Morphological characterization of dithering masks

1 April 2003 Morphological characterization of dithering masks

Vladimir Misic, Kevin J. Parker

Author Affiliations +

Journal of Electronic Imaging, Vol. 12, Issue 2, (April 2003). https://doi.org/10.1117/1.1556766

We present some novel tools for the analysis of blue-noise binary patterns. Unlike most of the existing methods that evaluate the frequency content of a given mask or its lower order statistics, our new metrics characterize the morphological content of a mask that is quantified using simple one-pass filtering. An analytical filter expression is given. As a result, one can balance the structural content of the mask—diagonal, vertical, and horizontal interconnections of the majority (or minority) pixels—at the same level. In addition, it is possible to improve the overall mask quality by prescribing the occurrence of morphological shapes of connected pixels. Examples of morphological analysis are given to demonstrate the different qualities of blue-noise and white-noise patterns.

©(2003) Society of Photo-Optical Instrumentation Engineers (SPIE)

Citation Download Citation

Vladimir Misic and Kevin J. Parker "Morphological characterization of dithering masks," Journal of Electronic Imaging 12(2), (1 April 2003). https://doi.org/10.1117/1.1556766

Published: 1 April 2003

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

;

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE