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"Total ionizing dose effects and annealing behaviors of ..."

Yannan Xu et al. (2017)

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DOI: 10.1007/S11432-017-9239-5

access: closed

type: Journal Article

metadata version: 2020-03-02

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Yannan Xu, Jinshun Bi, Gaobo Xu, Kai Xi, Bo Li, Ming Liu:
Total ionizing dose effects and annealing behaviors of HfO₂-based MOS capacitor. Sci. China Inf. Sci. 60(12): 120401:1-120401:3 (2017)

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