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"The Influence of Gate Bias on the Anneal of Hot-Carrier Degradation."

Michiel Vandemaele et al. (2020)

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DOI: 10.1109/IRPS45951.2020.9128218

access: closed

type: Conference or Workshop Paper

metadata version: 2023-11-12

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  - conf/irps/VandemaeleCBTGK20
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  - https://dblp.org/rec/conf/irps/VandemaeleCBTGK20
Michiel Vandemaele, Kai-Hsin Chuang, Erik Bury, Stanislav Tyaginov, Guido Groeseneken, Ben Kaczer:
The Influence of Gate Bias on the Anneal of Hot-Carrier Degradation. IRPS 2020: 1-7

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