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"Low temperature through-Si via fabrication using electroless deposition."

Fumihiro Inoue et al. (2011)

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DOI: 10.1109/3DIC.2012.6262984

access: closed

type: Conference or Workshop Paper

metadata version: 2020-10-25

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  - conf/3dic/InouePRALMASISSYS11
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Fumihiro Inoue, Harold Philipsen, Alex Radisic, Silvia Armini, Peter Leunissen, Hiroshi Miyake, Ryohei Arima, Tomohiro Shimizu, Toshiaki Ito, Hirofumi Seki, Yuko Shinozaki, Tomohiko Yamamoto, Shoso Shingubara:
Low temperature through-Si via fabrication using electroless deposition. 3DIC 2011: 1-4

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