In this research, we mainly increase the adhesion of PMMA substrate and film, which is reflected in the environmental test. This study used plasma-enhanced atomic layer deposition (PEALD) to find the relationship between the intensity of XRD reflection peak and the root-mean-square surface
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In this research, we mainly increase the adhesion of PMMA substrate and film, which is reflected in the environmental test. This study used plasma-enhanced atomic layer deposition (PEALD) to find the relationship between the intensity of XRD reflection peak and the root-mean-square surface roughness (σ
RMS) of hafnium dioxide (HfO
2) at different thicknesses by reducing the plasma power at different process temperatures. In this experiment, HfO
2 was found to have the highest intensity of XRD at its maximum thickness. According to the different intensities of XRD of HfO
2 at different thicknesses, aluminum oxide (Al
2O
3) was inserted as crystallization cutoff layers, and the two materials were combined into nanolaminates. The corresponding σ
RMS value also changed from 1.25 to 0.434 nm after treatment under the fourth experimental design. This study improved this mismatch between interfaces by adjusting the yield strength and ductility using Al
2O
3 layers and by creating an inhibition layer. In addition, through the processing of inserted Al
2O
3 layers, the degree of crystallization was changed so that the material and substrate could maintain their normal surfaces without cracking after the environmental tests. After inserting five 1 nm thick Al
2O
3 layers, the environmental test results were improved. The test time was increased from the original 56 h to 352 h.
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