9259 | 2.8212 | 151.7349 | 3.8086 | 0.5489 | 2.2555 |
0.3500 | 2.2771 | 3.9673 | 148.0845 | 3.7739 | 0.5801 | 1.6254 |
0.4200 | 2.6714 | 5.4854 | 145.5625 | 3.7626 | 0.5844 | 0.9534 |
0.4900 | 3.2424 | 7.9646 | 149.3453 | 3.8018 | 0.5338 | 1.9244 |
0.5600 | 3.4764 | 9.0506 | 141.6614 | 3.7855 | 0.5306 | 1.6327 |
0.6300 | 3.7473 | 10.5033 | 139.3210 | 3.7654 | 0.5412 | 1.2954 |
0.7000 | 4.1856 | 13.1069 | 139.8891 | 3.7720 | 0.5298 | 1.4367 |
0.7700 | 4.5792 | 15.3600 | 136.9817 | 3.8022 | 0.4724 | 2.2432 |
0.8400 | 5.2717 | 20.8156 | 142.4728 | 3.7998 | 0.4976 | 1.8012 |
0.9100 | 5.6072 | 22.8467 | 136.7349 | 3.8317 | 0.4365 | 1.4231 |
Aij (V/mm) | Aj1 | Aj2 | Aj3 | Aj4 | Aj5 | Aj6 |
---|---|---|---|---|---|---|
A1j | −1.5397 | −0.1037 | −0.3315 | −1.4055 | −1.3080 | −6.24751 |
A2j | 0.5659 | 2.2981 | 0 | 1.0508 | 0.5097 | 11.1114 |
A3j | 0.5148 | 0 | 3.6293 | 1.8000 | 1.3307 | 14.0375 |
A4j | 0.3224 | 0.9862 | −0.7829 | −2.5066 | 0 | 0 |
A5j | 0.2864 | 0.022993 | −0.5654 | 0 | 1.4780 | 0 |
A6j | 6.9354 | 5.1245 | −12.6979 | 0 | 0 | 14.7979 |
Bij (mm) | Bj1 | Bj2 | Bj3 | Bj4 | Bj5 | Bj6 |
---|---|---|---|---|---|---|
B1j | 20.3677 | −36.1377 | −43.1450 | 3.9887 | 4.4567 | −38.7739 |
X (mm) | Y (mm) | Z (mm) | θx | θy | θz | |
---|---|---|---|---|---|---|
(1) | 0.04 | 0.14 | 0.12 | 0.025° | 0.025° | 0.04° |
(2) | 0.04 | 0.13 | 0.16 | 0.04° | 0.03° | 0.05° |
(3) | 0.06 | 0.15 | 0.23 | 0.03° | 0.06° | 0.07° |
© 2018 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).
Share and Cite
Zhao, B.; Shi, W.; Zhang, J.; Zhang, M.; Qi, X.; Li, J.; Li, F.; Tan, J. Six Degrees of Freedom Displacement Measurement System for Wafer Stage Composed of Hall Sensors. Sensors 2018, 18, 2030. https://doi.org/10.3390/s18072030
Zhao B, Shi W, Zhang J, Zhang M, Qi X, Li J, Li F, Tan J. Six Degrees of Freedom Displacement Measurement System for Wafer Stage Composed of Hall Sensors. Sensors. 2018; 18(7):2030. https://doi.org/10.3390/s18072030
Chicago/Turabian StyleZhao, Bo, Weijia Shi, Jiawei Zhang, Ming Zhang, Xue Qi, Jiaxin Li, Feng Li, and Jiubin Tan. 2018. "Six Degrees of Freedom Displacement Measurement System for Wafer Stage Composed of Hall Sensors" Sensors 18, no. 7: 2030. https://doi.org/10.3390/s18072030
APA StyleZhao, B., Shi, W., Zhang, J., Zhang, M., Qi, X., Li, J., Li, F., & Tan, J. (2018). Six Degrees of Freedom Displacement Measurement System for Wafer Stage Composed of Hall Sensors. Sensors, 18(7), 2030. https://doi.org/10.3390/s18072030