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SU1605575A1 - Evaporator - Google Patents

Evaporator

Info

Publication number
SU1605575A1
SU1605575A1 SU4621185/21A SU4621185A SU1605575A1 SU 1605575 A1 SU1605575 A1 SU 1605575A1 SU 4621185/21 A SU4621185/21 A SU 4621185/21A SU 4621185 A SU4621185 A SU 4621185A SU 1605575 A1 SU1605575 A1 SU 1605575A1
Authority
SU
USSR - Soviet Union
Prior art keywords
resist
lateral grooves
tube
holes
dosage meter
Prior art date
Application number
SU4621185/21A
Other languages
Russian (ru)
Inventor
А.В. Карамышев
А.Т. Буравцев
Б.М. Лушин
Original Assignee
А.В. Карамышев
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by А.В. Карамышев filed Critical А.В. Карамышев
Priority to SU4621185/21A priority Critical patent/SU1605575A1/en
Application granted granted Critical
Publication of SU1605575A1 publication Critical patent/SU1605575A1/en

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  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)

Abstract

FIELD: microelectronics. SUBSTANCE: invention refers to deposition of resist by spraying in vacuum. Evaporator includes resist dosage meter 3 put coaxially in melting pot 2, additional screen 11 with holes 14, 15 anchored on to screen 9 between former 10 of steam flow and dosage meter 3 and rest 16 with central hole 17. Dosage meter is manufactured in the form of cylindrical tube 4 with through lateral grooves 15 arranged in one row and resist separator 6 fabricated in the form of rod 6 with longitudinal flat 7 and circular lateral grooves 8 which is mounted uniaxially inside tube 4 for reciprocating motion. With this lateral grooves 5 of tube 4 are placed between lateral grooves 8 of rod 6 and additional screen 11 is made in the form of two discs 12, 13 with holes 14, 15 displaced relative to each other. Rest 16 interacting with separator 6 is produced in the form of sleeve with through holes 18 in its side surface. Tube 4 of dosage meter 3 is manufactured from thermal material, for instance fluoroplastic. Proposed design of evaporator makes it possible to conduct dosed evaporation of resist by portions. EFFECT: reduced usage of resist. 6 cl, 1 dwg
SU4621185/21A 1988-12-19 1988-12-19 Evaporator SU1605575A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
SU4621185/21A SU1605575A1 (en) 1988-12-19 1988-12-19 Evaporator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SU4621185/21A SU1605575A1 (en) 1988-12-19 1988-12-19 Evaporator

Publications (1)

Publication Number Publication Date
SU1605575A1 true SU1605575A1 (en) 1996-06-20

Family

ID=60527740

Family Applications (1)

Application Number Title Priority Date Filing Date
SU4621185/21A SU1605575A1 (en) 1988-12-19 1988-12-19 Evaporator

Country Status (1)

Country Link
SU (1) SU1605575A1 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2468121C1 (en) * 2011-11-11 2012-11-27 Федеральное Государственное Унитарное Предприятие "Научно-Производственное Объединение "Техномаш" Device for resistive evaporation of metals and alloys in vacuum
RU188872U1 (en) * 2018-07-10 2019-04-25 федеральное государственное бюджетное образовательное учреждение высшего образования "Омский государственный университет им. Ф.М. Достоевского" Evaporator for vacuum deposition of thin hybrid films of metals and semiconductors

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2468121C1 (en) * 2011-11-11 2012-11-27 Федеральное Государственное Унитарное Предприятие "Научно-Производственное Объединение "Техномаш" Device for resistive evaporation of metals and alloys in vacuum
RU188872U1 (en) * 2018-07-10 2019-04-25 федеральное государственное бюджетное образовательное учреждение высшего образования "Омский государственный университет им. Ф.М. Достоевского" Evaporator for vacuum deposition of thin hybrid films of metals and semiconductors

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