[go: up one dir, main page]
More Web Proxy on the site http://driver.im/

TW200727077A - Photoresist composition - Google Patents

Photoresist composition

Info

Publication number
TW200727077A
TW200727077A TW095144080A TW95144080A TW200727077A TW 200727077 A TW200727077 A TW 200727077A TW 095144080 A TW095144080 A TW 095144080A TW 95144080 A TW95144080 A TW 95144080A TW 200727077 A TW200727077 A TW 200727077A
Authority
TW
Taiwan
Prior art keywords
resist
groups
organic solvent
cyclohexanol
acetate
Prior art date
Application number
TW095144080A
Other languages
Chinese (zh)
Inventor
Tetsunori Tanaka
Katsunori Makizawa
Original Assignee
Daicel Chem
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daicel Chem filed Critical Daicel Chem
Publication of TW200727077A publication Critical patent/TW200727077A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Optical Filters (AREA)

Abstract

The present invention provides a compound not only having improved properties such as an increased solubility at the period of preparing a resist, an high resist film closeness at the time of developing, etc. but also having high resist stability as well as being excellent in security. A resist composition comprises a resist component and an organic solvent, wherein the organic solvent of said resist composition is cyclohexanol acetate. In the resist compositions, it is also suitable to comprise two or more organic solvents. The preferred combination of organic solvents, for example, is combination of cyclohexanol acetate and cyclohexanol. The resist composition is also suitable to additionally comprise at least one organic solvent selected from the group consisting of carboxyl acid alkyl ester groups, aliphatic ketone groups, glycol ether groups and glycol ether etheyl acetate groups.
TW095144080A 2005-11-30 2006-11-29 Photoresist composition TW200727077A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005345760A JP2007148258A (en) 2005-11-30 2005-11-30 Resist composition

Publications (1)

Publication Number Publication Date
TW200727077A true TW200727077A (en) 2007-07-16

Family

ID=38125719

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095144080A TW200727077A (en) 2005-11-30 2006-11-29 Photoresist composition

Country Status (4)

Country Link
JP (1) JP2007148258A (en)
KR (1) KR101405696B1 (en)
CN (1) CN1975572B (en)
TW (1) TW200727077A (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4835210B2 (en) * 2006-03-10 2011-12-14 東洋インキＳｃホールディングス株式会社 Coloring composition for color filter, color filter, and method for producing color filter
JP4904869B2 (en) * 2006-03-22 2012-03-28 Ｊｓｒ株式会社 Radiation-sensitive composition for forming colored layer and color filter
WO2008016270A1 (en) * 2006-08-04 2008-02-07 Dongwoo Fine-Chem. Co., Ltd. Photoresist composition and patterning method thereof
JP5224030B2 (en) * 2007-03-22 2013-07-03 Ｊｓｒ株式会社 Thermosetting resin composition, protective film and method for forming protective film
JP5083520B2 (en) * 2007-07-17 2012-11-28 Ｊｓｒ株式会社 Radiation sensitive resin composition, liquid crystal display spacer and liquid crystal display element
JP5061792B2 (en) * 2007-08-21 2012-10-31 住友ベークライト株式会社 Positive photosensitive resin composition, cured film, protective film, insulating film, and semiconductor device and display device using the same.
KR101113019B1 (en) * 2008-01-24 2012-02-13 주식회사 엘지화학 Positive photoresist composition with black matrix
JP4593638B2 (en) * 2008-02-18 2010-12-08 ダイセル化学工業株式会社 Method for producing ester solvent
JP5422198B2 (en) * 2008-12-25 2014-02-19 東京応化工業株式会社 Resist composition and resist pattern forming method
JP2010275327A (en) * 2010-09-15 2010-12-09 Daicel Chem Ind Ltd Ester solvent

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0667420A (en) * 1992-08-19 1994-03-11 Nippon Zeon Co Ltd Positive type resist composition
JPH086244A (en) * 1994-06-17 1996-01-12 Shin Etsu Chem Co Ltd Radiation sensitive resist composition
JPH0992594A (en) * 1995-09-25 1997-04-04 Sony Corp Forming method of coating film
TW495494B (en) * 1998-10-05 2002-07-21 Tonengeneral Sekiyu Kk Photosensitive polysilazane composition and method of forming patterned polysilazane film
JP4623452B2 (en) * 2000-02-09 2011-02-02 旭化成イーマテリアルズ株式会社 Coating liquid for forming infrared sensitive layer
JP2004191404A (en) * 2002-12-06 2004-07-08 Hitachi Chemical Dupont Microsystems Ltd Photosensitive polyimide precursor composition for ultrathick film
JP4365235B2 (en) * 2004-02-20 2009-11-18 富士フイルム株式会社 Resist composition for immersion exposure and pattern forming method using the same
JP4317772B2 (en) * 2004-02-20 2009-08-19 富士フイルム株式会社 Resist composition for immersion exposure and pattern forming method using the same

Also Published As

Publication number Publication date
JP2007148258A (en) 2007-06-14
KR101405696B1 (en) 2014-06-10
KR20070057004A (en) 2007-06-04
CN1975572A (en) 2007-06-06
CN1975572B (en) 2011-07-20

Similar Documents

Publication Publication Date Title
TW200727077A (en) Photoresist composition
TW200834234A (en) Radiation-sensitive resin compositions
TW200600529A (en) Polymer compound, photoresist composition including polymer compound, and method for forming resist pattern
MY142016A (en) Antireflective compositions for photoresists
SG168462A1 (en) Novel copolymer and photoresist composition comprising the same
RS51983B (en) Synthesis of boronic ester and acid compounds
TW200630754A (en) Resist compound and radiation-sensitive composition
TWI266147B (en) Novel photosensitive resin compositions
WO2008006058A3 (en) Alkyl lactyllactate solvent compositions
TW200641522A (en) Positive resist composition, method for forming resist pattern and compound
TW200643622A (en) Antireflective hardmask composition and methods for using same
TW200609250A (en) Lactone Copolymer and radiation-sensitive resin composition
WO2004109400A3 (en) Novel photosensitive resin compositions
TW200502688A (en) Positive-working photosensitive resin composition, method for producing pattern-formed resin film, semiconductor device, display device, and method for producing the semiconductor device and the display device
TW200707106A (en) Photoresist composition
WO2006132962A3 (en) Novel photosensitive resin compositions
EP2329320A4 (en) Positive resist composition for immersion exposure and pattern forming method
BRPI0514058A (en) compositions for cleaning microelectronic substrates
GT201000048A (en) IMPROVEMENTS IN ORGANIC COMPOUNDS OR RELATED TO THE SAME
TW200619850A (en) Resist composition and resist pattern forming method
WO2011094004A3 (en) Compositions having phosphorus-containing compounds
TW200801852A (en) Detergent and rinsing agent for lithography
BR0113281A (en) Universal paint solvent
TW200707096A (en) Resist composition
TW200627062A (en) Photoresist compositions