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Cheolgyu Kim
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2020 – today
- 2021
- [j8]Yusen Zhao
, Chiao-Yueh Lo
Somatosensory actuator based on stretchable conductive photothermally responsive hydrogel. Sci. Robotics 6(53): 5483 (2021)
2010 – 2019
- 2017
- [j7]Giyoun Roh, Hyeokjin Kim, Cheolgyu Kim, Dongwoo Kim
Fast and accurate method of lifetime estimation for HfSiON/SiO2 dielectric n-MOSFETs under positive bias temperature instability. Microelectron. Reliab. 72: 98-102 (2017) - [j6]Cheolgyu Kim, Tae-Ik Lee, Min Sung Kim, Taek-Soo Kim:
Mechanism of warpage orientation rotation due to viscoelastic polymer substrates during thermal processing. Microelectron. Reliab. 73: 136-145 (2017) - 2014
- [j5]Cheolgyu Kim, Hyeokjin Kim, Bongkoo Kang:
Voltage dependent degradation of HfSiON/SiO2 nMOSFETs under positive bias temperature instability. Microelectron. Reliab. 54(11): 2383-2387 (2014) - 2013
- [j4]Seonhaeng Lee, Cheolgyu Kim, Hyeokjin Kim, Gang-Jun Kim, Ji-Hoon Seo, Donghee Son, Bongkoo Kang:
Effect of negative bias temperature instability induced by a low stress voltage on nanoscale high-k/metal gate pMOSFETs. Microelectron. Reliab. 53(9-11): 1351-1354 (2013) - 2012
- [j3]Dongwoo Kim
Enhanced degradation of n-MOSFETs with high-k/metal gate stacks under channel hot-carrier/gate-induced drain leakage alternating stress. Microelectron. Reliab. 52(9-10): 1901-1904 (2012) - [j2]Seonhaeng Lee, Dongwoo Kim
Effect of electron-electron scattering at an elevated temperature on device lifetime of nanoscale nMOSFETs. Microelectron. Reliab. 52(9-10): 1905-1908 (2012) - [j1]Seonhaeng Lee, Dongwoo Kim
Channel width dependence of mechanical stress effects induced by shallow trench isolation on device performance of nanoscale nMOSFETs. Microelectron. Reliab. 52(9-10): 1949-1952 (2012)
Coauthor Index
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