WO2002090108A2 - Thermally stable, moisture curable polysilazanes and polysiloxazanes - Google Patents
Thermally stable, moisture curable polysilazanes and polysiloxazanes Download PDFInfo
- Publication number
- WO2002090108A2 WO2002090108A2 PCT/US2002/013099 US0213099W WO02090108A2 WO 2002090108 A2 WO2002090108 A2 WO 2002090108A2 US 0213099 W US0213099 W US 0213099W WO 02090108 A2 WO02090108 A2 WO 02090108A2
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- alkoxy
- polymer
- polysilazane
- silyl
- substituted
- Prior art date
Links
- 229920001709 polysilazane Polymers 0.000 title claims abstract description 118
- 238000000576 coating method Methods 0.000 claims abstract description 86
- 125000005370 alkoxysilyl group Chemical group 0.000 claims abstract description 65
- 239000000203 mixture Substances 0.000 claims abstract description 54
- 239000000758 substrate Substances 0.000 claims abstract description 49
- 238000005260 corrosion Methods 0.000 claims abstract description 19
- 229910052751 metal Inorganic materials 0.000 claims abstract description 19
- 239000002184 metal Substances 0.000 claims abstract description 19
- 230000007797 corrosion Effects 0.000 claims abstract description 18
- 229920005573 silicon-containing polymer Polymers 0.000 claims abstract description 8
- 239000012298 atmosphere Substances 0.000 claims abstract description 7
- 239000000919 ceramic Substances 0.000 claims abstract description 7
- 239000011521 glass Substances 0.000 claims abstract description 7
- 229920000642 polymer Polymers 0.000 claims description 98
- -1 poly (thio) Polymers 0.000 claims description 81
- 229910007991 Si-N Inorganic materials 0.000 claims description 47
- 229910006294 Si—N Inorganic materials 0.000 claims description 47
- 239000011248 coating agent Substances 0.000 claims description 47
- 229910052710 silicon Inorganic materials 0.000 claims description 45
- 125000001181 organosilyl group Chemical group [SiH3]* 0.000 claims description 42
- 239000010703 silicon Substances 0.000 claims description 39
- 229920001296 polysiloxane Polymers 0.000 claims description 36
- 239000002904 solvent Substances 0.000 claims description 35
- 238000000034 method Methods 0.000 claims description 33
- 229910052739 hydrogen Inorganic materials 0.000 claims description 31
- 239000001257 hydrogen Substances 0.000 claims description 30
- 125000003545 alkoxy group Chemical group 0.000 claims description 28
- 125000000217 alkyl group Chemical group 0.000 claims description 27
- 239000008199 coating composition Substances 0.000 claims description 27
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 27
- 125000003342 alkenyl group Chemical group 0.000 claims description 25
- 239000007788 liquid Substances 0.000 claims description 25
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 24
- 238000005915 ammonolysis reaction Methods 0.000 claims description 24
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 21
- 229920001400 block copolymer Polymers 0.000 claims description 19
- 125000003118 aryl group Chemical group 0.000 claims description 18
- 125000002947 alkylene group Chemical group 0.000 claims description 17
- 229910052757 nitrogen Inorganic materials 0.000 claims description 17
- 150000001875 compounds Chemical class 0.000 claims description 11
- 125000005842 heteroatom Chemical group 0.000 claims description 11
- 239000000376 reactant Substances 0.000 claims description 11
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 claims description 9
- 239000007858 starting material Substances 0.000 claims description 9
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 8
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 7
- 238000004519 manufacturing process Methods 0.000 claims description 7
- 239000000463 material Substances 0.000 claims description 7
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 6
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 6
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 claims description 6
- 125000004469 siloxy group Chemical group [SiH3]O* 0.000 claims description 5
- 229910052500 inorganic mineral Inorganic materials 0.000 claims description 4
- 239000011707 mineral Substances 0.000 claims description 4
- UMVBXBACMIOFDO-UHFFFAOYSA-N [N].[Si] Chemical group [N].[Si] UMVBXBACMIOFDO-UHFFFAOYSA-N 0.000 claims description 3
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 3
- 150000003376 silicon Chemical class 0.000 claims 31
- 150000002431 hydrogen Chemical class 0.000 claims 7
- 239000000945 filler Substances 0.000 claims 2
- 125000000446 sulfanediyl group Chemical group *S* 0.000 claims 1
- 230000003197 catalytic effect Effects 0.000 abstract description 3
- 239000003795 chemical substances by application Substances 0.000 abstract description 3
- 150000002739 metals Chemical class 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 description 37
- 238000003756 stirring Methods 0.000 description 33
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 28
- 239000011541 reaction mixture Substances 0.000 description 27
- 239000000047 product Substances 0.000 description 26
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 20
- 238000010438 heat treatment Methods 0.000 description 18
- 239000012299 nitrogen atmosphere Substances 0.000 description 18
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 16
- 229920001577 copolymer Polymers 0.000 description 16
- 238000002360 preparation method Methods 0.000 description 15
- 239000003054 catalyst Substances 0.000 description 14
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 13
- 239000003153 chemical reaction reagent Substances 0.000 description 13
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 12
- 239000000843 powder Substances 0.000 description 12
- 239000011347 resin Substances 0.000 description 12
- 229920005989 resin Polymers 0.000 description 12
- 229910000831 Steel Inorganic materials 0.000 description 10
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 10
- 239000010959 steel Substances 0.000 description 10
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonium chloride Substances [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 9
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- 239000007789 gas Substances 0.000 description 9
- 238000013008 moisture curing Methods 0.000 description 9
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 9
- 230000000269 nucleophilic effect Effects 0.000 description 9
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 8
- 125000004432 carbon atom Chemical group C* 0.000 description 8
- 239000000460 chlorine Substances 0.000 description 8
- KTQYJQFGNYHXMB-UHFFFAOYSA-N dichloro(methyl)silicon Chemical compound C[Si](Cl)Cl KTQYJQFGNYHXMB-UHFFFAOYSA-N 0.000 description 8
- 239000005048 methyldichlorosilane Substances 0.000 description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 7
- 229910052782 aluminium Inorganic materials 0.000 description 7
- 229910021529 ammonia Inorganic materials 0.000 description 7
- 150000002430 hydrocarbons Chemical group 0.000 description 7
- PHQOGHDTIVQXHL-UHFFFAOYSA-N n'-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCN PHQOGHDTIVQXHL-UHFFFAOYSA-N 0.000 description 7
- 238000006116 polymerization reaction Methods 0.000 description 7
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical compound [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 6
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- 150000001412 amines Chemical class 0.000 description 6
- 125000004122 cyclic group Chemical group 0.000 description 6
- 150000003839 salts Chemical class 0.000 description 6
- 229910000077 silane Inorganic materials 0.000 description 6
- 229910052725 zinc Inorganic materials 0.000 description 6
- 239000011701 zinc Substances 0.000 description 6
- 238000001723 curing Methods 0.000 description 5
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 5
- 230000009257 reactivity Effects 0.000 description 5
- 239000007787 solid Substances 0.000 description 5
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 4
- FZTPAOAMKBXNSH-UHFFFAOYSA-N 3-trimethoxysilylpropyl acetate Chemical compound CO[Si](OC)(OC)CCCOC(C)=O FZTPAOAMKBXNSH-UHFFFAOYSA-N 0.000 description 4
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- 239000004215 Carbon black (E152) Substances 0.000 description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- 229910008051 Si-OH Inorganic materials 0.000 description 4
- 229910006358 Si—OH Inorganic materials 0.000 description 4
- 235000011114 ammonium hydroxide Nutrition 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 239000007795 chemical reaction product Substances 0.000 description 4
- 125000000753 cycloalkyl group Chemical group 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000002474 experimental method Methods 0.000 description 4
- 230000014509 gene expression Effects 0.000 description 4
- 125000005843 halogen group Chemical group 0.000 description 4
- 229930195733 hydrocarbon Natural products 0.000 description 4
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 230000009467 reduction Effects 0.000 description 4
- 241000894007 species Species 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 238000006467 substitution reaction Methods 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 239000010936 titanium Substances 0.000 description 4
- 229910052719 titanium Inorganic materials 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- 239000005046 Chlorosilane Substances 0.000 description 3
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 3
- 229910002808 Si–O–Si Inorganic materials 0.000 description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- 235000019270 ammonium chloride Nutrition 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 238000007334 copolymerization reaction Methods 0.000 description 3
- 238000004132 cross linking Methods 0.000 description 3
- 125000000524 functional group Chemical group 0.000 description 3
- 229910052736 halogen Inorganic materials 0.000 description 3
- 230000003301 hydrolyzing effect Effects 0.000 description 3
- 239000004615 ingredient Substances 0.000 description 3
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- NHBRUUFBSBSTHM-UHFFFAOYSA-N n'-[2-(3-trimethoxysilylpropylamino)ethyl]ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCNCCN NHBRUUFBSBSTHM-UHFFFAOYSA-N 0.000 description 3
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 3
- 150000003254 radicals Chemical class 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 229920001897 terpolymer Polymers 0.000 description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 2
- 229910052580 B4C Inorganic materials 0.000 description 2
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 2
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 2
- 239000004820 Pressure-sensitive adhesive Substances 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 239000012190 activator Substances 0.000 description 2
- 230000001464 adherent effect Effects 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 125000003277 amino group Chemical group 0.000 description 2
- 239000000908 ammonium hydroxide Substances 0.000 description 2
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- INAHAJYZKVIDIZ-UHFFFAOYSA-N boron carbide Chemical compound B12B3B4C32B41 INAHAJYZKVIDIZ-UHFFFAOYSA-N 0.000 description 2
- 229910002091 carbon monoxide Inorganic materials 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 125000001309 chloro group Chemical group Cl* 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 2
- 238000006731 degradation reaction Methods 0.000 description 2
- 239000004205 dimethyl polysiloxane Substances 0.000 description 2
- SNRUBQQJIBEYMU-UHFFFAOYSA-N dodecane Chemical compound CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- AOGQPLXWSUTHQB-UHFFFAOYSA-N hexyl acetate Chemical compound CCCCCCOC(C)=O AOGQPLXWSUTHQB-UHFFFAOYSA-N 0.000 description 2
- 238000010348 incorporation Methods 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 239000012442 inert solvent Substances 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 239000011733 molybdenum Substances 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 125000004430 oxygen atom Chemical group O* 0.000 description 2
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 2
- 239000011253 protective coating Substances 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 235000015096 spirit Nutrition 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- 238000010998 test method Methods 0.000 description 2
- CSDVDSUBFYNSMC-UHFFFAOYSA-N triethoxysilylmethyl acetate Chemical compound CCO[Si](OCC)(OCC)COC(C)=O CSDVDSUBFYNSMC-UHFFFAOYSA-N 0.000 description 2
- IJQHYEFNLXHUGV-UHFFFAOYSA-N trimethoxysilylmethyl acetate Chemical compound CO[Si](OC)(OC)COC(C)=O IJQHYEFNLXHUGV-UHFFFAOYSA-N 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 229910052726 zirconium Inorganic materials 0.000 description 2
- 125000001637 1-naphthyl group Chemical group [H]C1=C([H])C([H])=C2C(*)=C([H])C([H])=C([H])C2=C1[H] 0.000 description 1
- HFZLSTDPRQSZCQ-UHFFFAOYSA-N 1-pyrrolidin-3-ylpyrrolidine Chemical compound C1CCCN1C1CNCC1 HFZLSTDPRQSZCQ-UHFFFAOYSA-N 0.000 description 1
- SCVJRXQHFJXZFZ-KVQBGUIXSA-N 2-amino-9-[(2r,4s,5r)-4-hydroxy-5-(hydroxymethyl)oxolan-2-yl]-3h-purine-6-thione Chemical compound C1=2NC(N)=NC(=S)C=2N=CN1[C@H]1C[C@H](O)[C@@H](CO)O1 SCVJRXQHFJXZFZ-KVQBGUIXSA-N 0.000 description 1
- FRWYFWZENXDZMU-UHFFFAOYSA-N 2-iodoquinoline Chemical compound C1=CC=CC2=NC(I)=CC=C21 FRWYFWZENXDZMU-UHFFFAOYSA-N 0.000 description 1
- 125000004810 2-methylpropylene group Chemical group [H]C([H])([H])C([H])(C([H])([H])[*:2])C([H])([H])[*:1] 0.000 description 1
- 125000001622 2-naphthyl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C(*)C([H])=C([H])C2=C1[H] 0.000 description 1
- BMVIHLQXGBMZNN-UHFFFAOYSA-N 3-(2-methyl-4-trimethoxysilylbut-3-en-2-yl)oxypropan-1-amine Chemical compound CO[Si](OC)(OC)C=CC(C)(C)OCCCN BMVIHLQXGBMZNN-UHFFFAOYSA-N 0.000 description 1
- HUPGCAGBHBJUJC-UHFFFAOYSA-N 3-(3-trimethoxysilylpropoxy)aniline Chemical compound CO[Si](OC)(OC)CCCOC1=CC=CC(N)=C1 HUPGCAGBHBJUJC-UHFFFAOYSA-N 0.000 description 1
- PMJIKKNFJBDSHO-UHFFFAOYSA-N 3-[3-aminopropyl(diethoxy)silyl]oxy-3-methylpentane-1,5-diol Chemical compound NCCC[Si](OCC)(OCC)OC(C)(CCO)CCO PMJIKKNFJBDSHO-UHFFFAOYSA-N 0.000 description 1
- HXLAEGYMDGUSBD-UHFFFAOYSA-N 3-[diethoxy(methyl)silyl]propan-1-amine Chemical compound CCO[Si](C)(OCC)CCCN HXLAEGYMDGUSBD-UHFFFAOYSA-N 0.000 description 1
- GGZBCIDSFGUWRA-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]-n-methylpropan-1-amine Chemical compound CNCCC[Si](C)(OC)OC GGZBCIDSFGUWRA-UHFFFAOYSA-N 0.000 description 1
- GLISOBUNKGBQCL-UHFFFAOYSA-N 3-[ethoxy(dimethyl)silyl]propan-1-amine Chemical compound CCO[Si](C)(C)CCCN GLISOBUNKGBQCL-UHFFFAOYSA-N 0.000 description 1
- ZCRUJAKCJLCJCP-UHFFFAOYSA-N 3-[methoxy(dimethyl)silyl]propyl prop-2-enoate Chemical compound CO[Si](C)(C)CCCOC(=O)C=C ZCRUJAKCJLCJCP-UHFFFAOYSA-N 0.000 description 1
- DMZPTAFGSRVFIA-UHFFFAOYSA-N 3-[tris(2-methoxyethoxy)silyl]propyl 2-methylprop-2-enoate Chemical compound COCCO[Si](OCCOC)(OCCOC)CCCOC(=O)C(C)=C DMZPTAFGSRVFIA-UHFFFAOYSA-N 0.000 description 1
- PJURIXUDYDHOMA-UHFFFAOYSA-N 3-[tris[2-(2-methoxyethoxy)ethoxy]silyl]propan-1-amine Chemical compound COCCOCCO[Si](CCCN)(OCCOCCOC)OCCOCCOC PJURIXUDYDHOMA-UHFFFAOYSA-N 0.000 description 1
- URDOJQUSEUXVRP-UHFFFAOYSA-N 3-triethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CCO[Si](OCC)(OCC)CCCOC(=O)C(C)=C URDOJQUSEUXVRP-UHFFFAOYSA-N 0.000 description 1
- YMTRNELCZAZKRB-UHFFFAOYSA-N 3-trimethoxysilylaniline Chemical compound CO[Si](OC)(OC)C1=CC=CC(N)=C1 YMTRNELCZAZKRB-UHFFFAOYSA-N 0.000 description 1
- KBQVDAIIQCXKPI-UHFFFAOYSA-N 3-trimethoxysilylpropyl prop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C=C KBQVDAIIQCXKPI-UHFFFAOYSA-N 0.000 description 1
- SWDDLRSGGCWDPH-UHFFFAOYSA-N 4-triethoxysilylbutan-1-amine Chemical compound CCO[Si](OCC)(OCC)CCCCN SWDDLRSGGCWDPH-UHFFFAOYSA-N 0.000 description 1
- CNODSORTHKVDEM-UHFFFAOYSA-N 4-trimethoxysilylaniline Chemical compound CO[Si](OC)(OC)C1=CC=C(N)C=C1 CNODSORTHKVDEM-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
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- ZFLFQVOTPBCADM-UHFFFAOYSA-N CC[SiH](Br)Br Chemical compound CC[SiH](Br)Br ZFLFQVOTPBCADM-UHFFFAOYSA-N 0.000 description 1
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- KBJFYLLAMSZSOG-UHFFFAOYSA-N n-(3-trimethoxysilylpropyl)aniline Chemical compound CO[Si](OC)(OC)CCCNC1=CC=CC=C1 KBJFYLLAMSZSOG-UHFFFAOYSA-N 0.000 description 1
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- 238000010422 painting Methods 0.000 description 1
- 125000000913 palmityl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
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- 238000001556 precipitation Methods 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 229930195734 saturated hydrocarbon Natural products 0.000 description 1
- 235000001520 savin Nutrition 0.000 description 1
- 239000000565 sealant Substances 0.000 description 1
- 125000000467 secondary amino group Chemical group [H]N([*:1])[*:2] 0.000 description 1
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- 239000011593 sulfur Substances 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000001302 tertiary amino group Chemical group 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- UBOXGVDOUJQMTN-UHFFFAOYSA-N trichloroethylene Natural products ClCC(Cl)Cl UBOXGVDOUJQMTN-UHFFFAOYSA-N 0.000 description 1
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 1
- 239000005052 trichlorosilane Substances 0.000 description 1
- UZIAQVMNAXPCJQ-UHFFFAOYSA-N triethoxysilylmethyl 2-methylprop-2-enoate Chemical compound CCO[Si](OCC)(OCC)COC(=O)C(C)=C UZIAQVMNAXPCJQ-UHFFFAOYSA-N 0.000 description 1
- UOKUUKOEIMCYAI-UHFFFAOYSA-N trimethoxysilylmethyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)COC(=O)C(C)=C UOKUUKOEIMCYAI-UHFFFAOYSA-N 0.000 description 1
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 1
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/48—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
- C08G77/50—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms by carbon linkages
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/48—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
- C08G77/54—Nitrogen-containing linkages
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/60—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which all the silicon atoms are connected by linkages other than oxygen atoms
- C08G77/62—Nitrogen atoms
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/14—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/16—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers in which all the silicon atoms are connected by linkages other than oxygen atoms
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S528/00—Synthetic resins or natural rubbers -- part of the class 520 series
- Y10S528/901—Room temperature curable silicon-containing polymer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31652—Of asbestos
- Y10T428/31663—As siloxane, silicone or silane
Definitions
- This invention relates generally to silicon containing polymers and methods of making, and more particularly, to coating compositions comprising selected substituted polysilazanes and substituted polysiloxazanes which moisture cure at room temperature without requiring a catalyst.
- the coatings are thermally stable, and in the case of metal substrates, are corrosion-resistant as well. In some cases, the coatings may also be nonwetting.
- the invention additionally encompasses methods of preparing coated substrates having the aforementioned properties.
- U.S. Pat. 5,413,628 to Savin which teaches a moisture curable composition comprising an alkyl silicate as a film forming substance, zinc powder, zinc flakes, amorphous silica, and ferrophosphate, wherein the alkyl silicate comprises from about 5% to 20% of tetraethyl orthosilicate.
- U.S. Pat. 4,810,293 to Sano discloses an anti-corrosive paint composition containing a hydrolyzed condensate of tetraalkoxy silicate, zinc dust, and titanium oxide which undergoes a moisture _cure .
- U.S. Pat. 4,277,284 to Ginsberg et al. discloses a single- package, moisture curable zinc-rich coating composition utilizing zinc, a partially-hydrolyzed organic silicate and an aminosilane.
- U.S. Pat. 4,571,268 to Frain et al . discloses a single package, moisture curable zinc-filled coating comprising a mixture of partially hydrolyzed ethyl silicate with large amounts of metal particles, such as zinc dust in an organic solvent with an alkali metal nitrate as the catalyst.
- U.S. Pat. 5,508,360 to Cifuentes et al . discloses a silicon pressure-sensitive adhesive composition curable upon exposure to ambient moisture comprising an organopolysiloxane resin which is appended by alkoxy or oximino radicals.
- U.S. Pat. 4,526,556 to Homan et al . discloses a moisture- curable silicone composition for adhesive-release coatings comprising an alkoxysilylorganosiloxane, a titanium ester and an aminoorganosiloxane .
- U.S. Pat. 5,840,794 to Palmer discloses an RTV sealant composition of a polymer with silicon-containing end groups with at least two silicon-bonded alkoxy groups and a titanium catalyst.
- U.S. Pat. 5,208,300 to Krahnke et al . discloses silicone pressure sensitive adhesive compositions which are stable in the absence of moisture, but which cure in the presence of moisture comprising an adhesive component bearing alkoxy curing radicals and, optionally, a catalyst to accelerate the reaction of moisture with the alkoxy radicals to form siloxane bonds.
- U.S. Pat. 5,895,713 to Miyazaki et al . discloses a method for treating an outdoor article, wherein a surface treating agent comprising a medium containing a tetraalkoxysilane or a silane compound having a silanol group obtained by hydrolyzing an oligomer of such a tetraalkoxy silane is used in a moisture curable coating composition.
- polysilazane and polysiloxazane resins have been used to provide coatings with good thermal stability and nonwetting properties, including oxidation and corrosion resistance to metal substrates, most were not moisture curable.
- Other polysilazanes and polysiloxazane resins provided adherent, protective coatings, but required added catalyst or activator in order to become moisture curable at ambient temperatures.
- U.S. Pat. Nos. 5,405,655 and 5,919,572 to Blum et al . disclose certain polysilazane, polysiloxane and polysiloxazane coatings which can be made to undergo cure in the presence of an oxygen donor, such as water with the addition of a ruthenium catalyst.
- the mechanism of cure does not utilize alkoxy silyl groups as reactive moieties to effect the moisture cure, but rather relies on the activation of Si-H, N-H, and OH bonds by the metal catalyst to promote crosslinking reactions.
- novel silazane and siloxazane polymers with selectively substituted alkoxy silyl groups or mixtures of such groups can be employed as resins in coating compositions, wherein the polymers are capable of undergoing rapid moisture cure at room temperature conditions without requiring added catalyst.
- These moisture curable substituted silazane and siloxazane polymeric coatings not only have protective properties, e.g., corrosion resistance, but provide hard, durable coatings with excellent thermal stability while displaying good adhesion properties to a wide range of substrates.
- the silicon-containing polymers are alkoxy silyl substituted silazanes and siloxazanes of the formula:
- Z is any silazane or siloxazane polymer and A is an alkoxy silyl group of the formula:
- X is bonded to a silicon atom of Z and is either 0 or
- R is a member selected from the group consisting of hydrogen, lower alkyl, lower alkenyl, aryl, lower alkoxy, silyl, siloxyl and silazanyl;
- R 1 is alkylene or alkylene substituted with a heteroator ⁇
- R is a member selected from the group consisting of
- R is independently selected from the group consisting of hydrogen, lower alkyl and lower alkenyl, (iv) Cl to CIO alkenyl, either unsubstituted or substituted with hydroxyl, lower alkoxy, silyl and -N(R ) 2 r and (v) aryl of 1 or 2 rings, unsubstituted or substituted with hydroxyl, lower alkyl, lower alkenyl, lower alkoxy, silyl and
- the novel substituted silazane and siloxazane polymers, Z-A are prepared by the reaction of preformed silazane or siloxazane polymers with certain reagents having reactive amine, ester or hydroxyl functionalities.
- novel alkoxy silyl substituted polysilazanes and polysiloxazanes are prepared by heating a mixture of an alkoxy silyl reagent with the chosen polysilazanes or polysiloxazanes in the desired ratio, with the proviso that the ratio of the total number of OR 3 groups of A to Si-N bonds in Z, i.e., silazane or siloxazane polymer, prepared by the reaction is from about 0.05 to about 2.5, and preferably from about 0.1 to about 1.0, and most preferably from about 0.1 to about 0.50
- the resulting substituted polysilazane or polysiloxazane can then be coated onto a substrate from solution or without the use of a solvent, depending on the physical form of the coating resin.
- solvent coating is preferred; for liquid resins having low viscosity, a solventless coating method is preferred.
- Coatings prepared by this method are cured in an atmosphere which promotes crosslinking of the polymer by its reaction with moisture.
- These curing atmospheres include, but are not limited to air and other non-reactive or reactive gaseous environments which contain moisture, such as inert gases like nitrogen and argon, and reactive gases such as amr ⁇ onia, hydrogen, carbon monoxide, and the like.
- the cured coatings of the present invention may be used in a wide variety of contexts, insofar as they protect virtually any type of substrate, but particularly metal substrates from oxidative thermal degradation, corrosion, or chemical attack. Additionally, such coatings can also have nonwetting properties, and can be useful in a variety of applications where release characteristics are desirable.
- one principal object of the invention is to provide moisture curable coatings and compositions characterized by thermal stability and corrosion resistance. It is a further object of the invention to provide coatings of silicon containing polymers with thermal stability properties and, in the case of metal substrates, corrosion resistance .
- a further object of the invention is to provide a method of making alkoxy silyl substituted polysilazanes and polysiloxazanes .
- Still another principal object of the invention is to provide coated substrates with protective coatings which are thermally stable and, in the case of metal substrates, corrosion resistant.
- corrosion resistant or variation thereof as appearing in the specification and claims refers to coatings on a metal substrate which inhibit the corrosion of the metal substrate when it is exposed to air, heat, or corrosive environments for prolonged time periods.
- nonwetting refers to a substrate surface having a high contact angle with a liquid, typically greater than 90°. In preferred embodiments, “nonwetting” refers to nonwetting characteristics with water.
- alkyl refers to a branched, unbranched or cyclic saturated hydrocarbon groups having from 1 to 26 carbon atoms, such as methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, t-butyl, octyl, decyl, tetradecyl, hexadecyl, eicosyl, tetracosyl, and so on.
- Preferred alkyl groups herein contain 1 to 10, and most preferred from 1 to 8 carbon atoms .
- lower alkyl as appearing in the specification and claims is intended to embrace alkyl groups ranging generally from 1 to 6 carbon atoms, and more preferably, 1 to 4 carbon atoms.
- the alkyl groups present on the polymers described herein may be unsubstituted or substituted with one or more functional groups, e.g., halogen, alkoxy, hydroxyl, or the like.
- alkylene refers to difunctional saturated branched or unbranched hydrocarbon chains containing from 1 to about 26 carbon atoms, which may be unsubstituted or substituted with various heteroatom containing moieties.
- “Lower alkylene” as appearing in the specification and claims is intended to refer to alkylene linkages containing from 1 to 6 carbon atoms, and includes such representative examples as methylene (—CH 2 —), ethylene (—CH 2 -CH 2 — ) r propylene(—CH 2 CH 2 CH 2 --) , 2-methylpropylene (-CH 2 CH(CH 3 )CH 2 ) - hexylene (— (CH 2 ) 6 —) and the like, either unsubstituted or "heteroatom” group substituted as defined below.
- Heteroatom is intended to mean oxygen, nitrogen, sulfur, phosphorus or other elements which are not carbon or hydrogen.
- Alkylene substituted with a heteroatom as appearing herein is intended to mean heteroatom substitution which may be external to the alkylene hydrocarbon chain or internal to the hydrocarbon chain.
- 2-hydroxypropyl —CH 2 CHOHCH 2 —
- the alkylene group (—CH 2 CH 2 NHCH 2 — ), however, would constitute heteroatom substitution which is internal to the alkylene hydrocarbon chain, since carbon bond catenation is interrupted by the incorporation of N-C bonds in the alkylene chain.
- alkoxy is intended to refer to alkyl groups as defined above bound through an ether linkage, typically to a silicon atom.
- “Lower alkoxy” refers to an alkyl-oxygen group containing from 1 to about 6 carbon atoms, and more preferably, from 1 to about 4 carbon atoms .
- aryl refers to an aromatic species having 1 to 3 ring structures, which may be carbocyclic, heterocyclic, monocyclic or polycyclic, e.g., bicyclic moiety, e.g., phenyl or 1- or 2-naphthyl groups.
- these groups are substituted with 1 to about 4, and more preferably, 1 or 2 lower alkyl, lower alkoxy, hydroxy, amino, and/or nitro substituents .
- amino as appearing herein is intended to mean an amino group -NR 2 where R is independently selected from hydrogen or an alternative substituent, typically lower alkyl.
- amino is thus intended to include primary amino -NH 2 , "alkylamino” (i.e., a secondary amino group containing a single alkyl substituent), and “dialkylamino” (i.e., a tertiary amino group containing, for example, two alkyl substituents) .
- Halo or “halogen” is intended to include fluoro, chloro, bromo or iodo, and often relates to substitution for a hydrogen atom.
- Silazanes as appearing in the specification and claims is intended to include compounds which contain one or more silicon-nitrogen bonds in which the nitrogen atom is bonded to at least two silicon atoms, and may or may not contain cyclic units.
- polysilazane and “silazane polymer” are intended to include oligomeric and polymeric silazanes, i.e., compounds which include two or more monomeric silazane units.
- Siloxazane as used herein means compounds which contain one or more silicon-oxygen bonds in which the oxygen atom is bonded to two silicon atoms, plus one or more silicon-nitrogen bonds in which the nitrogen atom is bonded to two or three silicon atoms, and may, or may not contain cyclic units.
- polysiloxazane and siloxazane polymer are intended to include oligomeric and polymeric silazanes, i.e., compounds which include two or more monomeric silazane units, as well as two or more monomeric siloxane units.
- sil includes R 3 Si-, R 2 HSi-, where R is independently selected from the group consisting of hydrogen, alkyl, alkenyl, aryl and silyl; H 3 Si-, siloxyl, siloxazyl, and silazyl, and further, includes repeating silyl units, or "polysilyl" species.
- selectively substituted silazane and siloxazane polymers comprising alkoxy silyl substituents can be employed as coating resins which undergo rapid moisture cure at room temperature without the need for added catalyst.
- the selectively substituted silazane and siloxazane polymers of this invention are those wherein the ratio of the total number of OR 3 groups of A to Si-N bonds in Z is generally from about 0.05 to about 2.5, preferably from about 0.1 to about 1.0, and most preferably from about 0.1 to about 0.50.
- novel substituted silazane and siloxazane polymers are prepared by the reaction of a preformed silazane or siloxazane polymers with reagents having reactive amine or hydroxyl functionality of the structural formula:
- Y is either OH, OCOR 6 , or NHR 6 wherein R 5 is a member selected from the group consisting of hydrogen, Cl to C8 alkyl, Cl to C8 alkenyl, lower alkoxy, aryl and silyl; R is alkylene or alkylene substituted with a heteroatom; R 2 is selected from the group consisting of (i) hydrogen, (ii) hydroxyl, (iii) Cl to CIO alkyl, either unsubstituted or substituted with hydroxyl, lower alkoxy, lower alkenyl, silyl and -NR 5 where R5 is independently selected from the group consisting of hydrogen, lower alkyl and lower alkenyl,
- alkoxy silyl substituted polysilazanes and polysiloxazanes of the present invention resulting from the reaction of the alkoxy silyl reagents described above with polysilazanes, polysiloxazanes, or mixtures thereof comprise:
- the base ingredients in the inventive compositions include preformed polysilazanes and polysiloxazanes. Any polysilazane known in the art or commercially available having repeating units of Si-N linkages, including mixtures of polysilazanes can be used to prepare the novel alkoxy silyl substituted compositions of the invention. Similarly, any known or commercially available polysiloxazane and mixtures thereof can be used to prepare the compositions.
- the alkoxy silyl substituted coating compositions may also be prepared with heterogeneous mixtures containing both preformed silazane and siloxazane polymers.
- polysilazane as appearing herein is intended to include any oligomeric or polymeric composition.
- polysilazane denotes a compound which includes one or more Si-N units in which the nitrogen atoms are bonded to at least two silicon atoms.
- oligomer is also intended to mean a molecule or chemical compound comprising several repeat units, generally from about 2 to 10 repeat units.
- Polymer as used herein, means a molecule or compound which comprises a large number of repeat units, generally greater than about 10 repeat units.
- the oligomeric or polymeric silazanes of this invention may be amorphous or crystalline in nature. Such compositions may be liquid or solids which are cyclic, linear, or cyclolinear in nature.
- the polysilazane has at least one silyl amine group, and more preferably, at least two terminal and primary silyl amine groups as part of its composition, although the presence of at least two Si-N bonds within the molecule suffices to provide the reactivity essential to the preparation of the novel compositions of the invention.
- polysilazanes that can be used include, but are not limited to, polymers described in U.S. Patent 4,482,669 entitled “Preceramic Organosilazane Polymers” issued to Seyferth et al; U.S. Patent No. 4,774,312 entitled “Polydisilacyclobuta-silazanes” issued to Burn: U.S. Pat. No. 4,689,252 entitled “Polysilazane Compositions which can Crosslink in the Presence of a Metal Compound Catalyzing a Hydrosilylation Reaction” issued to Laine et al; U.S. Pat. No. 4,612,383 entitled “Method of Producing Polysilazanes” issued to King et al .
- polysilazanes or silazane polymers are the “polyureasilazanes”, which includes the poly (thio) ureasilazanes, such as disclosed by U.S. Pat. 5,155,181 entitled “ (Thio) amide-Modified Silazane Polymer Composition Containing a Free Radical Generator” by Schwark; U.S. Pat. No. 4,929,704 for "Isocyanate- and Isothiocyanate- Modified Polysilazane Ceramic Precursors” also to Schwark, and U.S. Pat.
- novel polysilazanes may be prepared according to the methods set forth in U.S. Patent 6,329,487, dated December 11, 2001, the contents of which are incorporated herein-by-reference .
- novel polysilazanes prepared are characterized by repeating units of silicon-nitrogen linkages and comprising a reduced amount of Si-H bonds relative to the quantity of Si-H bonds found in the halosilanes used to prepared the novel polysilazanes.
- halosilanes is meant to include organohalosilanes, as well inorganic species.
- the preferred novel polysilazanes are prepared by reacting a halosilane, that must have at least one Si-H bond, with anhydrous liquid ammonia, where the halosilane has the general formula:
- Rm ⁇ si — x 4-n where m is 0 to 2, n is 1 to 3, provided the sum of m + n is from 1 to 3.
- halosilanes of formula (A) are especially preferred, other representative halosilanes useful in the preparation of the coating compositions of the present invention includes those compounds represented by the structural formula:
- R may be identical or different, i.e., independently selected, and can be a substituted or unsubstituted alkyl group, a substituted or unsubstituted cycloalkyl group, a substituted or unsubstituted alkenyl group and a substituted or unsubstituted aryl group;
- X is a halogen atom selected from bromine, chlorine or iodine.
- each R is the same, as those silanes are more readily available and easier to make.
- X is preferably chlorine
- m is preferably 1
- n is preferably 1.
- suitable halosilanes and organohalosilanes include, but are not limited to, dichlorosilane, methyldichlorosilane, dimethylchlorosilane, dimethyldichlorosilane, diethylchlorosilane, ethyl dichlorosilane, ethyl dibromosilane, ethyldiiodosilane, ethyl difluorosilane, dichloromonofluorosilane, propyldibromo-silane, isopropyldichlorosilane , but yldiiodosilane , n- propyldichlorosilane, dipropylchlorosilane, trichlorosilane, n-butyldichlorosilane,
- halosilanes are also useful in preparing the polysilazane reactant because the organic groups attached to silicon can often impart a variety of chemical and/or physical characteristics of use to the polymer. For instance, organic residues of high hydrocarbon content can assist in hydrocarbon solvent solubility, as well as confer a greater degree of hydrolytic stability to the polysilazane.
- the novel halosilanes of general formula (A) can be mixed with up to about 90 wt% of a halosilane that does not contain an Si-H bond, such as species falling within the genus of general formula (B) before the preparation of the polysilazane via ammonolysis in anhydrous liquid ammonia.
- the halosilane of the above general formula (A) is mixed with the second halosilane that does not contain an Si-H bond prior to ammonolysis, for the sake of simplicity.
- novel polysilazane compounds represented by structural formula (A) in the preferred embodiment described above are prepared by ammonolysis, the method comprising the following steps: introducing at least one halosilane having at least one Si-hydrogen bond into anhydrous liquid ammonia wherein any formed ammonium halide salt is solubilized and provides an acidic environment therein; and maintaining the formed silazanes in the acidic environment for further polymerization thereby reducing the number of Si-H bonds that were present initially in the starting halosilane. No metal catalyst or other added catalytic agent is required to produce the preferred silazane polymers described above.
- the selected halosilane or mixtures thereof are introduced directly into and reacted with anhydrous liquid ammonia.
- anhydrous liquid ammonia Normally, during ammonolysis, on a strictly stoichiometric basis, two molecules of ammonia are needed for each halogen atom substituted on a halosilane.
- One ammonia molecule replaces the halogen atom, while the second molecule of ammonia forms an ammonium halide salt.
- it has been found to be advantageous to introduce the halosilanes into a closable reaction vessel which is already charged with an excess of anhydrous liquid ammonia preferably, at least twice the amount of ammonia as Si-X bonds present. More preferably, it is desirable to use at least five times the amount of ammonia as Si-X bonds.
- the anhydrous liquid ammonia is maintained at a sufficient temperature and/or pressure to remain in a liquefied state and, preferably, between about -33°C to about 130°C.
- the anhydrous ammonia in a liquefied state, acts as a reactive solvent that not only participates as a nucleophile in the nucleophilic attack on the halosilane, but also solubilizes and retains a substantial amount of ammonium halide salt produced during ammonolysis.
- the ionized salt acts as an effective catalyst in the polymerization process to produce novel polysilazanes which are depleted in Si-H content from their original composition without the use of added metallic or other added catalysts.
- the reaction proceeds in a homogeneous phase wherein the generated ammonium halide salt is solubilized and ionized in the anhydrous liquid ammonia solution of silane ammonolysis product, thereby reducing precipitation of ammonium halide salt and allowing the solubilized salt to act in catalytic fashion to polymerize the halosilane ammonolysis products.
- This process is accompanied by a reduction in Si-H bonds in the product relative to the number present in the halosilane reactants and ammonolysis products.
- the polysilazane product having reduced Si-H content is then found to spontaneously separate from the liquid ammonia phase. In this new phase layer it is essentially free from ammonium chloride salt contamination.
- solubilization of ammonium chloride avoids contamination of the ammonolysis products with precipitated salt.
- the process described above also eliminates the need for introducing an inert solvent to reduce the viscosity of the reaction mixture, as described in prior art.
- a distinct disadvantage of adding such inert solvent is the problem of dealing with the large evolution of heat which accompanies the crystallization of the ammonium chloride from the reaction mixture. This problem is circumvented in the process described above, since the ammonium chloride remains in solution in the anhydrous liquid ammonia.
- novel polysilazanes preferred for use in the present invention are characterized by having a decreased number of Si- H bonds relative to the amount of Si-H bonds contained in the starting compounds .
- the reduction in Si-H bonds can range from about 10% to about 90% relative to the number of Si-H bonds contained in the starting compounds . Additionally, it has been found there is a proportional increase in the Si-N linkages which is essentially proportional to the reduction in Si-H bonds.
- the novel polysilazanes of structural formula (A) are believed to comprise several different structures including linear, branched, ladder, and fused ring morphologies, although it is believed that these novel polysilazanes have fewer isolated ring structures than prior polysilazanes.
- polysilazane having fused six and eight membered rings are shown in structures (1) and (2) below. These structures are merely representative of the novel polysilazanes prepared with the halosilanes of structural formula (A) employing the novel methods disclosed in US Pat. 6,329,487, wherein R is independently selected from the group consisting of hydrogen, substituted or unsubstituted alkyl, substituted or unsubstituted cycloalkyl, substituted or unsubstituted alkenyl or substituted or unsubstituted aryl group, and n is 1 or greater.
- the silicon-chlorine bonds undergo ammonolysis, generating a diaminosilane which is further converted into a linear molecule containing several Si- N repeat units.
- the linear structure is stabilized in the anhydrous liquid ammonia containing an ionized ammonium halide salt dissolved therein.
- This ionized and dissolved ammonium halide salt then acts as an acid catalyst which catalyzes a loss of a Si-H bond to generate a new silicon-chlorine bond on the straight chain of the polymer.
- the newly generated chlorosilane bond may then undergo further ammonolysis. This reaction will proceed until virtually all chlorosilicon bonds undergo ammonolysis.
- the polymerization can be performed in the same reactor and at the same conditions used for ammonolysis and without isolation of the initial silazane ammonolysis product. Thus, ammonolysis and polymerization may all be occurring at the same time. Two easily-separated phases are formed and the novel polysilazane can be easily isolated in a relatively pure state by filtering and washing with either additional liquid ammonia, or a simple hydrocarbon solvent, such as hexane or heptane.
- any polysiloxazane or mixture of polysiloxazanes with one another, or with polysilazanes known in the art or commercially available can be used to prepare the novel alkoxy silyl substituted compositions of this invention.
- the term "polysiloxazane” is also intended to mean any oligomeric or polymeric composition comprising a plurality of Si-N repeat units, as well as a plurality of Si-0 repeat units.
- the oligomeric and polymeric siloxazane reactants of this invention may be amorphous or crystalline in nature. Such compositions may be liquid or solid, cyclic, linear, or cyclolinear in nature.
- the polysiloxazanes preferably have at least one silyl amine group, and more preferably, at least two terminal and primary silyl amine groups as part of its composition, although the presence of at least two Si-N bonds within the molecule suffices to provide the reactivity essential to the preparation of the novel compositions of this invention.
- Representative examples of various polysiloxazanes that can be used include, but are not limited to, polymers described in U.S. Patents 5,405,655 and 5,919,572 to Blum et al .
- silicon- containing polymers (Z) may be employed in making the alkoxy silyl substituted silicon-containing polymers.
- Representative examples are the novel block copolymers disclosed in copending U.S. Patent Application Serial No .09/793, 224, filed February 26, 2001, the contents of which are incorporated herein-by- reference. This application teaches the preparation of block copolymers of silazanes and siloxanes by the reaction of preformed polysilazanes with silyl hydroxy or silyl amine terminated polysiloxanes .
- the polysilazane blocks described in the above co-pending application may be oligomeric or polymeric in nature, cyclic, linear, or cyclolinear in structure, and either liquid or solid in form.
- each polysilazane contains at least four repeating units, and more preferably, from about six to greater than about 20 repeating units .
- the polysilazane blocks may contain at least two silyl amine groups through which they can polymerize with functional groups , such as hydroxyl groups of the polysiloxane blocks .
- the above description illustrates the reactivity of an Si-OH group with a polysilazane
- a variety of other nucleophilic groups may be used to prepare the block copolymers.
- the polysiloxane used in the practice of the invention may comprise such nucleophilic groups as -OH, -NH 2 , -NRH, -C0 2 H, -SH, and others to effect the desired covalent linkages between the polysilazane blocks and the polysiloxane blocks of the novel block copolymers. While this group is representative of the types of nucleophilic moieties which can react with Si-N bonds in the polysilazanes used in the practice of the invention, it is not limiting.
- nucleophilic group which can cleave the Si-N bond can be used to prepare these novel compositions.
- the nucleophilic group may be bonded directly to silicon, or may be present at the terminus of a "spacer" group which is bonded to silicon.
- a polysiloxane which is terminated with an aminopropylsilyl group is also suitable for the practice of the invention:
- the polysilazane blocks are copolymerized with any polysiloxane or mixtures of different polysiloxanes that are commercially available, or can be prepared by methods well- known in the art.
- the polysiloxane may contain a linear, branched, or cross-linked polymeric system of alternating silicon and oxygen atoms having the general formulas:
- R may be the same or different and includes, but is not limited to hydrogen, a substituted or unsubstituted alkyl group, a substituted or unsubstituted cycloalkyl group, a substituted or unsubstituted alkenyl group, and a substituted or unsubstituted aryl group and the like.
- the polysiloxane contains at least two reactive nucleophilic functional groups including hydroxyl groups, amine groups, acid groups, and thiol groups. More preferably, a polysiloxane contains hydroxyl groups. It is believed that a polysiloxane polymer having at least two, and preferably more nucleophilic substituents acting as reactive groups attack the Si-NH 2 or Si-NH-Si bonds of the polysilazane as described above, resulting in the breaking of these bonds and the formation of new bonds.
- the polysiloxane should contain at least 4 repeating units; preferably the polysiloxane contains about 6 to greater than about 20 repeating units to maximize the advantageous properties of each segment in the block copolymer.
- the polysilazane/polysiloxane block copolymer can be prepared by polymerizing the polysilazane with the polysiloxane.
- the weight ratio of the polysilazane to the polysiloxane should be about 15:85 to about 85:15 as at ratios above or below these full copolymerization of the blocks is often not effected; the preferred polysilazane / polysiloxane weight ratio is about 20:80 to about 80:20.
- At least about 90 wt% of the copolymer should be made from polysilazane and polysiloxane blocks that are each at least 10 wt% of the copolymer.
- the viscosity can be reduced, if desired, by the addition of an aromatic hydrocarbon solvent such as, toluene, xylene, an aliphatic hydrocarbon solvent such as heptane, decane, or dodecane, an ether solvent such as tetrahydrofuran or anisole, an ester solvent, such as hexyl acetate or butyl propionate, or a ketone solvent such as acetone, methylethylketone, and the like.
- aromatic hydrocarbon solvent such as, toluene, xylene, an aliphatic hydrocarbon solvent such as heptane, decane, or dodecane
- an ether solvent such as tetrahydrofuran or anisole
- an ester solvent such as hexyl acetate or butyl propionate
- ketone solvent such as acetone, methylethylketone, and the like.
- novel moisture curable polysilazanes and polysiloxazanes are prepared by reacting a preformed polysilazane or polysiloxazane with reagents having reactive amine or hydroxyl functionality.
- Alkoxy silyl reagents useful in the practice of this invention have the structural formula:
- alkoxy silyl reagents useful for the practice of this invention include, but are not limited to acetoxymethyltriethoxysilane, ace toxymethyltrimethoxysi lane, acetoxypropyltrimethoxysilane,N- (3-acryloxy-2-hydroxy-propyl) -
- 3-aminopropyltriethoxysilane (3-acryloxypropyl) dime thy lmethoxysi lane, (3-acryloxypropyl) me thyldimethoxy- silane, (3-acryloxypropyl) trimethoxysilane , 3- (N-allylamino) propyltrimethoxysilane, 4-aminobutyltriethoxysilane, N-(2- aminoethyl) - 3 - a inoi sobut y l e thy ldime thoxy s i 1 ane ,
- aminoethylaminomethylphenethyltrimethoxysilane N- (2-amino ethyl) -3-aminopropylmethyldimethoxysilane, N- (2-aminoethyl) -3- aminopropyltrimethoxysilane, N- ( 6-aminohexyl) aminopropyl- trimethoxysilane, 3- (m-aminophenoxy) propyltrimethoxysilane, m-aminophenyltrimethoxysilane, p-aminophenyltrimethoxy- silane,
- -1-propenyl-trimethoxysilane, 3-aminopropyltriethoxysilane, 3- amino-propyltrimethoxysilane, and (3-trimethoxysilylpropyl) diethylenetriamine are preferred.
- alkoxy silyl substituted polymers of the invention include the following:
- novel alkoxy silyl substituted polysilazanes and polysiloxazanes of the present invention are prepared by simply heating the desired polysilazane or polysiloxane or mixtures of polysilazanes and polysiloxazanes in the presence of the alkoxy silyl reagent.
- An amount of alkoxy silyl reagent is chosen such that the final composition contains a ratio wherein the total number of OR 3 groups of A to Si-N bonds in Z is generally from about 0.05 to about 2.5, preferably from about 0.1 to about 1.0, and most preferably from about 0.1 to about 0.50.
- the reaction is typically performed without solvent, since the preferred alkoxy silyl reagents, polysilazanes, and polysiloxazanes are typically liquids. However, the reaction may optionally be performed in solvent. Suitable solvents include hydrocarbon solvents such as toluene, hexane, or heptane, ether solvents such as tetrahydrofuran or dimethoxyethane, or dry ketone solvents such as acetone, methyl ethyl ketone, and the like.
- hydrocarbon solvents such as toluene, hexane, or heptane
- ether solvents such as tetrahydrofuran or dimethoxyethane
- dry ketone solvents such as acetone, methyl ethyl ketone, and the like.
- the reaction is generally conducted in a range from about 25° to about 150°C, and more specifically, from about 50° and 120°C, and most preferably, from about 80° to about 110°C. Times for the reactions to go to completion generally range from about 10 minutes to about 2 hours.
- the reaction product When solvent is omitted, the reaction product may be used directly upon cooling with no further work-up. When a solvent is employed, the solvent may be removed by conventional techniques, such as distillation. Alternatively, the solution of the reaction product in the solvent may be used directly to coat a substrate.
- Coated substrates according to this invention are prepared by coating the alkoxy silyl substituted polysilazane or polysiloxazane composition directly onto the substrate of interest, provided the polymer is a low viscosity liquid.
- the alkoxy silyl substituted polysilazane or polysiloxazane can be dissolved in a compatible organic solvent to prepare a coating solution.
- Preferred solvents for preparing the coating solutions are such that they do not react with the polymer (e.g., alcohol or amine solvents should generally be avoided when preparing coatings of polysilazanes and polysiloxazanes when solvent reactivity is desired) , and are sufficiently volatile to facilitate drying the coatings.
- coating solutions are formulated with from 0.1 wt% to 99 wt% polymer, and more specifically from 0.1 wt% to about 20 t% polymer, and most preferably from 0.1 wt% to about 10 wt% polymer.
- organic or inorganic powders may also be desirable to incorporate organic or inorganic powders into the coating compositions. This may be done for a number of reasons, the most obvious of which are to increase the viscosity of the coating solutions to enable preparation of a paste, or a relatively thick solution so that it may be "painted” onto a substrate, or to impart specific performance characteristics to the coating.
- metal powders such as copper, iron, zirconium, titanium, tungsten, molybdenum, zinc, and .aluminum may be admixed with the polymeric solution prior to coating. Such a technique is useful, for example, to provide an anti-corrosion barrier on the surface of a metallic substrate. Incorporation of metal powder into the coating solution is also useful to prepare a harder coating, regardless of the substrate (in which case preferred metal powders include zirconium, titanium, tungsten, molybdenum and hafnium powders) .
- Ceramic powders and glasses such as silicon carbide, silicon nitride, boron carbide, titanium carbide, titanium nitride, tungsten carbide, molybdenum oxide, silica and aluminum oxide, typically for the purpose of creating a harder coating, but also useful for providing a nonconductive surface on a conductive substrate, for providing corrosion-resistant coatings, impact-resistant coatings, and coatings having a mismatched thermal expansion coefficient, i.e., relative to the substrate surface.
- silica, boron nitride, aluminum nitride or beryllium oxide powders in the coating solution is desirable in electronics applications, insofar as these materials are good dielectrics.
- Carbon powder including pyrrolytic carbon powder and graphite powder
- organic powders such as Teflon®, polysiloxane, poly-carbonate, or polyamide powders may also be used to thicken the coating solutions.
- various mineral powders may be employed, such as clays, which can act as thixotropes.
- the invention contemplates coating a wide variety of substrates employing the polymeric compositions and methods disclosed herein. They include substrates comprised of metallic, ceramic, glass and organic materials, such as polyesters, nylons, acrylates, and so on. Specific representative examples of metal substrates include steel, aluminum, copper and alloys thereof. Examples of ceramics include silicon nitride, silicon carbide, silica, alumina, zirconia, and the like. It will be appreciated by those skilled in the art that the foregoing lists are merely illustrative of various materials which may be coated using the presently disclosed compositions and methods, and are not in any way limiting of the different substrates with which the present invention is useful.
- Coatings may be applied by dipping the substrate in the aforementioned coating compositions.
- the coatings may be applied by painting, wiping, spraying or spin- coating techniques. These procedures will typically provide pure polymer coatings having thicknesses of up to about 75 microns per coat for the cured polymers, but may provide coatings on the order of 1 micron or even thinner, if desired. If a thicker coating is desired, multiple coating layers may be provided.
- the layers may be comprised of the same or different polymeric materials, and may be applied from coating compositions which may or may not contain solvent.
- Coatings may be cured at temperatures ranging from room temperature to about 50°C. Preferably, curing is performed at temperatures not exceeding about 100°C.
- Coatings prepared by methods of the invention are cured in an atmosphere which promotes crosslinking of the polymer by its reaction with moisture.
- These curing atmospheres include, but are not limited to, air and other non-reactive or reactive gaseous environments which contain moisture, inert gases like nitrogen and argon, and reactive gases such as ammonia, hydrogen, carbon monoxide, and so on. Rapid cure times are achieved using this method when the applied coatings are exposed to the moisture-containing atmosphere at room temperature.
- the coatings so provided may be used in a wide variety of contexts, insofar as they protect virtually any type of substrate from oxidative thermal degradation, corrosion, or chemical attack.
- the coatings may also be used to strengthen relatively flaw sensitive brittle substrates such as glass and, as noted earlier herein, can be useful for providing a nonwetting surface.
- the coatings may additionally be useful to provide electrical insulation and/or bonding or compatibility interfaces between different types of materials.
- a preferred silazane copolymer reactant was first prepared according to Example 1 of U.S. Pat. 6,329,487 by coammonolysis of a mixture of 673.5 grams of methyldi- chlorosilane and 346.9 grams of dimethyldichlorosilane.
- a moisture curable silyl alkoxy-substituted polysilazane was prepared having a silyl ethoxy group, ⁇ Si-OCH 2 CH 3 , to Si-N bond ratio of 0.42, according to the following steps:
- the resulting product was a clear, colorless liquid having a viscosity of 21.5 cp, measured using a Wells- Brookfield Cone/Plate Digital Viscometer.
- the resulting product was a clear, colorless liquid having a viscosity of 24.8 cp.
- FT-IR analysis indicated characteristic peaks at the following wave numbers: 3377 (w) , 2957 (w), 2897 (w), 2119 (m), 1391 (w) , 1253 (m) , 1167 ( ) , 1105 (w) , 1079 (w), 935(s), 893(s), 831 (m) , 783(s).
- a moisture curable, silyl alkoxy-substituted polysilazane having a silyl ethoxy group, ⁇ Si-OCH 2 CH 3 , to Si-N bond ratio of 0.12 was prepared by a 2-step heating schedule by the following method: 290.7 grams of 3-aminopropyltriethoxysilane were added at room temperature with constant stirring to 2131.8 grams of the silazane copolymer prepared according to Example 1, Part A. The reaction mixture was then slowly heated to 50°C with constant stirring under a nitrogen atmosphere. The reaction was allowed to proceed at this temperature for 1.5 hours, after which heating was stopped and the reaction mixture was allowed to cool slowly to room temperature. The reaction mixture was then slowly heated to 78°C with constant stirring under a nitrogen atmosphere. The reaction was held at 78°C for 1 hour, and then allowed to cool slowly to room temperature with stirring under nitrogen.
- the resulting product was a clear, colorless liquid having a viscosity of 32.7cp.
- FT-IR analysis indicated characteristic peaks at the following wave numbers: 3385(w) ,2956(w) ,2898 (w) , 2118 (m) , 1391 (w) , 1253 ( ) , 1167 (m) , 1105(w), 1079(w), 935(s), 893 (s) , 831 (m) , 783 (m) .
- FT-IR analysis indicated characteristic peaks at the following wave numbers: 3379 (w), 2958 (w) , 2927 (w), 2895 (w), 2120 (m), 1442 (w) , 1391 (w) , 1253 ( ) , 1167 (m), 1104 (m), 1079 (m), 940 (s), 896 (s), 831 (m) , 784 (m) .
- Product (b) was a clear, colorless liquid having a viscosity of 21.5 cp.
- FT-IR analysis indicated characteristic peaks at the following wave numbers: 3384 (w), 2957 (w) ,
- Product (c) was a clear, colorless liquid having a viscosity of 25.1cp.
- FT-IR analysis indicated characteristic peaks at the following wave numbers: 3379 (w) , 2957 (w) , 2898 (w) , 2120 (m), 1391 (w), 1253 (m) , 1167 (m) , 1104 (w) , 1078 (w) , 940 (s), 89 (s) , 830 (m) , 783 (m) .
- a moisture curable, silyl alkoxy-substituted polysilazane was prepared with a silyl ethoxy group, ⁇ Si-OCH 2 CH 3 , to Si-N bond ratio of 0.21 according to the following steps: 258.95 grams of 3-aminopropyltriethoxysilane was added gradually to 1035.80 grams of the silazane copolymer prepared according to Example 1, Part A, above with constant stirring at room temperature. The reaction mixture was then heated gradually to a temperature of 125°C with constant stirring under a nitrogen atmosphere. Gas evolution was observed during heating to 125°C.
- the resulting product was a clear, colorless liquid with a viscosity of 16.9cp.
- FT-IR analysis indicated characteristic peaks at the following wave numbers: 3379 (w), 2956 (w), 2927 (w), 2895 (w), 2120 (m) , 1442 (w) , 1390 (w), 1253 (m) , 1167 (m) , 1104 (m), 1078 (m), 936(s), 896(s), 831 (m) , 784 (m) .
- the product was a clear, colorless liquid having a viscosity of 30.7 cp.
- FT-IR analysis indicated characteristic peaks at the following wave numbers: 3377 (w) , 2954 (w) ,
- a moisture curable, silyl alkoxy-substituted polysilazane was prepared having a silyl methoxy group, ⁇ Si-OCH 3 , to Si-N bond ratio of 0.35, according to the following steps:
- the product was a clear, colorless liquid having a viscosity of ⁇ 10,000 cp.
- FT-IR analysis indicated characteristic peaks at the following wave numbers: 3378 (w) ,
- EXAMPLE 10 A moisture curable, silyl alkoxy-substituted polysilazane was prepared using a mixture of 3-aminopropyltriethoxysilane and N- (2-aminoethyl) -3-amino-propyltrimethoxysilane reagents wherein the product had a combined silyl ethoxy group, ⁇ Si- OCH 2 CH 3/ and silyl methoxy group, ⁇ Si-OCH 3 , to Si-N bond ratio of 0.38.
- the polymer was prepared as follows:
- the product formed was a clear, colorless liquid with a viscosity of 21.5 cp.
- FT-IR analysis indicated characteristic peaks at the following wave numbers: 3378 (w) , 2956 (w), 2898 (w), 2837 (w), 2119 (m) , 1443 (w) , 1391 (w) , 1253 (m) , 1167 (m) , 1103 (m), 1080 (m), 940 (s), 895 (s), 830 (m) , 782 (m) .
- the product formed was a clear, colorless liquid with a viscosity of 26.6 cp.
- FT-IR analysis indicated characteristic peaks at the following wave numbers: 3365 (w), 2955 (w), 2900 (w), 2841 (w), 2120 (m) , 1736 (m), 1466 (w), 1413 (w) , 1387 (w) , 1366(w), 1252 (m), 1171 (m) , 1087 (m) , 940(s), 895(s), 823 (m) , 781 (w) .
- a silazane terpolymer was first prepared by coammonolysis of 100 grams of ( trideca f luoro- 1 , 1 , 2 , 2 - tetrahydrooctyl) methyldichlorosilane, 152.7 grams of di- methyldichlorosilane, and 515.4 grams of methyldichloro-silane according to procedures outlined in Example 1 of US Pat.
- the reaction provided 331.2 grams of a clear, colorless silazane terpolymer having a viscosity of 35.3 cp. 203.3 grams of this terpolymer was then blended with 100 gra s of 3-aminopropyltriethoxysilane at room temperature and heated in stepwise fashion to temperatures of 50°C, 65 °C, and 75 °C with constant stirring under a nitrogen atmosphere. When the temperature reached 75°C, the reaction mixture was stirred for a period of 1 hour, after which heating was terminated. The reaction product was then allowed to cool slowly to room temperature with constant stirring under nitrogen.
- the product formed was a clear, colorless liquid with a viscosity of 20cp.
- FT-IR analysis indicated characteristic peaks at the following wave numbers: 3383 (w) , 2972 (w) , 2928 (w), 2897 (w), 2124 (m) , 1442 (w) , 1391 (w) , 1365 (w) , 1253 (m) , 1166(m), 1104(m), 1079 (m) , 941(s), 897(s), 831 (m) , 780 (m) , 707 ( ) .
- the moisture curable polymers of the invention may be prepared from block copolymers.
- a preferred class of block copolymers are the polysilazane /polysiloxane type disclosed in copending U.S. Patent application 09/793,224, filed February 26, 2001.
- a hydroxy-terminated polydimethylsiloxane was prepared according to Example 5 of the above copending application by coammonolysis of a mixture of methyldichlorosilane and dimethyldichlorosilane followed by reaction with a hydroxy-terminated polydimethylsiloxane.
- a moisture curable silyl alkoxy-substituted polysiloxane block copolymer having a silyl ethoxy group, ⁇ Si-OCH 2 CH 3 , to Si-N bond ratio of 0.46 was prepared according to the following steps:
- FT-IR analysis indicated characteristic peaks at the following wave numbers: 3386 (w), 2060 (w), 2928 (w), 2897 (w) , 2115 (w) , 1442 (w) , 1391 (w) , 1256 (m), 1167(m), 1102(s), 1079(s), 1018 (m) , 927(s), 905(s), 793(s).
- Preparation of a preferred polyureasilazane used as a reactant in the practice of this invention was carried out by coam onolysis of a mixture of methyldichlorosilane and vinylmethyldichlorosilane followed by reaction with phenyl- isocyanate as taught in Example 1 of U.S. Patent 4,929,704 to Schwark.
- PART B Preparation of a moisture curable, silyl alkoxy- substituted polyureasilazane having a silyl ethoxy group, ⁇ Si- OCH 2 CH 3 , to Si-N bond ratio of 0.42.
- the resulting product was a clear, pale yellow liquid having a viscosity of 32cp.
- FT-IR analysis identified characteristic peaks at the following wave numbers (cm " ) : 3386(w), 3047 (w), 2972 (w) , 2927 (w) , 2895 (w) , 2124 ( ) , 1442 (w) , 1391 (w) , 1253 (m), 1166(m), 1103 (m) , 1079(m), 945(s), 897(s), 786 (m) .
- the silazane copolymer prepared in Example 1, Part A (without added solvent) was brush coated onto a steel panel which had been degreased by wiping with acetone, and further prepared by wiping with a 5% aqueous ammonium hydroxide solution.
- the coating failed to cure when allowed to remain for several days on the panel at room temperature conditions.
- the moisture-curable, silyl alkoxy-substituted polysilazanes prepared in Examples 1, 4, 5, and 6 containing silyl ethoxy group, ⁇ Si-OCH 2 CH 3 , to Si-N bond ratios of 0.42, 0.37, 0.29, and 0.22, respectively, were (without added solvent) brush coated also onto steel panels which had been degreased by wiping with acetone, and further prepared by wiping with a 5% aqueous ammonium hydroxide solution.
- the coating prepared using the polymer having a silyl ethoxy group to Si-N bond ratio of 0.42 was dry to the touch in 1 hour.
- the coating prepared using the polymer having a silyl ethoxy group to Si-N bond ratio of 0.37 was dry to the touch in 2 hours, and the coatings prepared using the polymers having silyl ethoxy group to Si-N ratios of 0.29 and 0.22 were dry to the touch after several hours time. All formed clear, colorless, hard coatings after being left to cure for at least 24 hours. Surface energy analysis of the cured coating indicated a contact angle with water of 98.6°, and a surface energy of 17.8 dynes/cm.
- the polysilazane/polysiloxane block copolymer prepared in Example 13, Part A was (without added solvent) brush coated onto an aluminum panel substrate which had been degreased by wiping with acetone. The coating failed to cure after remaining on the substrate at ambient room conditions for several days.
- PART B The moisture-curable, silyl alkoxy-substituted polysiloxane block copolymer prepared in Example 13, Part B was (without added solvent) coated onto a aluminum panel which had been degreased by wiping with acetone. The coating fully cured overnight to a clear, smooth coating. Surface energy analysis of the cured coating indicated a contact angle with water of 98.6° and a surface energy of 15.4 dynes/cm.
- Example 14 The polyureasilazane prepared in Example 14, Part A was (without added solvent) brush coated onto an aluminum substrate which had been degreased by wiping with acetone. The coating failed to cure when allowed to remain for several days at ambient room conditions.
- Example 14 The moisture-curable, silyl alkoxy-substituted polyureasilazane prepared in Example 14 was (without added solvent) coated onto a aluminum panel which had been degreased by wiping with acetone. The coating fully cured overnight to a clear, smooth coating.
- EXAMPLE 22 The following silver gray pigmented coating composition having exceptionally high temperature durability was prepared using the moisture curable, silyl alkoxy-substituted polysilazane of Example 1, Part B.
- a one package, high temperature coating was prepared by mixing the following ingredients in the proportions indicated:
- the coating formulation was then brush coated onto a steel panel which had been degreased by wiping with acetone. After the coating was allowed to moisture-cure at room temperature for 12 hours, the coated steel panel was heated in an air atmosphere to 500°C for 3 hours. No thermal or oxidative degradation of the coating was observed. The coating was then tested according to ASTM test methods for salt fog and condensing humidity. The coating had the following performance characteristics: Test Substrate Exposure Coatin ⁇ Protection Field Scribe (Hours)
- a two package, inorganic zinc primer was prepared by mixing the following ingredients in the proportions indicated:
- the fully formulated primer was then brush-coated onto a steel coupon and allowed to moisture-cure by setting on the lab bench overnight at room temperature and ambient humidity. The coating was dry to the touch in 1 hour and fully cured by the next day.
- the fully cured coating had the following performance characteristics as determined by ASTM test methods Test Substrate Exposure Coatin ⁇ Protection
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DE60219179T DE60219179T2 (en) | 2001-05-07 | 2002-04-25 | Heat-stable, moisture-curing polysilazanes and polysiloxanes |
KR1020037014296A KR100879991B1 (en) | 2001-05-07 | 2002-04-25 | Thermally Stable, Moisture Curable Polysilazanes And Polysiloxazanes |
JP2002587215A JP4236937B2 (en) | 2001-05-07 | 2002-04-25 | Thermally stable, moisture-curing polysilazanes and polysiloxazanes |
DK02731501T DK1420947T3 (en) | 2001-05-07 | 2002-04-25 | Heat-stable, moisture-cure polysilazanes and polysiloxazanes |
MXPA03010168A MXPA03010168A (en) | 2001-05-07 | 2002-04-25 | Thermally stable, moisture curable polysilazanes and polysiloxazanes. |
EP02731501A EP1420947B1 (en) | 2001-05-07 | 2002-04-25 | Thermally stable, moisture curable polysilazanes and polysiloxazanes |
CA 2445979 CA2445979C (en) | 2001-05-07 | 2002-04-25 | Thermally stable, moisture curable polysilazanes and polysiloxazanes |
CNB028094662A CN100349732C (en) | 2001-05-07 | 2002-04-25 | Thermally stable, moisture curable polysilazanes and polysiloxazanes |
HK05110549A HK1078534A1 (en) | 2001-05-07 | 2005-11-22 | Thermally stable, moisture curable polysilazanes and polysiloxazanes |
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Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4593085A (en) * | 1982-12-13 | 1986-06-03 | General Electric Company | Alkoxy-functional one component RTV silicone rubber compositions |
US4720531A (en) * | 1982-09-29 | 1988-01-19 | General Electric Company | Novel scavengers for one-component RTV compositions |
US4731411A (en) * | 1982-12-02 | 1988-03-15 | General Electric Company | Process for producing alkoxy-terminated polysiloxanes |
US4847400A (en) * | 1987-09-11 | 1989-07-11 | Dow Corning Corporation | Polyalkoxysilylalkylenedisilazanes and silylamines |
US5008422A (en) * | 1985-04-26 | 1991-04-16 | Sri International | Polysilazanes and related compositions, processes and uses |
JPH0899061A (en) * | 1994-09-30 | 1996-04-16 | Tonen Corp | Formation of silicon oxide-based ceramic film |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3755397A (en) * | 1971-06-01 | 1973-08-28 | Dow Corning | Silylating agent |
US4277284A (en) | 1978-04-28 | 1981-07-07 | Union Carbide Corporation | Single-package zinc-rich coatings |
US4525566A (en) | 1984-03-02 | 1985-06-25 | Dow Corning Corporation | Coating method and silicone composition for PSA release coating |
US4571268A (en) | 1985-04-30 | 1986-02-18 | The Sherwin Williams Company | Single package zinc-rich coatings |
JPS62273272A (en) | 1986-05-20 | 1987-11-27 | Nippon Oil & Fats Co Ltd | Rustproof coating composition |
US5208300A (en) | 1991-08-22 | 1993-05-04 | Dow Corning Corporation | Solution-stable, moisture-curable silicone pressure sensitive adhesives |
JP3500168B2 (en) * | 1992-07-02 | 2004-02-23 | ジーイー東芝シリコーン株式会社 | Room temperature curable polyorganosiloxane composition |
US5405655A (en) | 1992-11-19 | 1995-04-11 | Sri International | Temperature-resistant and/or nonwetting coatings of cured, silicon-containing polymers |
US5750643A (en) * | 1993-05-18 | 1998-05-12 | Sri International | Dehydrocoupling treatment and hydrosilylation of silicon-containing polymers, and compounds and articles produced thereby |
WO1995002462A1 (en) | 1993-07-14 | 1995-01-26 | Asahi Glass Company Ltd. | Method of treating surface of outdoor article |
US5413628A (en) | 1993-09-22 | 1995-05-09 | Savin; Ronald R. | Stable inorganic zinc-powder rich coating composition |
US5508360A (en) | 1995-03-31 | 1996-04-16 | Dow Corning Corporation | Moisture-curable hot melt silicone pressure-sensitive adhesives |
JP3631834B2 (en) * | 1995-12-29 | 2005-03-23 | クラリアント ジャパン 株式会社 | Thermosetting varnish |
US5840794A (en) | 1997-01-10 | 1998-11-24 | Dow Corning Corporation | Alkoxy functional sealants with rapid development of green strength |
US5777144A (en) * | 1997-09-30 | 1998-07-07 | General Electric Company | Bi-functional siloxane compounds |
US6562465B1 (en) * | 1998-04-24 | 2003-05-13 | Catalysts & Chemicals Industries Co., Ltd. | Coating liquid for forming a silica-containing film with a low-dielectric constant and substrate coated with such a film |
US6329487B1 (en) | 1999-11-12 | 2001-12-11 | Kion Corporation | Silazane and/or polysilazane compounds and methods of making |
-
2002
- 2002-02-14 US US10/075,729 patent/US6652978B2/en not_active Expired - Lifetime
- 2002-04-25 KR KR1020037014296A patent/KR100879991B1/en active IP Right Grant
- 2002-04-25 WO PCT/US2002/013099 patent/WO2002090108A2/en active IP Right Grant
- 2002-04-25 JP JP2002587215A patent/JP4236937B2/en not_active Expired - Fee Related
- 2002-04-25 EP EP02731501A patent/EP1420947B1/en not_active Expired - Lifetime
- 2002-04-25 CA CA 2445979 patent/CA2445979C/en not_active Expired - Fee Related
- 2002-04-25 DK DK02731501T patent/DK1420947T3/en active
- 2002-04-25 DE DE60219179T patent/DE60219179T2/en not_active Expired - Lifetime
- 2002-04-25 AT AT02731501T patent/ATE358017T1/en active
- 2002-04-25 CN CNB028094662A patent/CN100349732C/en not_active Expired - Lifetime
- 2002-04-25 PT PT02731501T patent/PT1420947E/en unknown
- 2002-04-25 ES ES02731501T patent/ES2284869T3/en not_active Expired - Lifetime
- 2002-04-25 MX MXPA03010168A patent/MXPA03010168A/en active IP Right Grant
-
2005
- 2005-11-22 HK HK05110549A patent/HK1078534A1/en not_active IP Right Cessation
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4720531A (en) * | 1982-09-29 | 1988-01-19 | General Electric Company | Novel scavengers for one-component RTV compositions |
US4731411A (en) * | 1982-12-02 | 1988-03-15 | General Electric Company | Process for producing alkoxy-terminated polysiloxanes |
US4593085A (en) * | 1982-12-13 | 1986-06-03 | General Electric Company | Alkoxy-functional one component RTV silicone rubber compositions |
US5008422A (en) * | 1985-04-26 | 1991-04-16 | Sri International | Polysilazanes and related compositions, processes and uses |
US4847400A (en) * | 1987-09-11 | 1989-07-11 | Dow Corning Corporation | Polyalkoxysilylalkylenedisilazanes and silylamines |
JPH0899061A (en) * | 1994-09-30 | 1996-04-16 | Tonen Corp | Formation of silicon oxide-based ceramic film |
Non-Patent Citations (1)
Title |
---|
See also references of EP1420947A2 * |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101353426B (en) * | 2008-09-09 | 2011-04-27 | 西北工业大学 | Liquid ethylene based polysilazane resin and preparation thereof |
WO2012041933A1 (en) * | 2010-09-29 | 2012-04-05 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Reactive resins and thus produced moulding body and flat or textile materials comprising particulate polysilazanes as novel fire retardants |
WO2013070156A1 (en) * | 2011-11-07 | 2013-05-16 | Hwq Relining Systems Aktiebolag | Coating a pipe or a system of pipes with a polymer material |
WO2020056542A1 (en) * | 2018-09-17 | 2020-03-26 | Henkel Ag & Co. Kgaa | Two-part coating composition |
EP3674351A1 (en) * | 2018-12-25 | 2020-07-01 | Shin-Etsu Chemical Co., Ltd. | Transparent coating film forming composition |
US11434390B2 (en) | 2018-12-25 | 2022-09-06 | Shin-Etsu Chemical Co., Ltd. | Transparent coating film forming composition |
Also Published As
Publication number | Publication date |
---|---|
CN100349732C (en) | 2007-11-21 |
MXPA03010168A (en) | 2004-03-10 |
EP1420947A2 (en) | 2004-05-26 |
KR20040012782A (en) | 2004-02-11 |
JP2004532318A (en) | 2004-10-21 |
HK1078534A1 (en) | 2006-03-17 |
US20030083453A1 (en) | 2003-05-01 |
CN1630578A (en) | 2005-06-22 |
DE60219179D1 (en) | 2007-05-10 |
JP4236937B2 (en) | 2009-03-11 |
WO2002090108A3 (en) | 2004-03-25 |
CA2445979C (en) | 2008-09-23 |
ES2284869T3 (en) | 2007-11-16 |
EP1420947B1 (en) | 2007-03-28 |
US6652978B2 (en) | 2003-11-25 |
PT1420947E (en) | 2007-06-29 |
DK1420947T3 (en) | 2007-06-18 |
DE60219179T2 (en) | 2008-01-03 |
ATE358017T1 (en) | 2007-04-15 |
CA2445979A1 (en) | 2002-11-14 |
EP1420947A4 (en) | 2004-10-20 |
KR100879991B1 (en) | 2009-01-23 |
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