JPWO2020185360A5 - - Google Patents

Claims (20)

A showerhead assembly for a processing chamber comprising:
A porous plate comprising: a support structure comprising supporting features; and a plurality of pores having a thermal conductivity of at least about 50 W/(mK) and having an average diameter of less than about 100 μm, a porous plate having at least a portion of its edge on said support feature. 2. The showerhead assembly of Claim 1, wherein the plurality of pores form a plurality of continuous pathways extending from the first surface to the second surface of the porous plate. 2. The showerhead assembly of Claim 1, wherein the porous plate has a circular shape with a diameter of at least about 200 mm. 2. The showerhead assembly of claim 1, wherein the number of pores of said plurality of pores is at least about 60 pores per cubic inch of said porous plate. 2. The showerhead assembly of claim 1, wherein the porous plate has a thermal conductivity of at least about 75 W/(mK). 3. The showerhead assembly of Claim 1, wherein the plurality of pores have an average diameter of less than about 50[mu]m. 2. The showerhead assembly of Claim 1, wherein said support structure further comprises a clamp plate, and wherein at least a portion of said edge of said porous plate is held between said clamp plate and said support feature. The showerhead assembly of Claim 1, wherein the porous plate comprises one of silicon carbide, aluminum nitride, and molybdenum. a processing chamber,
a substrate support configured to support a substrate;
A showerhead assembly configured to flow gas into the processing chamber, the showerhead assembly comprising:
a support structure with support features;
A porous plate having a thermal conductivity of at least about 50 W/(mK) and comprising a plurality of pores having a diameter of less than about 100 μm, wherein at least a portion of the edges of the porous plate are aligned with the support features. a showerhead assembly comprising an overlying porous plate; and a gas supply source configured to supply process gas to the showerhead assembly. 10. The processing chamber of Claim 9, wherein the plurality of pores form a plurality of continuous pathways extending from the first surface to the second surface of the porous plate. 10. The processing chamber of Claim 9, wherein the porous plate has a circular shape with a diameter of at least about 200 mm. 10. The processing chamber of claim 9, wherein the number of said plurality of pores is at least about 60 pores per cubic inch of said porous plate. 10. The processing chamber of claim 9, wherein the porous plate has a thermal conductivity of at least about 75 W/(mK). 10. The processing chamber of claim 9, wherein said plurality of pores have an average diameter of less than about 50[mu]m. 10. The processing chamber of Claim 9, wherein said support structure further comprises a clamp plate, and wherein at least a portion of said edge of said porous plate is held between said clamp plate and said support feature. 10. The processing chamber of Claim 9, wherein the porous plate comprises one of silicon carbide, aluminum nitride, and molybdenum. A porous plate for a showerhead assembly of a processing chamber, the porous plate comprising:
a plurality of pores arranged according to an irregular pattern;
a plurality of continuous pathways formed from the plurality of pores;
wherein said plurality of continuous paths extend from a first surface to a second surface of said porous plate;
A porous plate, wherein said porous plate has a thermal conductivity of at least about 50 W/(mK). 18. The porous plate of claim 17, wherein said plurality of pores have an average diameter of less than about 100 [mu]m. 18. The porous plate of claim 17, wherein the number of contiguous channels is at least about 60 pores per cubic inch of the porous plate. 18. The porous plate of claim 17, wherein said plurality of pores have an average diameter of less than about 50[mu]m.