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TW201900409A - Resin composition for forming insulating glue layer and composite metal substrate structure including a first metal layer, a liquid crystal polymer layer, an insulating glue layer and a second metal layer - Google Patents

Resin composition for forming insulating glue layer and composite metal substrate structure including a first metal layer, a liquid crystal polymer layer, an insulating glue layer and a second metal layer Download PDF

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TW201900409A
TW201900409A TW106135891A TW106135891A TW201900409A TW 201900409 A TW201900409 A TW 201900409A TW 106135891 A TW106135891 A TW 106135891A TW 106135891 A TW106135891 A TW 106135891A TW 201900409 A TW201900409 A TW 201900409A
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layer
resin
substrate structure
metal substrate
insulating
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TW106135891A
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TWI644789B (en
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林志銘
李韋志
李建輝
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亞洲電材股份有限公司
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Priority claimed from CN201720513115.XU external-priority patent/CN206840863U/en
Priority claimed from CN201710324895.8A external-priority patent/CN108859316B/en
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Abstract

A composite metal substrate structure includes a first metal layer, a liquid crystal polymer layer formed on the first metal layer, an insulating glue layer formed on the liquid crystal polymer layer, and a second metal layer formed on the insulating glue layer such that the liquid crystal polymer layer and the insulating glue layer are sandwiched between the first metal layer and the second metal layer, wherein the composite metal substrate structure has a thickness of 11 to 220 micrometers ([mu]m). This invention further provides a resin composition for forming an insulating glue layer.

Description

用於形成絕緣膠層之樹脂組成物及複合式金屬基板結構  Resin composition for forming an insulating layer and composite metal substrate structure  

本發明係有關一種複合式金屬基板結構,尤係關於一種高頻且耐候性佳的複合式金屬基板結構。 The invention relates to a composite metal substrate structure, in particular to a composite metal substrate structure with high frequency and good weather resistance.

印刷電路板是電子產品中不可或缺的材料,而隨著消費性電子產品需求增長,對於印刷電路板的需求也是與日俱增。由於軟性印刷電路板(FPC,Flexible Printed Circuit)具有可撓曲性及可三度空間配線等特性,在科技化電子產品強調輕薄短小、可撓曲性、高頻率的發展驅勢下,目前被廣泛應用於電腦及其週邊設備、通訊產品以及消費性電子產品等。 Printed circuit boards are an indispensable material in electronic products, and as the demand for consumer electronics grows, so does the demand for printed circuit boards. Due to the flexible and flexible three-dimensional wiring of flexible printed circuit boards (FPC), the development of technology-based electronic products emphasizes the advantages of lightness, shortness, flexibility, and high frequency. Widely used in computers and peripherals, communication products and consumer electronics.

在高頻領域,無線基礎設施需要提供足夠低的差損,才能有效提高能源利用率。隨著5G通訊、毫米波、航太軍工的加速發展,隨著大資料、物聯網等新興行業興起以及移動互連終端的普及且快速地處理、傳送資訊,成為通訊行業重點。 In the high-frequency field, the wireless infrastructure needs to provide a sufficiently low differential to effectively improve energy efficiency. With the accelerated development of 5G communication, millimeter wave, and aerospace military, with the rise of emerging industries such as big data and Internet of Things and the popularity of mobile interconnection terminals and the rapid processing and transmission of information, it has become the focus of the communication industry.

在通訊領域,未來5G網路比4G擁有更高速的頻寬、 更密集的微基站建設,網速更快。應物聯網與雲端運算以及新時代各項寬頻通訊之需求,發展高速伺服器與更高傳送速率的手機已成市場之趨勢。 In the field of communication, the future 5G network has higher speed bandwidth and denser base station construction than 4G, and the network speed is faster. In response to the demand for Internet of Things and cloud computing and broadband communication in the new era, the development of high-speed servers and higher transmission rate mobile phones has become a market trend.

然而,FPC是整個傳輸過程中主要的瓶頸,若是欠缺良好的設計與電性佳的相關材料,將嚴重延遲傳送速率或造成訊號損失。當前業界主要所使用的高頻基板主要為液晶高分子聚合物(LCP)板、聚四氟乙烯(PTFE)纖維板,然而也受到製程技術的限制,對製造設備的要求高且需要在較高溫環境(>280℃)下才可以操作,隨之也造成了其膜厚不均勻,而膜厚不均會造成電路板的阻抗控制不易,而其它樹脂類膜雖然沒有上述問題,但面臨電性不佳、接著力太弱或者機械強度不好等問題。 However, FPC is the main bottleneck in the entire transmission process. If there is a lack of good design and electrical related materials, the transmission rate will be seriously delayed or the signal loss will be caused. The high-frequency substrates currently used in the industry are mainly liquid crystal polymer (LCP) plates and polytetrafluoroethylene (PTFE) fiber boards. However, they are also limited by the process technology, and have high requirements for manufacturing equipment and need to be in a higher temperature environment. (>280 °C) can be operated, which also causes uneven film thickness, and uneven film thickness will make the impedance control of the circuit board difficult, while other resin films do not have the above problems, but they are not electrically Good, the force is too weak or the mechanical strength is not good.

為滿足信號傳送高頻、高速、散熱、導熱以及生產成本低等的需求,各種形式的混壓結構多層板(例如複合式基板)的設計與應用應運而生。 In order to meet the requirements of high frequency transmission, high speed, heat dissipation, heat conduction and low production cost, the design and application of various forms of mixed-pressure structure multilayer boards (such as composite substrates) have emerged.

舉凡於第201590948 U號中國專利、第M377823號台灣專利、第2010-7418A號日本專利和第2011/0114371號美國專利中皆提出具有優良作業性、低成本、低能耗的特點的複合式基板,而第202276545 U號中國專利、第103096612 B號中國專利、第M422159號台灣專利和第M531056號台灣專利中,則以氟系材料製作高頻基板。 A composite substrate having excellent workability, low cost, and low energy consumption is proposed in the Japanese Patent No. 201590948 U, the Taiwan Patent No. M377823, the Japanese Patent No. 2010-7418A, and the Japanese Patent No. 2011/0114371. In the Chinese Patent No. 202276545 U, the Chinese Patent No. 103096612 B, the Taiwan Patent No. M422159, and the Taiwan Patent No. M531056, a high frequency substrate is produced from a fluorine-based material.

此外,由於一般聚醯亞胺(PI)型及熱固性聚醯亞胺(TPI)型的銅箔基板具有高吸濕性(約1至2%),在製備複合式基板的過程中,會有爆板問題,嚴重影響了良率。不僅如此, 以LCP或TPI製備高頻基板,需高溫壓合(壓合溫度在280至330℃之間),尤其是欲生產厚度為38微米(μm)以上,傳輸性能較佳之複合式基板時,更存在有生產效率低,生產成本高等缺失。 In addition, since the general polyimine (PI) type and the thermosetting polyimine (TPI) type copper foil substrate have high hygroscopicity (about 1 to 2%), in the process of preparing the composite substrate, there will be The problem of bursting has seriously affected the yield. In addition, the preparation of high-frequency substrates with LCP or TPI requires high-temperature pressing (compression temperature between 280 and 330 ° C), especially when producing composite substrates with a thickness of 38 μm or more and better transmission performance. There are also some shortcomings such as low production efficiency and high production cost.

因此,仍須開發一種訊號傳輸損耗低、具有較低反彈力,且吸濕性低的複合式金屬基板結構。 Therefore, it is still necessary to develop a composite metal substrate structure having low signal transmission loss, low repulsive force, and low hygroscopicity.

本發明提供一種複合式金屬基板結構,係包括:第一金屬層;形成於該第一金屬層上之液晶聚合物層;形成於該液晶聚合物層上之絕緣膠層;以及形成於該絕緣膠層上之第二金屬層,使該液晶聚合物層與絕緣膠層夾置於第一和第二金屬層之間,且該複合式金屬基板結構之厚度為11至220μm。 The present invention provides a composite metal substrate structure, comprising: a first metal layer; a liquid crystal polymer layer formed on the first metal layer; an insulating layer formed on the liquid crystal polymer layer; and the insulating layer formed on the insulating layer The second metal layer on the adhesive layer sandwiches the liquid crystal polymer layer and the insulating adhesive layer between the first and second metal layers, and the composite metal substrate has a thickness of 11 to 220 μm.

本發明復提供一種用於形成絕緣膠層之樹脂組成物,係包括:絕緣樹脂,以該樹脂組成物之總重計,該絕緣樹脂之含量為40至90%;第一氟系樹脂,以該樹脂組成物之總重計,該第一氟系樹脂之含量為2至10%;第二氟系樹脂,以該樹脂組成物之總重計,該第二氟系樹脂之含量為2至10%;難燃劑,以該樹脂組成物之總重計,該難燃劑之含量為2至15%;以及無機粉體,以該樹脂組成物之總重計,該第二氟系樹脂之含量為2至15%。 The present invention provides a resin composition for forming an insulating rubber layer, comprising: an insulating resin having a content of 40 to 90% based on the total weight of the resin composition; and a first fluorine resin; The content of the first fluorine-based resin is 2 to 10% based on the total weight of the resin composition; and the content of the second fluorine-based resin is 2 to 2 based on the total weight of the resin composition. 10%; a flame retardant having a content of the flame retardant of 2 to 15% based on the total weight of the resin composition; and an inorganic powder based on the total weight of the resin composition, the second fluorine resin The content is 2 to 15%.

為使本發明之複合式金屬基板結構具有良好的機械強度與物化特性,本發明復提供一種複合式金屬基板結構之製法。該製法係包括於第一金屬層上形成液晶聚合物層; 於該液晶聚合物層上形成絕緣膠層;以及於該絕緣膠層上形成第二金屬層。 In order to make the composite metal substrate structure of the present invention have good mechanical strength and physicochemical properties, the present invention provides a method for fabricating a composite metal substrate structure. The method comprises the steps of: forming a liquid crystal polymer layer on the first metal layer; forming an insulating glue layer on the liquid crystal polymer layer; and forming a second metal layer on the insulating rubber layer.

本發明之樹脂組成物中係於絕緣樹脂中混合有二種氟系樹脂而提供一種具有較低介電損耗之絕緣材料,並透過於該絕緣樹脂加入無機粉體,得以降低絕緣材料的吸濕性。 The resin composition of the present invention is obtained by mixing two kinds of fluorine-based resins in an insulating resin to provide an insulating material having a lower dielectric loss, and by adding an inorganic powder to the insulating resin to reduce moisture absorption of the insulating material. Sex.

因此,於本發明之複合式金屬基板結構中,係同時具有絕緣膠層和液晶聚合物層,使該複合式金屬基板結構不僅能具有較低的訊號損失,較低的覆膜與未覆膜反彈力,還能維持較低的吸濕性,以及較高的接著強度。 Therefore, in the composite metal substrate structure of the present invention, the insulating adhesive layer and the liquid crystal polymer layer are simultaneously provided, so that the composite metal substrate structure can not only have low signal loss, but also a low film and an uncoated film. Resilience also maintains low hygroscopicity and high adhesion strength.

1、2‧‧‧複合式金屬基板結構 1, 2‧‧‧Composite metal substrate structure

10‧‧‧第一金屬層 10‧‧‧First metal layer

20‧‧‧液晶聚合物層 20‧‧‧Liquid polymer layer

20’‧‧‧另一液晶聚合物層 20'‧‧‧Another liquid crystal polymer layer

30‧‧‧絕緣膠層 30‧‧‧Insulating rubber layer

40‧‧‧第二金屬層 40‧‧‧Second metal layer

第1圖係為本發明之複合式金屬基板結構的剖面示意圖;以及第2圖係為本發明另一具體實施例之複合式金屬基板結構的剖面示意圖。 1 is a schematic cross-sectional view showing a composite metal substrate structure of the present invention; and FIG. 2 is a cross-sectional view showing a composite metal substrate structure according to another embodiment of the present invention.

以下藉由特定的具體實施例說明本發明之實施方式,熟悉此技藝之人士可由本說明書所揭示之內容輕易地瞭解本發明之其他優點及功效。 The other embodiments of the present invention will be readily understood by those skilled in the art from this disclosure.

須知,本說明書所附圖式所繪示之結構、比例、大小等,均僅用以配合說明書所揭示之內容,以供熟悉此技藝之人士之瞭解與閱讀,並非用以限定本發明可實施之限定條件,故不具技術上之實質意義,任何結構之修飾、比例關係之改變或大小之調整,在不影響本發明所能產生之功 效及所能達成之目的下,均應仍落在本發明所揭示之技術內容得能涵蓋之範圍內。同時,本說明書中所引用之如「一」及「上」亦僅為便於敘述之明瞭,而非用以限定本發明可實施之範圍,其相對關係之改變或調整,在無實質變更技術內容下,當亦視為本發明可實施之範疇。 It is to be understood that the structure, the proportions, the size, and the like of the present invention are intended to be used in conjunction with the disclosure of the specification, and are not intended to limit the invention. The conditions are limited, so it is not technically meaningful. Any modification of the structure, change of the proportional relationship or adjustment of the size should remain in this book without affecting the effects and the objectives that can be achieved by the present invention. The technical content disclosed in the invention can be covered. In the meantime, the terms "a" and "an" are used in the specification for the purpose of description and are not intended to limit the scope of the invention. The following is also considered to be an area in which the invention can be implemented.

本發明之複合式金屬基板結構係如第1圖所示,本發明之複合式金屬基板結構1係包括第一金屬層10;形成於該第一金屬層10上之液晶聚合物層20;形成於該液晶聚合物層20上之絕緣膠層30;以及形成於該絕緣膠層30上之第二金屬層40,使該液晶聚合物層20與絕緣膠層30夾置於第一金屬層10和第二金屬層40之間。 The composite metal substrate structure of the present invention is as shown in Fig. 1. The composite metal substrate structure 1 of the present invention comprises a first metal layer 10; a liquid crystal polymer layer 20 formed on the first metal layer 10; The insulating adhesive layer 30 on the liquid crystal polymer layer 20; and the second metal layer 40 formed on the insulating adhesive layer 30, the liquid crystal polymer layer 20 and the insulating adhesive layer 30 are sandwiched between the first metal layer 10 Between the second metal layer 40 and the second metal layer 40.

於本實施例中,該複合式金屬基板結構1之厚度為11至220μm。 In the embodiment, the composite metal substrate structure 1 has a thickness of 11 to 220 μm.

於一具體實施例中,該第一金屬層10和第二金屬層40係獨立選自厚度為1至35μm之延壓銅箔或電解銅箔,更佳地,該第一金屬層10和第二金屬層40之厚度係獨立地為6至18μm。於前述實施例中,該第一金屬層10和第二金屬層40之內側表面的表面粗糙度(Rz)為0.14至1.0μm,且該第一金屬層10和第二金屬層40之外側表面的表面粗糙度(Rz)係0.4至0.7μm。於前述實施例中,該第一金屬層10和第二金屬層40之內側表面的表面粗糙度(Rz)為0.4μm、0.5μm、0.6μm、0.7μm、0.8μm、0.9μm或1.0μm,該外側表面的表面粗糙度(Rz)係0.4μm、0.5μm、0.6μm或0.7μm。 In a specific embodiment, the first metal layer 10 and the second metal layer 40 are independently selected from the group consisting of a copper foil or an electrolytic copper foil having a thickness of 1 to 35 μm, and more preferably, the first metal layer 10 and the first The thickness of the two metal layers 40 is independently 6 to 18 μm. In the foregoing embodiment, the inner surface of the first metal layer 10 and the second metal layer 40 has a surface roughness (Rz) of 0.14 to 1.0 μm, and the outer surface of the first metal layer 10 and the second metal layer 40 The surface roughness (Rz) is 0.4 to 0.7 μm. In the foregoing embodiment, the inner surface of the first metal layer 10 and the second metal layer 40 has a surface roughness (Rz) of 0.4 μm, 0.5 μm, 0.6 μm, 0.7 μm, 0.8 μm, 0.9 μm or 1.0 μm. The surface roughness (Rz) of the outer surface is 0.4 μm, 0.5 μm, 0.6 μm or 0.7 μm.

於一具體實施例中,該液晶聚合物層20之厚度為5 至50μm。於前述實施例中,該液晶聚合物層20之吸水率為0.01至0.1%,更佳地,該液晶聚合物層20之吸水率為0.01至0.04%。 In one embodiment, the liquid crystal polymer layer 20 has a thickness of 5 to 50 μm. In the foregoing embodiment, the liquid crystal polymer layer 20 has a water absorption ratio of 0.01 to 0.1%, and more preferably, the liquid crystal polymer layer 20 has a water absorption ratio of 0.01 to 0.04%.

於一具體實施例中,該絕緣膠層30之厚度為2至50μm,更佳地,該絕緣膠層之厚度為12.5至50μm。 In one embodiment, the thickness of the insulating layer 30 is 2 to 50 μm, and more preferably, the thickness of the insulating layer is 12.5 to 50 μm.

於一具體實施例中,該絕緣膠層30之吸水率為0.01至0.1%,更佳地,該絕緣膠層30之吸水率為0.01至0.08。 In one embodiment, the water absorption of the insulating layer 30 is 0.01 to 0.1%, and more preferably, the water absorption of the insulating layer 30 is 0.01 to 0.08.

於一具體實施例中,本發明之複合式金屬基板結構1的整體吸水率為0.01至0.5%,更佳地,該複合式金屬基板結構的整體吸水率為0.01至0.1%。 In one embodiment, the overall water absorption of the composite metal substrate structure 1 of the present invention is 0.01 to 0.5%, and more preferably, the overall water absorption of the composite metal substrate structure is 0.01 to 0.1%.

於一具體實施例中,該絕緣膠層30之介電常數為2.0至3.0(10GHz),更佳地,該絕緣膠層30之介電常數為2.2至3.0。 In one embodiment, the insulating layer 30 has a dielectric constant of 2.0 to 3.0 (10 GHz). More preferably, the insulating layer 30 has a dielectric constant of 2.2 to 3.0.

於一具體實施例中,該絕緣膠層30之介電損耗因子為0.002至0.010(10GHz)。 In one embodiment, the dielectric layer 30 has a dielectric loss factor of 0.002 to 0.010 (10 GHz).

於一具體實施例中,該絕緣膠層30之接著強度係大於0.7kgf/cm2In one embodiment, the insulating layer 30 has an adhesion strength greater than 0.7 kgf/cm 2 .

於一具體實施例中,形成該絕緣膠層30之材料係選自環氧樹脂、丙烯酸系樹脂、胺基甲酸酯系樹脂、矽橡膠系樹脂、聚對環二甲苯系樹脂、雙馬來醯亞胺系樹脂及聚醯亞胺系樹脂所組成群組的至少一者。 In one embodiment, the material forming the insulating layer 30 is selected from the group consisting of epoxy resin, acrylic resin, urethane resin, silicone rubber, polyparaxylene resin, and double horse. At least one of the group consisting of a quinone imine resin and a polyimine resin.

於一具體實施例中,該絕緣膠層30中含有無機粉體、第一氟系樹脂、第二氟系樹脂和難燃劑。於前述實施例中,該無機粉體為二氧化矽,並以燒結二氧化矽為佳,第一氟 系樹脂可為聚四氟乙烯(PTFE),該難燃劑為磷系難燃劑。 In one embodiment, the insulating layer 30 contains an inorganic powder, a first fluorine-based resin, a second fluorine-based resin, and a flame retardant. In the foregoing embodiment, the inorganic powder is cerium oxide, preferably sintered cerium oxide, and the first fluororesin may be polytetrafluoroethylene (PTFE), and the flame retardant is a phosphorus-based flame retardant.

於一具體實施例中,形成該絕緣膠層30之材料係包括不同於聚四氟乙烯之氟系樹脂和難燃劑,以該絕緣膠層之總重計,該氟系樹脂和難燃劑之含量之和為4至50%。 In a specific embodiment, the material forming the insulating adhesive layer 30 comprises a fluorine-based resin different from polytetrafluoroethylene and a flame retardant, and the fluorine-based resin and the flame retardant are based on the total weight of the insulating rubber layer. The sum of the contents is 4 to 50%.

於一具體實施例中,形成該絕緣膠層之材料係包括二氧化矽和聚四氟乙烯,以該絕緣膠層之總重計,該二氧化矽和聚四氟乙烯之含量之和為4至25%。 In one embodiment, the material forming the insulating layer comprises ceria and polytetrafluoroethylene, and the sum of the content of the ceria and the polytetrafluoroethylene is 4 based on the total weight of the insulating layer. Up to 25%.

如第2圖所示,於本發明之複合式金屬基板結構2的另一具體實施例中,復包括另一液晶聚合物層20’,係形成於該絕緣膠層30和第二金屬層40之間。 As shown in FIG. 2, in another embodiment of the composite metal substrate structure 2 of the present invention, another liquid crystal polymer layer 20' is formed on the insulating adhesive layer 30 and the second metal layer 40. between.

於本實施例中,該液晶聚合物層20和另一液晶聚合物層20’之厚度各自為1.25至50μm。 In the present embodiment, the thickness of the liquid crystal polymer layer 20 and the other liquid crystal polymer layer 20' are each 1.25 to 50 μm.

本發明復提供一種用於形成絕緣膠層之樹脂組成物,係包括:絕緣樹脂,以該樹脂組成物之總重計,該絕緣樹脂之含量為40至90%;第一氟系樹脂,以該樹脂組成物之總重計,該第一氟系樹脂之含量為2至10%;不同於該第一氟系樹脂之第二氟系樹脂,以該樹脂組成物之總重計,該第二氟系樹脂之含量為2至10%;難燃劑,以該樹脂組成物之總重計,該難燃劑之含量為2至15%;以及無機粉體,以該樹脂組成物之總重計,該第二氟系樹脂之含量為2至15%。 The present invention provides a resin composition for forming an insulating rubber layer, comprising: an insulating resin having a content of 40 to 90% based on the total weight of the resin composition; and a first fluorine resin; The content of the first fluorine-based resin is 2 to 10% based on the total weight of the resin composition; and the second fluorine-based resin different from the first fluorine-based resin, based on the total weight of the resin composition, the first The content of the difluoro resin is 2 to 10%; the flame retardant is 2 to 15% based on the total weight of the resin composition; and the inorganic powder is the total of the resin composition The content of the second fluorine-based resin is from 2 to 15% by weight.

於一具體實施例中,該絕緣樹脂係選自環氧樹脂、丙烯酸系樹脂、胺基甲酸酯系樹脂、矽橡膠系樹脂、聚對環二甲苯系樹脂、雙馬來醯亞胺系樹脂及聚醯亞胺系樹脂所 組成群組的至少一者。 In one embodiment, the insulating resin is selected from the group consisting of an epoxy resin, an acrylic resin, a urethane resin, a ruthenium rubber resin, a polyparaxylene resin, and a bismaleimide resin. And at least one of the group consisting of polyamidiene-based resins.

於一具體實施例中,該第一氟系樹脂係為聚四氟乙烯。 In one embodiment, the first fluorine-based resin is polytetrafluoroethylene.

於一具體實施例中,該難燃劑係為磷系難燃劑,具體而言,該磷系難燃劑係為磷酸酯、亞磷酸酯、磷酸酯、有機磷鹽,還有磷雜環化合物及聚合物磷(膦)酸酯等。 In a specific embodiment, the flame retardant is a phosphorus-based flame retardant, specifically, the phosphorus-based flame retardant is a phosphate, a phosphite, a phosphate, an organic phosphorus salt, and a phosphorus heterocycle. Compounds and polymers such as phosphorus (phosphonate).

於一具體實施例中,該無機粉體係為二氧化矽。為使本發明之複合式金屬基板結構具有良好的機械強度與物化特性,本發明復提供一種複合式金屬基板結構之製法。該製法係包括於第一金屬層上形成液晶聚合物層;於該液晶聚合物層上形成絕緣膠層;以及於該絕緣膠層上形成第二金屬層。 In one embodiment, the inorganic powder system is cerium oxide. In order to make the composite metal substrate structure of the present invention have good mechanical strength and physicochemical properties, the present invention provides a method for fabricating a composite metal substrate structure. The method comprises the steps of: forming a liquid crystal polymer layer on the first metal layer; forming an insulating glue layer on the liquid crystal polymer layer; and forming a second metal layer on the insulating glue layer.

於一具體實施例中,於第一金屬層上形成液晶聚合物層之步驟係包括,於該第一金屬層上塗佈液晶聚合物,於60至100℃溫度條件下烘烤去除溶劑後,再於300℃烘烤10小時使其黄化,得到該液晶聚合物層。 In a specific embodiment, the step of forming a liquid crystal polymer layer on the first metal layer comprises: coating a liquid crystal polymer on the first metal layer, and baking the solvent at a temperature of 60 to 100 ° C to remove the solvent. After baking at 300 ° C for 10 hours, it was yellowed to obtain the liquid crystal polymer layer.

於一具體實施例中,形成絕緣膠層之步驟係包括,於該液晶聚合物層上塗佈絕緣膠,於60至100℃溫度條件下烘烤得到該絕緣膠層。 In one embodiment, the step of forming an insulating layer comprises applying an insulating paste on the liquid crystal polymer layer and baking at 60 to 100 ° C to obtain the insulating layer.

於一具體實施例中,於該絕緣膠層上形成第二金屬層之步驟係包括,將該第二金屬層壓合至該絕緣膠層上。於前述具體實施例中,該壓合之溫度條件為50至130℃。 In one embodiment, the step of forming a second metal layer on the insulating layer comprises laminating the second metal to the insulating layer. In the foregoing specific examples, the temperature of the press is from 50 to 130 °C.

實施例1和4本發明複合式金屬基板結構之製法  Embodiment 1 and 4 method for manufacturing composite metal substrate structure of the present invention  

於厚度如表1所載之銅箔層上塗佈LCP清漆(Sumitomo Chemical公司出產VR400型號),並於60至100℃溫度條件下烘烤去除溶劑,於300℃烘烤10小時使其黄化得到該液晶聚合物層,於該液晶聚合物層上塗佈絕緣膠,該絕緣膠之組成係如表2所載,其中,該氟系樹脂係使用杜邦公司之300AS BK氟樹脂,該磷系難燃劑係使用科萊恩公司之OP935難燃劑,並於60至100℃溫度條件下烘烤去除溶劑,得到絕緣膠層,於該絕緣膠層上壓合厚度如表1所述之第二銅箔層。 The LCP varnish (Model VR400 produced by Sumitomo Chemical Co., Ltd.) was coated on the copper foil layer as shown in Table 1. The solvent was baked at 60 to 100 ° C and baked at 300 ° C for 10 hours to make it yellow. The liquid crystal polymer layer is obtained, and an insulating paste is applied on the liquid crystal polymer layer, and the composition of the insulating rubber is as shown in Table 2, wherein the fluorine resin is a 300 AS BK fluororesin of DuPont, and the phosphorus system is used. The flame retardant is made of Clariant's OP935 flame retardant and baked at 60 to 100 ° C to remove the solvent to obtain an insulating layer. The thickness of the insulating layer is as shown in Table 1. Copper foil layer.

實施例2、3和5本發明複合式金屬基板結構之製法  Embodiments 2, 3 and 5 of the method for manufacturing a composite metal substrate of the present invention  

採用與實施例1和4相同的製法,差別僅在於,於實施例1和4中,在形成絕緣膠層後,再於該絕緣膠層上塗佈LCP清漆(Sumitomo Chemical公司出產VR400型號),並於60至100℃溫度條件下烘烤去除溶劑,於300℃烘烤10小時使其黄化得到另一液晶聚合物層,而該第二銅箔層係壓合於該另一液晶聚合物層上。 The same processes as in Examples 1 and 4 were employed except that in Examples 1 and 4, after the formation of the insulating layer, LCP varnish (Sumitomo Chemical Co., Ltd. model VR400) was applied to the insulating layer. And baking at 60 to 100 ° C temperature to remove the solvent, baking at 300 ° C for 10 hours to yellowing to obtain another liquid crystal polymer layer, and the second copper foil layer is pressed against the other liquid crystal polymer On the floor.

實施例1至5之複合式金屬基板結構的各層厚度係如表1所示。 The thickness of each layer of the composite metal substrate structure of Examples 1 to 5 is shown in Table 1.

比較例1至2習知聚醯亞胺基板  Comparative Examples 1 to 2 Conventional Polyimine Substrates  

將第一電解銅箔和第二電解銅箔壓合於聚醯亞胺核心層(KANEKE公司;型號FRS-142#SW)上,得到總厚度為50微米之比較例1之複合膜。 The first electrodeposited copper foil and the second electrodeposited copper foil were press-bonded to a polyimide core layer (KANEKE Corporation; model FRS-142#SW) to obtain a composite film of Comparative Example 1 having a total thickness of 50 μm.

測試例  Test case  

對依據前述實施例與比較例所製得之複合膜複合式金屬基板結構,進行吸水率測試、電氣特性(介電常數與介電損耗因子)測試、接著強度、覆膜與未覆膜之反彈力測試和耐焊錫性測試,並將測試結果記錄於表3和表4。 The composite film composite metal substrate structure prepared according to the foregoing examples and comparative examples was subjected to water absorption test, electrical characteristics (dielectric constant and dielectric loss factor) test, and subsequent strength, rebound of the film and uncoated film. Force test and solder resistance test, and the test results are recorded in Tables 3 and 4.

吸水率測試:  Water absorption test:  

分別於常溫泡水前和常溫泡水24後,根據軟板組裝要項測試準則IPC-TM650 2.6.2之吸水率試驗方法,量測其吸水率,並將結果紀錄於表3。 Before the normal temperature soaking water and the normal temperature soaking water 24, the water absorption rate was measured according to the water absorption test method of the soft board assembly test standard IPC-TM650 2.6.2, and the results are recorded in Table 3.

接著強度測試:  Then the strength test:  

根據軟板組裝要項測試準則IPC-TM650 2.4.9之接著強度試驗方法,量測其接著強度,並將結果紀錄於表3。 According to the adhesive strength test method of the soft board assembly test standard IPC-TM650 2.4.9, the subsequent strength was measured, and the results are recorded in Table 3.

反彈力測試:  Rebound test:  

以反彈力測試儀(APLUS公司),根據如下測試方法,量測其覆膜與未覆膜之反彈力,並將結果紀錄於表3。測 試方法為:將覆膜與未覆膜之實施例1至4和比較例1至2之基板裁成10mm×30mm大小的試片,將試片安裝於反彈力測試儀,並進行量。 The rebound force of the film and the uncoated film was measured by a rebound tester (APLUS) according to the following test method, and the results are reported in Table 3. The test method was such that the substrates of Examples 1 to 4 and Comparative Examples 1 to 2 of the uncoated and uncoated films were cut into test pieces of a size of 10 mm × 30 mm, and the test pieces were attached to a rebound force tester, and the amount was measured.

介電常數和介電損耗因子量測:  Dielectric constant and dielectric loss factor measurement:  

係依據ASTM 2520波導諧振腔(Waveguide Resonators)測試方式進行量測,並將結果記錄於表4。再利用以下公式計算高速傳輸性訊號損失:高速傳輸性訊號損失=導體損耗(Conductor loss)+介電損耗(Dielectric loss) The measurements were made in accordance with the ASTM 2520 Waveguide Resonators test method and the results are reported in Table 4. Then use the following formula to calculate the high-speed transmission signal loss: high-speed transmission signal loss = conductor loss (Conductor loss) + dielectric loss (Dielectric loss)

其中,Dk:介電常數(Dielectric constant);Df:介電損耗因子(Dissipation factor);f:頻率(Frequency);以及c:光速(Light velocity)。 Wherein Dk: Dielectric constant; Df: Dissipation factor; f: Frequency; and c: Light velocity.

耐焊錫性測試(熱應力試驗方法):  Solder resistance test (thermal stress test method):  

採用IPC-TM-65022的熱應力試驗方法,評估基板材料在高溫錫爐下瞭解材料的耐熱能力。測試方法為:先將實施例1至4和比較例1至2之基板放至烤箱(121至149℃)預烘0.5至1.0小時。將各該基板取出靜置於乾燥皿至常溫,再放入錫爐(300℃)浸錫10秒。用目視觀察各該基板之外觀在浸沒錫爐後是否發生變化。用如下方法進行評估: Using the thermal stress test method of IPC-TM-65022, the substrate material was evaluated under the high temperature tin furnace to understand the heat resistance of the material. The test method was as follows: The substrates of Examples 1 to 4 and Comparative Examples 1 to 2 were first pre-baked in an oven (121 to 149 ° C) for 0.5 to 1.0 hours. Each of the substrates was taken out and placed in a drying dish to room temperature, and then placed in a tin furnace (300 ° C) for 10 seconds. The appearance of each of the substrates was visually observed to change after immersion in the tin furnace. Evaluate as follows:

○:外觀完全沒出現變化 ○: The appearance did not change at all.

×:外觀出現爆板或剝離係紀錄於下表4。 ×: The appearance of the explosion or peeling is recorded in Table 4 below.

參閱表3和表4的結果可見,相較於比較例1至4,本發明實施例1至5的複合式金屬基板結構具有較低的高傳輸性訊號損失,且還具有較低的覆膜與未覆膜之反彈力。此外,本發明實施例1至5的複合式金屬基板結構不僅電氣特性優於比較例1至2(習知PI基板),還具有較低的吸水率,以及優於比較例3和4(習知LCP基板)的耐焊錫性,本發明實施例1至5的複合式金屬基板結構能通過更高溫的熱應力試驗(比較例3和4並未通過耐焊錫性之測試)。 Referring to the results of Tables 3 and 4, it can be seen that the composite metal substrate structures of Embodiments 1 to 5 of the present invention have lower high transmission loss signal loss and lower coating film than Comparative Examples 1 to 4. With the rebound of the uncoated film. Further, the composite metal substrate structures of Embodiments 1 to 5 of the present invention are not only superior in electrical characteristics to Comparative Examples 1 to 2 (a conventional PI substrate), but also have a lower water absorption rate, and are superior to Comparative Examples 3 and 4 (Study Knowing the solder resistance of the LCP substrate, the composite metal substrate structures of Embodiments 1 to 5 of the present invention can pass the higher temperature thermal stress test (Comparative Examples 3 and 4 did not pass the solder resistance test).

據此可知,本發明之複合式金屬基板結構在吸水率和高速傳輸性能上明顯優於一般PI基板,與習知LCP基板相當甚至是優於習知LCP基板,同時又能解決LCP或TPI基板價格昂貴、反彈力大和作業性差等缺點。 It can be seen that the composite metal substrate structure of the present invention is superior to the general PI substrate in water absorption rate and high-speed transmission performance, and is superior to the conventional LCP substrate even better than the conventional LCP substrate, and can solve the LCP or TPI substrate at the same time. The disadvantages of high price, strong rebound and poor workability.

本發明之複合式金屬基板結構具有極佳的高速傳輸性、耐焊錫性佳、在高溫濕度環境下穩定的電氣特性(介電常數與介電損耗因子)、低吸水率與低反彈力等極佳的機械性能,適用於高密度組裝與UV鐳射鑽孔製程。 The composite metal substrate structure of the invention has excellent high-speed transmission property, good solder resistance, stable electrical characteristics (dielectric constant and dielectric loss factor) in a high temperature and humidity environment, low water absorption rate and low rebound force, etc. Excellent mechanical properties for high density assembly and UV laser drilling processes.

上述該等實施樣態僅例示性說明本發明之功效,而非用於限制本發明,任何熟習此項技藝之人士均可在不違背本發明之精神及範疇下,對上述該等實施態樣進行修飾與改變。此外,在上述該等實施態樣中之元件的數量僅為例示性說明,亦非用於限制本發明。因此本發明之權利保護範圍,應如後述之申請專利範圍所列。 The above-described embodiments are merely illustrative of the effects of the present invention, and are not intended to limit the present invention, and those skilled in the art can implement the above-described embodiments without departing from the spirit and scope of the present invention. Make modifications and changes. In addition, the number of elements in the above-described embodiments is merely illustrative and is not intended to limit the invention. Therefore, the scope of protection of the present invention should be as set forth in the appended claims.

Claims (19)

一種複合式金屬基板結構,係包括:第一金屬層;液晶聚合物層,係形成於該第一金屬層上;絕緣膠層,係形成於該液晶聚合物層上;以及第二金屬層,係形成於該絕緣膠層上,使該液晶聚合物層與絕緣膠層夾置於第一和第二金屬層之間,且該複合式金屬基板結構之厚度為11至220μm。  A composite metal substrate structure includes: a first metal layer; a liquid crystal polymer layer formed on the first metal layer; an insulating glue layer formed on the liquid crystal polymer layer; and a second metal layer, Formed on the insulating adhesive layer, the liquid crystal polymer layer and the insulating adhesive layer are sandwiched between the first and second metal layers, and the composite metal substrate structure has a thickness of 11 to 220 μm.   如申請專利範圍第1項所述之複合式金屬基板結構,其中,形成該第一金屬層和第二金屬層之材質係獨立選自壓延銅箔或電解銅箔。  The composite metal substrate structure according to claim 1, wherein the material forming the first metal layer and the second metal layer is independently selected from a rolled copper foil or an electrolytic copper foil.   如申請專利範圍第1項所述之複合式金屬基板結構,其中,該複合式金屬基板結構中之該第一金屬層和第二金屬層之內側表面的表面粗糙度(Rz)係0.4至1.0μm,且該第一金屬層和第二金屬層之外側表面的表面粗糙度(Rz)係0.4至0.7μm。  The composite metal substrate structure according to claim 1, wherein the surface roughness (Rz) of the inner surface of the first metal layer and the second metal layer in the composite metal substrate structure is 0.4 to 1.0. Μm, and the surface roughness (Rz) of the outer side surfaces of the first metal layer and the second metal layer is 0.4 to 0.7 μm.   如申請專利範圍第1項所述之複合式金屬基板結構,其中,該液晶聚合物層之厚度為5至50μm。  The composite metal substrate structure according to claim 1, wherein the liquid crystal polymer layer has a thickness of 5 to 50 μm.   如申請專利範圍第1項所述之複合式金屬基板結構,其中,該絕緣膠層之厚度為2至50μm。  The composite metal substrate structure according to claim 1, wherein the insulating rubber layer has a thickness of 2 to 50 μm.   如申請專利範圍第1項所述之複合式金屬基板結構,復包括另一液晶聚合物層,係形成於該絕緣膠層和第二金屬層之間,且該絕緣膠層係夾置於該液晶聚合物層與該另一液晶聚合物層之間。  The composite metal substrate structure according to claim 1, further comprising another liquid crystal polymer layer formed between the insulating rubber layer and the second metal layer, and the insulating rubber layer is sandwiched between Between the liquid crystal polymer layer and the other liquid crystal polymer layer.   如申請專利範圍第4項所述之複合式金屬基板結構,該液晶聚合物層和另一液晶聚合物層之厚度各自為1.25至50μm。  The composite metal substrate structure of claim 4, wherein the liquid crystal polymer layer and the other liquid crystal polymer layer each have a thickness of 1.25 to 50 μm.   如申請專利範圍第1項所述之複合式金屬基板結構,其中,該絕緣膠層之吸水率為0.01至0.1%,接著強度係大於0.7kgf/cm 2,該液晶聚合物層之吸水率為0.01至0.1%,且該複合式金屬基板結構的整體吸水率為0.01至0.5%。 The composite metal substrate structure according to claim 1, wherein the insulating layer has a water absorption of 0.01 to 0.1%, and then the strength is greater than 0.7 kgf/cm 2 , and the water absorption of the liquid crystal polymer layer is 0.01 to 0.1%, and the overall water absorption of the composite metal substrate structure is 0.01 to 0.5%. 如申請專利範圍第1項所述之複合式金屬基板結構,其中,該絕緣膠層之介電常數為2.0至3.0(10GHz)。  The composite metal substrate structure according to claim 1, wherein the insulating layer has a dielectric constant of 2.0 to 3.0 (10 GHz).   如申請專利範圍第1項所述之複合式金屬基板結構,其中,該絕緣膠層之介電損耗因子為0.002至0.010(10GHz)。  The composite metal substrate structure according to claim 1, wherein the insulating layer has a dielectric loss factor of 0.002 to 0.010 (10 GHz).   如申請專利範圍第1項所述之複合式金屬基板結構,其中,形成該絕緣膠層之材料係選自環氧樹脂、丙烯酸系樹脂、胺基甲酸酯系樹脂、矽橡膠系樹脂、聚對環二甲苯系樹脂、雙馬來醯亞胺系樹脂及聚醯亞胺系樹脂所組成群組的至少一者。  The composite metal substrate structure according to claim 1, wherein the material for forming the insulating layer is selected from the group consisting of an epoxy resin, an acrylic resin, a urethane resin, a ruthenium rubber resin, and a poly At least one of a group consisting of a cycloxylene resin, a bismaleimide resin, and a polyamidene resin.   如申請專利範圍第1項所述之複合式金屬基板結構,其中,形成該絕緣膠層之材料係包括氟系樹脂和難燃劑,以該絕緣膠層之總重計,該氟系樹脂和難燃劑之含量之和為4至50%。  The composite metal substrate structure according to claim 1, wherein the material forming the insulating rubber layer comprises a fluorine resin and a flame retardant, and the fluorine resin and the total weight of the insulating rubber layer The sum of the contents of the flame retardant is 4 to 50%.   如申請專利範圍第12項所述之複合式金屬基板結構,其中,該難燃劑係磷系難燃劑。  The composite metal substrate structure according to claim 12, wherein the flame retardant is a phosphorus-based flame retardant.   如申請專利範圍第1項所述之複合式金屬基板結構,其中,形成該絕緣膠層之材料係包括二氧化矽和聚四氟乙烯,以該絕緣膠層之總重計,該二氧化矽和聚四氟乙烯之含量之和為4至25%。  The composite metal substrate structure of claim 1, wherein the material forming the insulating layer comprises ceria and polytetrafluoroethylene, and the ceria is based on the total weight of the insulating layer. The sum of the content of polytetrafluoroethylene and the content of polytetrafluoroethylene is 4 to 25%.   一種用於形成絕緣膠層之樹脂組成物,係包括:絕緣樹脂,以該樹脂組成物之總重計,該絕緣樹脂之含量為40至90%;第一氟系樹脂,以該樹脂組成物之總重計,該第一氟系樹脂之含量為2至10%;第二氟系樹脂,以該樹脂組成物之總重計,該第二氟系樹脂之含量為2至10%;難燃劑,以該樹脂組成物之總重計,該難燃劑之含量為2至15%;以及無機粉體,以該樹脂組成物之總重計,該無機粉體之含量為2至15%。  A resin composition for forming an insulating rubber layer, comprising: an insulating resin, the insulating resin is contained in an amount of 40 to 90% by weight based on the total weight of the resin composition; and the first fluorine-based resin is a resin composition The total amount of the first fluorine-based resin is 2 to 10%; and the second fluorine-based resin is 2 to 10% by weight based on the total weight of the resin composition; a fuel additive having a content of the flame retardant of 2 to 15% based on the total weight of the resin composition; and an inorganic powder having a content of 2 to 15 based on the total weight of the resin composition %.   如申請專利範圍第15項所述之樹脂組成物,其中,該絕緣樹脂係選自環氧樹脂、丙烯酸系樹脂、胺基甲酸酯系樹脂、矽橡膠系樹脂、聚對環二甲苯系樹脂、雙馬來醯亞胺系樹脂及聚醯亞胺系樹脂所組成群組的至少一者。  The resin composition according to claim 15, wherein the insulating resin is selected from the group consisting of an epoxy resin, an acrylic resin, an urethane resin, a ruthenium rubber resin, and a polyparaxylene resin. At least one of a group consisting of a bismaleimide resin and a polyamidene resin.   如申請專利範圍第15項所述之樹脂組成物,其中,該第一氟系樹脂係為聚四氟乙烯。  The resin composition according to claim 15, wherein the first fluorine-based resin is polytetrafluoroethylene.   如申請專利範圍第15項所述之樹脂組成物,其中,該難燃劑係為磷系難燃劑。  The resin composition according to claim 15, wherein the flame retardant is a phosphorus-based flame retardant.   如申請專利範圍第15項所述之樹脂組成物,其中,形成該無機粉體係為二氧化矽。  The resin composition according to claim 15, wherein the inorganic powder system is formed into cerium oxide.  
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