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"Plasma Charging Damage Reduction in IC Processing by A Self-balancing ..."

Zhichun Wang et al. (2004)

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DOI: 10.1016/J.MICROREL.2004.07.047

access: closed

type: Journal Article

metadata version: 2021-10-14

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Zhichun Wang, Jan Ackaert, Cora Salm, Fred G. Kuper, Eddy De Backer:
Plasma Charging Damage Reduction in IC Processing by A Self-balancing Interconnect. Microelectron. Reliab. 44(9-11): 1503-1507 (2004)

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