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Silicon trends and limits for advanced microprocessors

Published: 01 March 1998 Publication History
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References

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Agnello, P., Newman, T., Crabbe, E., Subbanna, S., Ganin, E., Liebmann, L., Comfort, J., and Sunderland, D. Phase edge lithography for sub-0.1 btm electrical channel length in a 200mm full CMOS process. In Tech. Dig. of the Symposium on VLSI Technology (Kyoto, June 6-8, 1995), IEEE Press, Piscataway, N.J., pp. 79-80.
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Bohr, M., Ahmed, S., Brigham, L., Chau, R., Gasser, R., Green, R., Hargrove, W., Lee, E., Natter, R., Thompson, S., Weldon, K., and Yang, S. A high-performance 0.35btm logic technology for 3.3V and 2.5V operation. In Tech. Dig. of the International Electron Devices Meeting (San Francisco, Dec. 11-14, 1994), IEEE Press, Piscataway, N.J., pp. 273-276.
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cover image Communications of the ACM
Communications of the ACM  Volume 41, Issue 3
March 1998
100 pages
ISSN:0001-0782
EISSN:1557-7317
DOI:10.1145/272287
Issue’s Table of Contents
Permission to make digital or hard copies of all or part of this work for personal or classroom use is granted without fee provided that copies are not made or distributed for profit or commercial advantage and that copies bear this notice and the full citation on the first page. Copyrights for components of this work owned by others than ACM must be honored. Abstracting with credit is permitted. To copy otherwise, or republish, to post on servers or to redistribute to lists, requires prior specific permission and/or a fee. Request permissions from [email protected]

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Publication History

Published: 01 March 1998
Published in CACM Volume 41, Issue 3

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  • (2023)The impact of device length on the electron’s effective mobilityJournal of Applied Physics10.1063/5.0171559134:12Online publication date: 28-Sep-2023
  • (2015)Leakage current minimisation and power reduction techniques using sub-threshold design2015 International Conference on Information Society (i-Society)10.1109/i-Society.2015.7366877(146-150)Online publication date: Nov-2015
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  • (2004)A power aware system level interconnect design methodology for latency-insensitive systemsProceedings of the 2004 IEEE/ACM International conference on Computer-aided design10.1109/ICCAD.2004.1382586(275-282)Online publication date: 7-Nov-2004
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