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Depth of cut per abrasive in fixed diamond wire sawing

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Abstract

Because of the high requirement for quality, the surfaces of prime wafers have to be flat and without damages. During the first machining process in wafer manufacturing, the defects introduced by wire sawing must be removed by the subsequent lapping, grinding, and polishing processes. Therefore, the quality of sliced wafer is very important. Fixed diamond wire saw, on which the diamond grains are coated as abrasives, has become the major tool to slice ingot into wafers. Ductile-regime machining is an attractive process to achieve crack free surface on brittle materials in abrasive machining process. The depth of cut of the abrasive is a hint for the transition between ductile- and brittle-regime machining. In order to understand the cutting behavior in fixed diamond wire sawing, this paper presents an investigation of depth of cut per abrasive based on the wire profile model developed by the authors. The simulation results show that the larger depths of cut are unavoidable in fixed diamond wire sawing because of the random position and size distribution of diamond grains on the wire. Although the number of active abrasives and the depths of cut at the bottom of slicing groove are larger than those at the side of the groove, few larger diamond grains may introduce larger depths of cut and cracks on the side, which is the sliced wafer surface. Effects of process parameters to the depth of cut distributions are also analyzed. The variation in number of active abrasives in cutting zone as well as their depth of cut shows the possibility to increase process productivity without increasing the depths of cut of the diamond grains. Consequently, the surface quality could be remained without further deterioration.

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References

  1. Goldstein M, Watanabe M (2008) 450 mm silicon wafers challenges—Wafer thickness scaling. In: Honolulu, HI, United states, 2008. ECS transactions. Electrochemical Society Inc., pp 3–13

  2. Tso P-L, Yan B-H (2005) A study of slicing process with thin diamond wire. In: 3rd international conference on leading edge manufacturing in 21st century, LEM, Nagoya, Japan, 2005. Japan Society of Mechanical Engineers, pp 619–624

  3. Sugawara J, Yamakawa M, Mizoguchi A (2001) Development of fixed-abrasive grain wire saw. SEI Tech Rev 52:87–90

    Google Scholar 

  4. Chung C, Nhat LV (2013) Surface generation of diamond coated wire for wire sawing process. In: 16th international conference on advances in materials and processing technologies. AMPT, Taipei, p 2013

    Google Scholar 

  5. Wu H, Melkote SN (2008) Study of ductile-to-brittle transition in single grit diamond scribing of silicon: Application to wire sawing of silicon wafers. J Eng Mater Technol 134(4):1–8

    Google Scholar 

  6. Gao Y, Ge P, Li S (2009) Investigation of subsurface damage depth of single crystal silicon in electroplated wire saw slicing. In: 15th conference on abrasive technology in China: advances in grinding and abrasive technology, Laubisrutistr.24, Stafa-Zuerich, CH-8712, Switzerland, 2009. Key engineering materials. Trans Tech Publications Ltd, pp 306–310

  7. Chung C (2012) Abrasive distribution of the fixed diamond wire in wire sawing process. Adv Mater Res 579:145–152

    Article  Google Scholar 

  8. Li J, Kao I, Prasad V (1998) Modeling stresses of contacts in wire saw slicing of polycrystalline and crystalline ingots: application to silicon wafer production. J Electron Packag 120(2):123– 128

    Article  Google Scholar 

  9. Liedke T, Kuna M (2011) A macroscopic mechanical model of the wire sawing process. Int J Mach Tools Manuf 51(9):711–720

    Article  Google Scholar 

  10. Liedke T, Kuna M (2013) Discrete element simulation of micromechanical removal processes during wire sawing. Wear 304(1–2):77–82

    Article  Google Scholar 

  11. Nassauer B, Hess A, Kuna M (2014) Numerical and experimental investigations of micromechanical processes during wire sawing. Int J Solids Struct 51(14):2656–2665

    Article  Google Scholar 

  12. Teomete E (2011) Effect of process parameters on surface quality for wire saw cutting of alumina ceramic. Gazi University J Sci 24(2):291–297

    Google Scholar 

  13. Teomete E (2011) Investigation of long waviness induced by the wire saw process. In: Proceedings of the institution of mechanical engineers, part B: journal of engineering manufacture. SAGE Publications Ltd, 55 City Road, London, EC1Y 1SP, United Kingdom, pp 1153–1162

  14. Teomete E (2011) Roughness damage evolution due to wire saw process. Int J Precis Eng Manuf 12(6):941–947

    Article  Google Scholar 

  15. Wu H, Melkote SN, Danyluk S (2012) Mechanical strength of silicon wafers cut by loose abrasive slurry and fixed abrasive diamond wire sawing. Adv Eng Mater 14(5):342– 348

    Article  Google Scholar 

  16. Wu H, Yang C, Melkote SN (2014) Effect of reciprocating wire slurry sawing on surface quality and mechanical strength of as-cut solar silicon wafers. Precis Eng 38(1):121–126

    Article  Google Scholar 

  17. Gao Y, Ge P (2011) Relationship between the grit cut depth and process parameters in electroplated diamond wire sawing KDP crystal. In: International conference on engineering design and optimization, Ningbo, China, 2012. Applied mechanics and materials. Trans Tech Publications, pp 950– 953

  18. Shimada S, Ikawa N, Inamura T, Takezawa N, Ohmori H, Sata T (1995) Brittle-Ductile transition phenomena in microindentation and micromachining. CIRP Ann Manuf Technol 44(1):523– 526

    Article  Google Scholar 

  19. Bifano TG, Dow TA, Scattergood RO (1991) Ductile-regime grinding. A new technology for machining brittle materials. J Eng Ind 113(2):184–189

    Article  Google Scholar 

  20. Chung C, Nhat LV (2014) Generation of diamond wire sliced wafer surface based on the distribution of diamond grits. Int J Precis Eng Manuf 1(5):789–796

    Article  Google Scholar 

  21. Arif M, Xinquan Z, Rahman M, Kumar S (2013) A predictive model of the critical undeformed chip thickness for ductilebrittle transition in nano-machining of brittle materials. Int J Mach Tools Manuf 64(0):114–122

    Article  Google Scholar 

  22. Wang J-JJ, Liao Y-Y (2007) Critical depth of cut and specific cutting energy of a microscribing process for hard and brittle materials. J Eng Mater Technol 130(1):011002–011002

    Article  Google Scholar 

  23. Marshall DB, Lawn BR, Evans AG (1982) Elastic/plastic indentation damage in ceramics: the lateral crack system. J Amer Ceram Soc 65(11):561–566

    Article  Google Scholar 

  24. Evans AG, Gulden ME, Rosenblatt M (1978) Impact damage in brittle materials in the elastic-plastic response regime. Proc R Soc A 361(1706):343–365

    Article  Google Scholar 

  25. Lee JH, Gao YF, Johanns KE, Pharr GM (2012) Cohesive interface simulations of indentation cracking as a fracture toughness measurement method for brittle materials. Acta Mater 60(15):5448–5467

    Article  Google Scholar 

  26. Bidiville A, Wasmer K, Michler J, Nasch PM, Van Der Meer M, Ballif C (2008) Mechanisms of wafer sawing and impact on wafer properties. Prog Photovolt Res Appl 18(8):563–572

    Article  Google Scholar 

  27. Bhagavat S, Kao I (2007) Ultra-low load multiple indentation response of materials: in purview of wiresaw slicing and other free abrasive machining (FAM) processes. Int J Mach Tools Manuf 47(3–4):666–672

    Article  Google Scholar 

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Correspondence to Van-Nhat Le.

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Chung, C., Le, VN. Depth of cut per abrasive in fixed diamond wire sawing. Int J Adv Manuf Technol 80, 1337–1346 (2015). https://doi.org/10.1007/s00170-015-7089-z

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  • DOI: https://doi.org/10.1007/s00170-015-7089-z

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